Buying a PEALD reactor for TaN depositionBuying a PEALD reactor for TaN deposition

for Aalto University for Aalto University

9.3.2010

Outline

• TaN

• Market research

• Supplier

• Budget

• On-site arrangements

Steps of the process

Tantalum Nitride

• Applications– Diffusion barrier layers– Gate electrodes– Passivation layers– Protective coatings

• Deposition (ALD vs. PEALD)– Lower resistivity– Higher density– Higher purity– Safety

• Properties– Purity– Density– Resistivity– Stability– Adhesion

Oxford Instruments• Oxford Instruments

is a global company operating since 1959 with offices and manufacturing sites in over 25 locations.

• Oxford Instruments Head Office Tubney Woods, Abingdon, Oxfordshire, OX13 5QX, UK.

Picosun• Picosun is an

international equipment manufacturer with a world-wide sales and service organization.

• Has continuously designed ALD systems since 1975.

• Headquarter:• Picosun Oy

Tietotie 3FI-02150 EspooFinland

Beneq

• Beneq was established in May 2005

• Activity is focused on equipment and technology for functional coatings

• Main office: Beneq OyP.O. Box 262FI-01511 VantaaFinland

Supplier: Beneq Oy

• Close partnership• Long experience with their equipement in our clean room• Our old ALDs don’t have a standard PEALD option• Easy communication• Easy delivery = lower costs

Beneq TFS 200 for research

• Direct and remote PEALD• Growth of various films possible• Price 303,600 € for TaN growth

Budget

• TFS 200 system for TaN growth: 303,600 €• Vacuum pump, other appliances and installation costs:

30 k€• Additional sources: 6900 – 18700 € each• Operating costs: 20 k€ / year

On-site arrangements

delivery

installation

testing

trainings

TaN processing

HAPPY RESEARCHER