conference call 2015-05-18 wp2 : - news from partners - d2.5 & d2.6
TRANSCRIPT
Conference Call 2015-05-18
WP2 : - News from partners- D2.5 & D2.6
- 2 FZ cSi wafer (PI103) received. To test the RIE process on flat wafer.
at INL, the RIE recipes are under uptdate (new RIE set-up)
? Which RIE processes to be done? SF6/O2/CHF3 and/or SF6/Ar
- The expected photoresist for LIL @405nm is avalaible at INL
comparison between wet-dry etching on FZ wafer and PECVD-Si 4µm (PI64 samples) can go on
News from INL :
- FZ cSi wafer (LY61) to test the passivation by ALD deposition
comparison between Al2O3 and SiN passivation layer made @INL
? Could we send some wafer @ IMEC for aSi:H passivation ?
News from INL :
- Pseudo-disordered structure done by E-Beam Lithography
2 samples of « small area » to test the new RIE set-up
The next sample would exhibit an area of few mm²
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D2.5 Experimental non-periodic patterned films
confidential
Description: Report on the characteristics of optically optimized pseudo-periodic/random structures, on areas up to 50 x 50 mm2
[due month 24, delayed]
Update:- Template sent to partners, to be completed asap
- Samples were shipped to TOTAL by IMEC for tests of double texturation (NIL + plasma).
- Updates on epifree (IM94) and epifoil (IM67)(following slides)
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D2.5: Epifree – Dry-HCL – size=270 nm
confidential
Batch IM94Uniformity and stability ok:“a” etched on different day than “b” and “c”
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D2.5: Epifree – Wet-HCL – size=630 nm
confidential
Batch IM94- Comparable to Wet-NIL- Good uniformity- Higher R than dry
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D2.5: Epifoil – Wet-HCL – 510 nm
confidential
Batch IM67On parent substrate:- Good uniformity- 4 min = optimal time for good topography
3 min 4 min5 min
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D2.5: Epifoil – Wet-HCL – 510 nm
confidential
Batch IM67• On parent substrate: lower R for t= 4 min
• On glass: measurements pending…
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D2.6 Large-area patterned films
confidential
• IM101 (epifoils, 10 x 10 cm) received at Chalmers:to be patterned by HCL
• Samples to be prepared at IMEC:Epifoils and epifrees (15.6 x 15.6 cm) for NIL
• LPICM: epi-PECVD cSi to be deposited on 15.6 x 15.6 cm?