from r&d to thin film silicon pv at oerlikon solar
TRANSCRIPT
From R&D to Thin Film Silicon PV at Oerlikon Solar
3rd Gen Photovoltaics: CleanTech DayCSEM Basel / 19th August 2009
Ulrich KrollOerlikon Solar-Lab SACH-2000 Neuchâtel
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Agenda
1. Why Solar?
2. History IMT - Oerlikon Solar
3. Oerlikon Solar: R&D tasks and results
4. Proven Thin Film Manufacturing Solutions
5. Perspectives & Opportunities
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
The Need for Renewable Energies
The end ofthe oil era
Source: Uppsala Hydrocarbon Depletion Study Group
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Renewable Energy Options
Sun 120,000.0 TWGeothermal 12.0 TWWind 3.0 TWTide and ocean currents 2.0 TWHydroelectric 0.5 TW
Solar has greatest potential to meet world’s growing electricity needs compared to other renewable energy sources
Source: Engineering and Science No. 2 2007
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Technology Substrate Cell Issues
CostSilicon Supply
Large ScaleEfficiency
Two cell technologies
Crystalline Silicon
Thin Films
Option:Thin film silicon
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
A little bit of history….to achieve to
Oerlikon Solar
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
IMT in the early days.....
Courtesy of IMT-NE
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Very promising concepts (cost reduction & efficiency)
ZnO
µc-Si:H
a-Si:H
ZnO
glass
Micro-
morph
Roots: Long-term research at IMT Neuchâtel
• 1987: Introduction of VHF-GD PECVD deposition
• 1994: Introduction of “Micromorph” concept
• LPCVD ZnO for advanced light-trapping
Courtesy of IMT-NE
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Deposition Rates vs. Plasma Excitation Frequency
Curtins et al., Elec. Lett 23 (1987) 228Zedlitz et al., MRS Symp. Proc. 258 (1992) 147Howling et a., J. Vac. Sci. Technol. A 10 (1992) 1080
Deposition rate increase has been reproduced and confirmed by other R&D groups
no electrical artefacthence, real plasma effect
position of rate maximum due to electrical losses in system
0
10
20
30
40
0 50 100 150 200 250
Curtins et al. [1987]Zedlitz et al. [1992]Howling et al. [1992]
Dep
ositi
on R
ate
[Å/s
]
Frequency [MHz]
U. Kroll et al., Sol. Ener. Mat. & Sol. Cells 48 (1997) 343.
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Micromorph® Process Technology
0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
300 400 500 600 700 800 900 1000 1100
Wavelength [nm]Q
uant
um E
ffici
ency
[a.u
.] AmorphSingle
Junction
Micromorph®
TandemJunction
a-Si a-Si
µc-Si
Amorph
Micromorph® TandemMore Energy Absorbed
Visible Near IR
a-Si:Htop cell
µc-Si:Hbottom cell
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
LPCVD ZnOAsahi U
Light-trapping – fundamental for thin film Si solar cells:
Key issue TCO: approach by LPCVD ZnO
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
0
20
40
60
80
100
400 500 600 700 800 900 1000 1100 1200
Asahi-ULPCVD-ZnO
Tota
l tra
nsm
issi
on [%
]
Wavelength [nm]
0
10
20
30
40
50
400 500 600 700 800 900 1000 1100 1200
Asahi-ULPCVD-ZnO
Diff
use
trans
mis
sion
[%]
Wavelength [nm]
Enhanced total & diffuse Transmission (Haze)
Better quantum efficiency (for a-Si) on ZnO compared to Asahi SnO2
Optical properties:
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Highest stabilized efficiency for a-Si:H p-i-n on LPCVD ZnO (confirmed)
IMT Neuchâtel 2003:
“modified” LPCVD ZnO processsingle-junction a-Si:H p-i-n with
η = 9.47 % stabilized (with ARC)
(J. Meier et al., WCPEC-3, Osaka 2003)
Our Motivation !
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Bottle-necks: up-scaling to 1 m2
• availability of production system
• high investment cost and high risk
In 2003:
Thin film silicon PV technology developed at IMT
search for industrialisation partner
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
AM-LCDs: Strong growth
0
5000
10000
15000
20000
25000
30000
1998 1999 2000 2001 2002 2003 2004 2005
Large small/medium
From 22 bn$ to 48 bn$ in 2005Monitor and TV will be the main driver
Source :Nikkei Microdevices FPD 2002 yearbookand Display search 2003 feb
2000
380 24
6 0.2
2005
4604790
7
Mio Units
MobileLaptopsMonitors TVs
Solar cells:c-Si: ~7 km2
Thin film:~0.6km2
Are
apr
oduc
ed(x
100
0 m
2 )
In 2003:
Find Synergies for large-area deposition
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Why Neuchâtel? Close to IMT and CRPP/EPFL(strategic partners)
Goal: Process Transfer from Lab to Production
Oerlikon Solar-Lab, Puits-Godet 12a,Neuchâtel:
- complete R&D Lab (clean/grey room)- LPCVD system for ZnO deposition- PECVD system for silicon deposition- Laser scribing system- Cell characterisation- cleaning, glass cutting, gas delivery
systems etc.
Today Oerlikon Solar-Lab SA have 21 employees working in a Lab of about 550 sqm surface
Oerlikon founds own R&D lab and enters thin film silicon PV2003
Puits-Godet 12a
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
0
5
10
15
0 0.5 1
Cur
rent
den
sity
[mA
/cm
2 ]
Voltage [V]
TCO / a-Si:H p-i-n / ZnO / WR
1 cm2 cells
ZnOAsahi U240200i-layer [nm]
876873Voc
[mV]
66.766.6FF [%]
15.614.8Jsc
[mA/cm2]
9.18.6η [%]
light-soaked (1000 h)9.1 % stabilized
a-Si:H p-i-n on ZnO
a-Si:H p-i-n test cells
S. Benagli et al., 23rd EUPVSEC Valencia (2008)
<i>-layers @ 3.3 A/s
Optimization of devices & deposition processes
Update at 24th EU PVSEC Hamburg, September 2009 !
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Up-scaling to 10x10 cm2 mini-modules in KAI-M
0.5 % abs. enhanced stabilized efficiency compared to Asahi SnO2~1 % abs. compared to commercial TCO
Characterisation by ESTI of JRC in Ispra
AX55
0
10
20
30
40
50
60
70
80
0 1 2 3 4 5 6 7 8 9 10 11 12V [V]
I [m
A]
Performance measured at ESTIIsc = (74.2 ± 1.7) mA Voc = (11.103 ± 0.028) V
Pmax = (518 ± 12) mW
Aperture area determined at METAS Aap = 62.24 cm2
ηap = (8.32 ± 0.19) % (stabilized)
AsahiIH515
0
10
20
30
40
50
60
70
0 1 2 3 4 5 6 7 8 9 10 11V [V]
I [m
A]
Isc = 66.3 mAVoc = 10.39 VFF = 65.1 %
Aap = 57.18 cm2
(aperture area determined at Oerlikon Solar)
ηap = 7.84 ± 0.19%
LPCVD ZnO
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Best lab Micromorph tandem cell (light-soaked)
SnO2 Asahi glass substrate
Best cell10.8 % stable efficiency
η (%)
0
5
10
0 0.5 1
Cur
rent
den
sity
[mA/
cm2 ]
Voltage [V]
1376Voc
[mV]
69.03FF [%]
11.37Jsc
[mA/cm 2]
10.80η [%]
a-Si:H/µc-Si:H tandem
1 cm2 cell
light-soaked 1000h
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Industrial size 1.1x1.3 m2 moduleon front LPCVD ZnO
ZnO
a-Si:H p-i-n single-junction R&D module on ZnO: 124.7 W (ini.)
ZnO
SnO2
Still room for further improvements!>100 W stabilized expected
0
0.5
1
0 50 100 150
Cur
rent
[A
]
Voltage [Volts]
<i> @ 3.5 Å/secA = 1.4 m2
Isc
= 1.25 AV
oc = 143.3 V
FF = 69.6 %η
total area = 8.72 +/- 0.22%
P = 124.7 W (+/- 3.2 W)
LPCVD ZnO / a-Si:H p-i-n
Confirmed by ESTI of JRC Ispra
initial
Scaling up in R&D Pilot line / Trübbach
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Industrial size 1.1x1.3 m2 moduleon in-house front LPCVD ZnO
ZnO
ZnO
SnO2
Still room for further improvements!
0
0.2
0.4
0.6
0.8
1
1.2
0 40 80 120 160
Cur
rent
[A
]
Voltage [V]
Isc
= 1.26 A
Voc
= 176.5 V
FF = 68.2 %η
ap = 11.0 %
Pini
= 151 W
a-Si:H / µc-Si:H tandem
initial
R&D Pilot line in Trübbach: 151 W initial 1.4 m2 module !
Micromorph Module 1.4 m2
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
CTI Projects of Oerlikon Solar from start until now
CRPP/EPFL: CTI 9675.2 runningA new low ion energy bombardment PECVD reactor for the deposition of thin film silicon for solar cell applications
IMT CTI 8968.3 runningDevelopment of a novel surface treatment of LP-CVD ZnO layers used as Transparent Conductive Oxide for thin film silicon solar cells.
CRPP/EPFL: CTI 6947.1 EBS-IW finishedA new large area very high frequency reactor for the high rate deposition of microcrystalline silicon for thin film solar cell applications
IMT: Eureka 7253.2 EPRP-IW finished Stability of advanced LP-CVD ZnO within encapsulated thin film silicon solar cells
IMT: CTI 6928.1 IWS-IW finished High rate deposition of microcrystalline silicon layers and cells
NTB (Neues Technikum Buchs): KTI Nr. 7112.2 EPRP-IW finished
Development of QE measuring system
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Solar key member of the group with global footprint
Oerlikon Coating
Oerlikon Vacuum
Oerlikon Drive Systems
Oerlikon Components
Oerlikon Textile Oerlikon
Solar Oerlikon Solar
20 locations in 11 countriesOver CHF 23m R&D investment in 2007 Over 350 living patentsOver 900 000 modules produced bycustomers of Oerlikon Solar
800 employees worldwide280 global support300 scientists and engineers
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Oerlikon Solar
Equipment manufacturer for cost-effective production solutions for thin film silicon solar modules
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Line Automation
Contacted Tested Device Encapsulation-Lamination
Back-End
Contact White Reflector
Edge Isolation
Flasher Cross Contact
Lami-nation
JunctionBox
Flasher
PartnerOerlikon Solar
Front-End
VocClean CleanTCO FC Laser PECVD Laser TCO BC Laser
MetrologyOerlikon provides end-to-end (E2E) production solutions…
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Oerlikon Solar Manufacturing Systems
TCO 1200 KAI 1200
TCO TCOClean Laser PECVD AssemblyLaser Laser
LSS 1200Transparent conductive oxide deposition
Photovoltaic layer deposition Laser scribing
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
KAI System Concept - Parallel Processing of 20 reactors
2 process towers with 10 reactors in each stack2 load-locks1 transfer chamberExternal robot for glass loading from cassette
3.2 m3.2 m
x10
x20x20
x10
8.6 m
6 m
Excitation frequency 40.68 MHzto significantly enhance deposition rate
Highest productivity on small footprint: 20 MWp / y for a-Si:H
Load-locks
Transferchamber
Processtowers
Robot
Stack1 Stack 2KAI 20-1200
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
KAI 1200 - Proven Product for PV Layers
KAI 1200 with Plasma Box® reactor 40.68 MHz for higher rate & qualitya-Si:H & µc-Si:H p-i-n layersSingle-chamber processAuto-clean after every run
Result High film qualityHigh throughputHigh system flexibility & utilizationSmall footprint
PECVDClean TCO Laser TCO AssemblyLaser Laser
KAI 1200
a-Si/µc-Si
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Front and back view photo of KAI 20-1200
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
TCO 1200 - Higher Efficiency and Lower COO
TCO TCOClean Laser PECVD AssemblyLaser Laser
TCO 1200
Proprietary LPCVD technologyHigh conductivityTransparent conductor deposition and texturing in a single step
Integral to Micromorph processHigh transmission in visible and near IR light spectrums
a-Si/µc-Si
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Project update
Customer Technology Type ContractSigned
Move-InOn-Time
SOPOn-Time
MW
Bosch/Ersol Amorphous Equipment 40
Schüco Amorphous Equipment R&D
Schott Amorphous Equipment 40
CSG Amorphous Equipment 20
Sun Well Amorphous End-to-End 50
Inventux Micromorph® Equipment 30
HelioSphera Micromorph® End-to-End 30
Tianwei Amorphous End-to-End 46
Auria Solar Micromorph® End-to-End 60
Pramac Micromorph® End-to-End 30
Sun Well (2) Micromorph® End-to-End 60
Sun Well (3) Micromorph® End-to-End 120
Gadir Amorphous End-to-End 40
Chint Micromorph® Equipment 40
Total more than 600 MW
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Mass production line at Inventux –best Micromorph modules
140 W initial module power (April’09)
0
0.2
0.4
0.6
0.8
1
1.2
1.4
1.6
1.8
0 20 40 60 80 100 120 140
Voltage (V)
Cur
rent
(A) P = 140 W
Voc = 131.4 VIsc = 1.635 AFF = 65.1 %
1st Micromorph line in Berlin
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Operational silicon thin film fields
3.4 MWp a-Si installation (Zahna, Germany)39,000 thin film modules & 747 trackersStart of operation: 19 February 2009System integrator: AC Energy GmbH & Co. KG
1.3 MWp a-Si installation (Zahna, Germany)
Kroll / 3rd Gen Photovoltaics: CleanTech Day; 19th August 2009
Perspectives & Opportunities
Nice example from basic research to mass production
Success recipe: Partners with commitmentsLong-term support for basic research (OFEN, CTI)Well-trained experts & specialists
Oerlikon Solar: Proven solutions for high volume solar moduleproduction with more then 900’000 produced panelsOerlikon Solar is well-placed for the challenges of the coming PV century