53 lucent advanced mems slm for communications imaging and

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  • 7/30/2019 53 Lucent Advanced MEMS SLM for Communications Imaging and

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    ADVANCED MEMS SPATIAL LIGHT

    MODULATOR FOR COMMUNICATIONS,IMAGING, AND TARGETING

    Microsystems and Nanotechnolgy ResearchBell Labs Lucent Technologies

    Murray Hill, NJ

    Warren Lai, C.S. Pai, Fred Klemens, John Miner, Ray Cirelli, Ed Ferry, Ashley Taylor,Tom Sorsh, Avi Kornblit , Bill Mansfield, Eric Bower, Bob Fullowan

    Rae McLellan, Nagesh Basavanhally, Dave RamseyMara Elina Simon, Vladimir Aksyuk, Cristian Bolle, Csar Chialvo, Harold Dyson, ArmanGasparyan, Susanne Arney

    This material is based on work supported in partby DARPAs CCIT program under contract NumberHR0011-04-C-0048

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    Optical, secure, free-spacecommunications

    Advanced pixelated SLMs:Applications

    Imaging Complex Mirror Array

    LARGE Tip-tilt, Piston motionFAST Tip-tilt, Piston response time.

    FLAT, smooth, reflectiveHIGH Fill factor

    Collimating optics

    SLM

    Wavefront Sensor

    camera

    control

    * Reference starWith AO Without AO

    Segmented: Trackingtargetingscanning

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    Breaking out of the traditional MEMS spaceMEMS arrays complexity map

    Actuator density

    Array

    Linear

    2D

    120 m mirror (system,chips size) Integrable with electronics,scalable ( 100V) 642, 2562 and beyond High fill factor (>98%) Flat (30nm, 2nm Roughness)

    Large Mechanical Power

    -3 m x2 ( -3

    2 )

    Fast Large displacement

    Flat (thick) mirror

    100

    101

    102

    103

    104

    105

    10-3

    10-2

    10-1

    100

    101

    102

    103

    104

    105

    Polychromator

    BostonMM

    Lucent CCIT SLM

    Si Light Machines GLV

    IBM Millipede

    Lucent LRouter

    Lucent WSS

    Early DMD

    Lucent M

    Micronics

    TI DMD

    TT 2D

    MARS

    IRIS

    MEMEXEXC

    C

    OMPLEXITY

    Mechani

    calPower/D

    OF(nanowat

    ts)

    DOF / mm2

    (1/mm2)

    R ~ Log (Array Size * bits/pix) Goal

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    Design principleDual, in-plane, rotational comb-drives

    arm / springlayer

    V=0

    V

    In-plane

    combs

    Routing

    layer

    Combs side view

    4 actuators in parallel One control signal per actuator

    2 comb drives per actuator

    Piston motion results from

    two opposite actuators or all fouractuators together

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    Design principleDual, in-plane, rotational comb-drives

    arm / springlayer

    V=0

    V

    In-plane

    combs

    Routing

    layer

    Combs side view

    4 actuators in parallel One control signal per actuator

    2 comb drives per actuator

    Tilt motion results from

    single actuators or two adjacentactuators together

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    Design principle andfabrication

    In-planecombs

    V=0

    V

    arm / springlayer

    Routinglayer

    Combs side view

    Combs front viewTotal: 17-28 mwith 100nm registration accuracy between all layers

    1-2 m PolySi-3 Mirror CD .5 m

    1-2 m PolySi-2 Spring/Arm CD .5 m

    6-12 m PolySi-1 Combs CD .5 m

    2.5 m Routing (PolySi-0 +) CD .5 m

    2-4.5 m Sacrificial layers (each)

    20

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    SE

    MI

    mag

    es10 mask levels 248nm4X stepper lithography

    Reinforcing struts (back of the mirror)

    120 m

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    Mono

    lithicM

    irror

    Strut-reinforced, 1.5 mthick mirror with

    40 Ti / 400 Au

    Excluding thatregion and the

    overall curvature theRMS roughness is~1.85nm

    Mirror, front side

    Even with thisdeposition/polishingartifact the peak tovalley variation is

    ~50nm

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    Test Vehicle

    CORE

    PERIPHERY

    (A)

    (B)(C)

    Packaged 64x64 256x256 on 8 wafer

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    0 10 20 30 40 50 60 70 80 90 100 110

    0

    1

    2

    3

    4

    5

    6

    displcement(m)

    angle(degrees)

    Voltage (V)

    1AT

    2AT

    4AP

    Mechanical Response: Angle-Piston vs. Voltage

    2-Actuator Tilt

    1-Actuator Tilt

    4-Actuator Piston12

    34

    Continuous, smoothvarying, stable,controllable Motion

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    Combined X-tilt and Piston:

    0 1 2 3 4 5 6-5

    0

    5

    Piston motion (um)

    Tiltangle

    ()

    X-tilt

    Y-tilt

    1

    23

    V1=V2 in range 0 to 80V (SQRT spaced)V3=V4 in range 0 to 80V (SQRT spaced)

    +/-0.1 degrees totalaccumulated Y-tilt(open loop)

    4

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    0 1 2 3 4 50

    1

    2

    3

    4

    Combined Diagonal Tilt and Piston:

    Piston motion (um)

    X-tilt

    Y-tilt

    Tiltangle

    ()

    1

    23

    V1=V3 in range 0 to 80V (SQRT spaced)V2 in range 0 to 100V (SQRT spaced)

    V4=0

    4

    V4 > 0

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    5 10 15 20 25 30 35 40

    0.2

    0.4

    0.6

    0.8

    1.0

    1.2

    1.4

    1.6

    1.8

    Normalized

    Amplitude

    Frequency (KHz)

    Mode F0

    Tilt 1 29.6KHz

    Tilt 2 29.6KHz

    Piston 30.9KHz

    next mode 140KHz

    Mechanical Response: Resonance

    2-Actuator Tilt

    1-Actuator Tilt

    4-Actuator Piston

    Simulated Resonancefrequencies in Vacuum F0~30Kz from fitting

    Polytec Vibrometer Measurement

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    -20 0 20 40 60 80 100 120 140 160 180 200 220

    -0.4

    -0.2

    0.0

    0.2

    0.4

    0.6

    0.8

    1.0

    1.2

    1.4

    1.6

    1.8

    -0.4

    -0.2

    0.0

    0.2

    0.4

    0.6

    0.8

    1.0

    1.2

    1.4

    1.6

    P

    iston(m)

    time (s)

    X-angleTilt(deg)

    Pr=9.5s

    Tr=23.4s

    Pf =7.4s

    Tf =18.6s

    -20 0 20 40 60 80 100 120 140 160 180 200 220

    -0.4

    -0.2

    0.0

    0.2

    0.4

    0.6

    0.8

    1.0

    1.2

    1.4

    1.6

    1.8

    -0.4

    -0.2

    0.0

    0.2

    0.4

    0.6

    0.8

    1.0

    1.2

    1.4

    1.6

    P

    iston(m)

    time (s)

    X-angleTilt(deg)

    Pr=9.5s

    Tr=23.4s

    Pf =7.4s

    Tf =18.6s

    Atmospheric pressure,0-60V step

    Me

    chanic

    alResp

    onse:StepFun

    ction

    Interferometerstroboscopicmeasurement

    Video frame rate:6000X slower thanactual motion

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    We have Implementedhigh-force actuatordesign in a 10-lithography-step MEMS

    process

    5.4m, 10s piston4.3, 20s tilt

    MEMS fabricationapproach scalable to2562 and beyond

    Integration-ready with

    high-voltage electronics

    Design andfabrication tour de

    force100 101 102 103 104 105

    10-3

    10-2

    10-1

    100

    101

    102

    103

    104

    105

    Polychromator

    BostonMM

    Lucent CCIT SLM

    Si Light Machines GLV

    IBM Millipede

    Lucent LRouter

    Lucent WSS

    Early DMD

    Lucent M

    Micronics

    TI DMD

    TT 2D

    MARS

    IRIS

    MEMEX

    LT CCIT TV

    EXC

    COMPLEXIT

    Y

    Mecha

    nicalPower/

    DOF(nanow

    atts)

    DOF / mm2

    (1/mm2)

    R ~ Log (Array Size * bits/pix)

    Summary

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    Pure Tilt Dynamics

    Time (us)

    Pistonmo

    tion(um)

    Tiltangle()

    X-tilt

    Y-tilt

    Piston

    0 100 200 300 400-4

    -3

    -2

    -1

    0

    1

    2

    3

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    8 inch

    12um deep combs

    Future: faster response

    Deeper combs, stiffer springsDamping TuningTailor for different applications within this

    platformContinue to work on integration / packaging