HARMST '01Fourth International Workshop on

High-Aspect-Ratio Micro-Structure Technology

Baden-Baden, Germany

June 17-19, 2001

Book of Abstractscompiled and edited by

Forschungszentrum Karlsruhe GmbHProgram Microsystem Technologies (MIKRO)

Program Management

Karlsruhe, Germany, June 2001

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8.00

9.00

9.20

9.50

Poster Session(see poster listing at the end ofeach session)Welcome Address

Invited Talks

Micro-optomechanical uses ofDeep X-Ray Lithography (X-Optics)

From LIGA to Comprehensive3D-Micro Fabrication

Prof. Volker SaileChairpersonTechnical Advisory CommitteeDr. Peter BleyChairpersonLocal Organization Committee(both Forschungszentrum Karlsruhe,Germany)Dr. Sigrun LangeMayor of Baden-Baden

Todd R. ChristensonPhotonics Microsystems Technology,Sandia National Labs, Albuquerque,NM, USAWolfgang EhrfeldMainz, Germany

10.40

Session I: Lithography I - Process Technologies

Chairpersons: Volker Saile, Forschungszentrum Karlsruhe, GermanyJost Gottert, Louisiana State University, CAMD, Baton Rouge, USA

Oral Presentations

10.55

11.10

11.25

lick-Film Lithography Usingaser Write

licrofabrication of MassiveParallel Micromirror-Lenses byX-Ray LIGA Technique: RecentAdvances and Prospects

Moving Mask Deep X-RayLithography System with MultiStage for 3-D Microfabcrication

Novel Shaped MicrostructuresProcessed by Deep X-RayLithography Using PlanePattern-Cross Section TransferTechnique

1,2Tai-Yuan Huang 1, Yao Cheng!' Synchrotron Radiation Research[Center, Hsinchuf Department of Engineering and\System Science, National Tsing-HuaUniversity, Hsinchu, Taiwan, ROCR.K. Kupka, F. BouamraneLaboratoire pour /'Utilisation duRayonnement Electromagnetique(LURE), Universite Paris-Sud, OrsayCedex, FranceHui You, Naoki Matsuzuka, TadahiroYamaji and Osamu TabataFaculty of Science and Engineering,Ritsumeikan University, JapanHiroshi Ueno and Susumu SugiyamaRitsumeikan University, Faculty ofScience and Engineering, Japan

Workshop Program, Page 2

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11.40

P I - 1

P I - 2

P I - 3

P I - 4

P I - 5

P I - 6

P I - 7

Discussion of Oral and Poster Presentations, Session I

X-Ray Masks for DeepLithography

Quasi 3D MicrostructureFabrication Technique utilizingHard X-Ray Lithography ofsynchrotron radiation

Production issues for highaspect ratio Lobster-eye opticsusing LIGA

A Passive Alignment MethodUtilizing Reference Posts andits Application in Multi-levelLIGA Processing

Graphite Membrane X-RayMasks for Rapid andInexpensive Prototyping of ,LIGA Structures

Implementation of an UltraDeep X-Ray LithographySystem at CAMD

Thick-Film Lithography UsingConfonformal Mask|

K. Maenaka, S. loku, S. IwamotoDepartment of Electronics, HimejiInstitute of Technology, JapanHarutaka Mekaru, Tadashi Hattoriand Yuichi UtsumiLaboratory of Advanced Science andTechnology for Industry, HimejiInstitute of Technology, JapanA. G. Peele 1),T. H. K. Irving 1>, K. A.Nugent1), D. C. Mancini2), N.Moldovan 2), T. R. Christenson 3)

1) School of Physics, University ofMelbourne, Parkville, Australia,2 Argonne National Laboratory,Argonne, IL, USA,3) Photonics andMicrofabrication Department, SandiaNational Laboratories, Albuquerque,NM, USAZhong-Geng Ling, Kun Lian and JostGoettertCenter for Advanced Microstructuresand Devices, Louisiana StateUniversity, LA, USAYohannes M. Desta 1>,2), Jost Gottert1), Linke Jian 1), Georg Aigeldinger1),Michael C. Murphy2), Phil Coane3>

1) Louisiana State University, Centerfor Advanced Microstructures andDevices,2) Louisiana State University,Department of MechanicalEngineering, 3) Louisiana TechUniversity, Institute forMicromanufacturing (IfM), BatonRouge, LA, USAGeorg Aigeldinger f),2), Jost Gottert1), Timo Mappes 1), Franz-JosefPantenburg , Louis Rupp *1> Center for Advanced Micro-structures and Devices (CAMD),Louisiana State University, BatonRouge, LA, USA, 2) Institut furMikrosystemtechnik, UniversitatFreiburg, Germany, 3>

Forschungszentrum Karlsruhe,Germany, Institut furMikrostrukturtechnik (IMT)Jih-Hsing Tu 1),2), Yao Cheng1',2),Ching-Chang Chieng2)1) Synchrotron Radiation ResearchCenter, Hsinchu, Taiwan, ROC,2)

Department of Engineering andSystem Science, National Tsing-HuaUniversity, Hsinchu, Taiwan, ROC

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Workshop Program, Page 3

Fast prototyping of high-aspectratio, high-resolution X-Raymasks by gas-assisted focusedion beam

itudy on Three-dimensionalicromachining Using

Synchrotron Radiation Etching

Application of the SynchrotronRadiation UV Regime for LIGAMask Fabrication

Frank T. Hartley ', Chantel KhanMalek 2), 3\ Jayant Neogi *;

•1) Jet Propulsion Laboratory, CaliforniaInstitute of Technology, Pasadena,CA, USAf' Laboratoire de SpectroscopieAtomique et lonique, Orsay Cedex,France, 3> Center for AdvancedMicrostructures and Devices (CAMD),Louisiana State University, BatonRouge, LA, USA,4> NorsamTechnology, Hillboro, OR, USANobuyoshi Nishi ",Takanori Katoh 2>,Hiroshi Ueno 1> and SusumuSugiyama "1> Ritsumeikan University, Faculty ofScience and Engineering, Japan, 2>

Sumitomo Heavy Industries, Ltd.,'apan. Schmidt, H. Lehr, S. Walter, B.

TierockInstitut fur Mikrotechnik undMedizintechnik, TechnischeUniversita't Berlin, Germany

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Session II: Stereo Lithography and Particle Beam Pattern Transfer

Chairpersons: Akira Umeda, Ntl. Research Lab of Metrology, Ibaraki, JapanAida El-Kholi, Forschungszentrum Karlsruhe, Germany

Oral Presentations

13.40 High-Speed Vapor-PhasePrototyping of Three-dimensional Microstructures:Advances in Self-SustainingGrowth Rates and FeedbackControl

13.55 Stereolithography on Silicon forJMicrofluidics and MicrosensorPackaging

j

James L. Maxwell1), Mats Boman 2),Klaus Piglmeyer3)

1> Materials Science & TechnologyDivision, Los Alamos NationalLaboratory, Los Alamos, NM, USA, 2)

Dept. of Inorganic Chemistry, UppsalaUniversity, Sweden,3> Applied Physics Dept, JohannesKepler University, AustriaAngela L. Tse, Peter J. Hesketh, andDavid W. RosenGeorge W. Woodruff School ofMechanical Engineering, GeorgiaInstitute of Technology, Atlanta, GA,USA

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Workshop Program, Page 4

14.10

14.25

14.40

P I I - 1

P I I - 2

P I I - 3

P I I - 4

P I I - 5

P I I - 6

P I I - 7

Fine features by Integral microstereolithography

High Aspect Ratio ComponentsThrough RMPD

Arnaud Bertsch 1;, Paul BernhardZ),Christian Vogt2), Philippe Renaud 1)

v Swiss Federal Institute ofTechnology (EPFL), Lausanne,Switzerland, 2) ProformAG, Marly,Switzerland, Corresponding author:Arnaud Bertsch, EPFL - DMT - IMS,Lausanne, SwitzerlandHelge Bohlmann, Reiner GotzenmicroTEC, Gesellschaft furMikrotechnologie mbH, Duisburg,Germany

Discussion of Oral and Poster Presentations, Session II

Modeling of MicrostructuresGrown by Laser AssistedChemical Vapor Deposition

Nickel and CopperElectroplating of Proton BeamMicromachined SU-8 Resist

Optical Drive of ConstrainedMicromechanisms Produced byTwo- photonMicrostereolithography with200 nm ResolutionFabrication of Microstructuresby Powder Blasting

Study of silicon backsidedamages in deep reactive ionetching for bonded silicon-glass structures

Resistless Ion ProjectionLithography of Diamond andTeflon by Reactive AcceleratedCluster Erosion

Large-Scale MolecularDynamics Simulations of HighlyAccelerated Cluster Impact onDiamond Surface!

R. Nassar, W. Dai, C. Zhang, and M.BomanInstitute for Micromanufacturing,Louisiana Tech University, Ruston,LA, USAJ.A. van Kan, A.A. Bettiol, K. Ansariand F. WattResearch Centre for NuclearMicroscopy, Department of physics,National University of Singapore,SingaporeShoji Maruo, Koji Ikuta and HayatoKorogiNagoya University, Department ofMicro SystemEngineering, JapanHenk WensinkUniversity of Twente, MESA,Enschede, NetherlandsYukihisa Yoshida, MunehitoKumagai, and Kazuhiko TsutsumiMitsubishi Electric Corporation,Advanced Technology R&D Center,JapanChristian Becker, Jiirgen Gspann,Ralf Kramer and Gilles RedouteUniversitat Karlsruhe andForschungszentrum Karlsruhe, Institutfur Mikrostrukturtechnik, GermanyYasutaka Yamaguchi and JurgenGspannForschungszentrum and UniversitatKarlsruhe, Institut furMikrostrukturtechnik, Germany

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Workshop Program, Page 5

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15.00

15.15

Session III: Lithography II - Resists

Chairpersons: Yao Cheng, Synchrotron Radiation Res. Center, Hsinchu, TaiwanJil Hruby, Sandia Ntl. Laboratories, Livermore, CA, USA

Oral Presentations

15.30

15.45

16.00P III - 1

P III - 2

Improving the ProcessCapability of SU-8, Part I

Comparison of PMMA and SU-8Resist Moulds for Embossingof PZT to Produce High-Aspect-Ratio Microstructures usingLIGA Process

Reduction of Diffraction Effectof UV Exposure on Su-8Negative Thick Photoresist byAir Gap EliminationHigh-Aspect-RatioMicrostructures Fabricated byX-Ray Lithography ofPolymethylsilsesquioxane-based Spin-on Glass ThickFilms

M.J. Shaw, D.J. Nawrocki, R.J.Hurditch and D.W. Johnson\Microchem Corp., Newton MA, USA^. Schneider1', B. Su2), L. Singletonf>, O. Wilhelmi5), S.E. Huq 1), P.D.Prewett3), R. A. Lawes1)

Central Microstructure Facility,Rutherford Appleton Laboratory,Chilton, Didcot, Oxfordshire, UnitedKingdom;2) IRC in Materials for HighPerformance Applications,3> School of Manufacturing andMechanical Engineering, TheUniversity of Birmingham Edgbaston,Birmingham, United Kingdom, 4>

Institut fur Mikrotechnik Mainz GmbH,Mainz, Germany,5> MAX-Lab, LundsUniversitet, Lund, SwedenFan-Gang Tseng, Yun-Ju Chuang,and Wei-keng LinESS, National Tsing Hua University,Taiwan, ROCYuxin Liu, Tianhong Cui, Philip J.Coane, and Michael J. Vasile 1), JostGoettert2),1> Institute for Micromanufactory,Louisiana Tech University, Ruston,LA, USA, 2> CAMD, Louisiana StateUniversity, Baton Rouge, USA

Discussion of Oral and Poster Presentations, Session III

SU-8 as Negative Resist inDeep X-Ray Lithography

Novel Positive-tone ThickPhotoresist for High AspectRatio Microsystem Technology

Linke Jian 1>, Georg Aigeldinger1>,Yohannes M. Desta1), * Jost Goettert1)1> Louisiana State University, Centerfor Advanced Microstructures andDevices,2> Louisiana State University,Department of MechanicalEngineering, Baton Rouge, USA

en-Wen Hsieh1), Yu-Sheng HsiehYu-Der Lee 1), Chii-Rong Yang2),National Tsing-Hua University

(Hsinchu, Taiwan), Department ofChemical Engineering, 2> NationalTaiwan Normal University, Dept. ofIndustrial Education, Taipei, Taiwan,ROC

Workshop Program, Page 6

P III - 3

P III - 4

P III - 5

P III - 6

SU8-MicromechanicalStructures with in SituFabricated Movable Parts

Improvement of DevelopingProcess on Ultrathick MicroStructures of JSR THB-430NNegative UV Photoresist byAdjusted Ultrasonic AgitationDeep X-Ray Lithography of SU-8

Update and Advances inHARMST at Sandia

V. Seidemann, M. Feldmann, J.Rabe, S. ButtgenbachInstitute for MicrotechnologyTechnical University of Braunschweig,Braunschweig, GermanyFan-Gang Tseng, and Chih-ShengYuESS National Tsing Hua University,Taiwan, ROC

Izaque A. Maia, Luiz Otavio S.Ferreira, Maria Helena O. Piazzetta,Graziele C. NatalNational Laboratory of SynchrotronLight - LNLS, Microfabrication Group,BrazilJ. M. Hruby, C. C. Henderson, A. M.Morales, P. M. DentingerSandia National Laboratories,Livermore, CA, USA

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Session IV: Precision Engineering and Laser Structuring

Chairpersons: Robert Warrington, Michigan Tech College of Engineering, Houghton,Michigan, USA

Wilhelm Pfleging, Forschungszentrum Karlsruhe, Germany

Oral Presentations

16.40

16.55

17.10

17.25

17.40

P I V - 1

Prototyping of Polymericlicroreactors by VUV Laser

IRadiation

ow to Develop Polymers forMicroprocessing ApplicationsMaterial Design by Tailor-madeChemical StructuresMicrostructures machined byplaning and slotting

M. Wehner, E. Bremus-Kobberling, A.GillnerFraunhofer-lnstitute Laser forTechnology, Aachen, GermanyRobert Gartner, Gerhard Maier,Jurgen StebaniolyMaterials AG, Kaufbeuren,

GermanyThomas SchallerForschungszentrum Karlsruhe,Hauptabteilung Versuchstechnik,GermanyCraig R. FriedrichMichigan Technological University,MEEM Department, Ml, USA

Discussion of Oral and Poster Presentations, Session IV

JW. Pfleging, W. Bemauer, T.Hanemann, M. TorgeForschungszentrum Karlsruhe, Institut

licromechanical Machining of{High Aspect Ratio Prototypes

{Rapid fabrication ofjmicrocomponents - UV-laser[assisted prototyping, laser(micromachining of mold inserts|and replication via lightinduced reaction injectionmolding

fur Materialforschung, Germany

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Workshop Program, Page 7

PIV-2

P I V - 3

P I V - 4

P IV - 5

P I V - 6

P I V - 7

Exposure of photosensitiveglasses with UV-laser radiation

Laser assisted patterning ofpolymers and CE-Chipproduction with motorizedmaskFemtosecond Ultraviolet (248nm) Excimer Laser Machiningof Teflon (PTFE)

Requirements of an IndustriallyApplicable MicrocuttingProcess for Steel Micro-Structures

High Aspect Ratio Meso-scaleparts enable by Wire Micro-EDM

Laser-micromachinedHeterogeneousMicromechanisms withEmbedded Electro-ThermalActuation

U. Brokmann 1), M. Jacquoriei], M.Talkenberg 2), A. Harnisch 1), E.-W.Kreutz 2), D. Hulsenberg 1), R.Poprawe2>

v Technische Universitat llmenau,Fakultat fur Maschinenbau,Fachgebiet Glas- undKeramiktechnologie, llmenau,Germany, 2> Lehrstuhl fur Lasertechnikder RWTH Aachen, GermanyM. Torge, W. PflegingForschungszentrum Karlsruhe, Institutfur Materialforschung, Germany

A.P. Malshe 1'2>, Kiran P. Adhi1 ) ;Roger L. Owings 2>, Tarak A. Railkar1), W.D. Brown2*Materials and ManufacturingResearch Laboratories (MRL), 1>

Dept. of Mechanical Engineering,MEEG 204, 2> Dept. of ElectricalEngineering, University of Arkansas,Fayetteville, AR, USAH. Weule2) , J. Schmidt2), J. Eisner2),V. Huntrup 2), H. Tritschler 1)

u 2> University of Karlsruhe (TH),Institute of Machine Tools andProduction Science (wbk), GermanyGilbert L. Benavides, Lothar F. BiegSandia National Laboratories,Manufacturing Science andTechnology Center, Albuquerque, NM,USAJun Li and G. K. AnanthasureshMechanical Engineering and AppliedMechanics, University ofPennsylvania, Philadelphia, PA, USA

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19.00 Conference Dinner at Baden-Baden, Neues Schloss

(Restaurant "Schlosskeller"

Workshop Program, Page 8

Tuesday, June 19,2001 Page

8.30

9.00

Invited Talks

Generation of Three-Dimensional Microstructure byMetal Jet

Micro Powder InjectionMoulding of Metals andCeramics - Status, Potential andLimits

Katsumi YamaguchiNagoya University, Leader Metal JetPrinter R & D,Japan Science and TechnologyCorporation, Kasugai, JapanJiirgen HauBeltForschungszentrum Karlsruhe, Institutfur Materialforschung III, Germany

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Session V: Replication Technologies

Chairpersons: Heinz Kuck, Stuttgart University, GermanyRobert Ruprecht, Forschungszentrum

Oral Presentations

9.30

9.45

10.00

Replication of High AspectRatio Microstructures inPlastics, Metals, and Ceramics

Micro Powder Metallurgy for theReplicative Production ofMetallic Microstructures

Plastic Embossing of 3DCeramic Microstructures

j

10.15 foouble Sided Hot Embossing ofJMicrostructuresj

i

Karlsruhe, Germany

Alfredo M. Morales, Linda A.Domeier, Marcela Gonzales, Jill M.HrubySandia National Laboratories,Livermore, CA, USAAstrid Rota 1), Tanh Vinh Duong 2),Thomas Hartwig 1)

1> Fraunhofer Institut furFertigungstechnik und AngewandteMaterialforschung (IFAM), Bremen,Germany, 2> Eppendorf GmbH,Hamburg, GermanyB. Su 1), T. W. Button 1), A. Schneider2) and L. Singleton 3)

1> IRC in Materials for HighPerformance Applications,University of Birmingham, Edgbaston,Birmingham, UK, 2> CentralMicrostructure Facility, RutherfordAppleton Laboratory, Chilton, Didcot,Oxfordshire, UK, 3> Institut furMikrotechnik Mainz GmbH, Mainz,GermanyM. Heckele 1), H. Dittrich 1), A. Guber1), T. Schaller2)

Forschungszentrum Karlsruhe,Germany1> Institut fur Mikrostrukturtechnik,2> Hauptabteilung Versuchstechnik

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Workshop Program, Page 9

Tuesday, June 19,2001 (continued) Page

10.30

P V - 1

P V - 2

P V - 3

P V - 4

P V - 5

P V - 6

P V - 7

Discussion of Oral and Poster Presentations, Session V

Feedstock Development forMicro Powder Injection Molding

Production of Metallic HighAspect Ratio Microstructuresby Microcasting

Replication Techniques forCeramic Microcomponents withHigh Aspect Ratios

Rapid Replication of Polymericand Metallic HARMs usingPDMS and LIGA Technology

Wear Resistant MicropartsMade by Micro Powder InjectionMolding

Productive Capacity andSimulation of ThermoplasticMicro Injection Molding

Mechanical Testing ofSpecimens with High AspectRatios Produced by Micro-Casting and Micro-Powder-Injection-Molding

L. Merz, S. Rath, V. Piotter, R.Ruprecht, J. Ritzhaupt-Kleissl, J.HausseltForschungszentrum Karlsruhe, Institutfur Materialforschung III, GermanyG. Baumeister, K. Muller, R.Ruprecht, J. HauBeltForschungszentrum Karlsruhe, Institutfur Materialforschung III, GermanyW. Bauer1', R. Knitter1', G. Bartelt1', D.G6hring1), E. Hansjosten2)

1> Institute for Materials Research III, 2>

Hauptabteilung Versuchstechnik,Forschungszentrum Karlsruhe,GermanyKabseog Kim 1), Yohannes M. Desta2) 4)

Sangwon Park3), Jeong-Bong Lee31,Michael C. Murphy2)

' ; Department of Engineering Science,2) Department of MechanicalEngineering,3> Department of ElectricalEngineering,4> Center for AdvancedMicrostructures and DevicesLouisiana State University, BatonRouge, LA, USAThomas Gietzelt, Volker Piotter,Robert Ruprecht, Jurgen HaulBeltForschungszentrum Karlsruhe,Institute of Material Research III,GermanyVolker Piotter, Klaus Mueller, KlausPlewa, Robert Ruprecht, JuergenHausseltForschungszentrum Karlsruhe,Institute of Material Research III,GermanyM. Auhorn, T. Beck, V. Schulze, D.LoheUniversity of Karlsruhe, Institute ofMaterials Science and Engineering 1,Germany

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Workshop Program, Page 10

Page

Session VI: Lithography - Structure Limitations

Chairpersons: Susumu Sugiyama, Ritsumeikan University, Shiga, JapanJurgen Mohr, Forschungszentrum Karlsruhe, Germany

Oral Presentations

11.20

11.35

Modeling Acoustic Agitation forEnhanced Development ofPMMA resistsSurface Roughness Control byEnergy Shift in Deep X-RayLithography

11.50 |The influence of X-Ray(Fluorescence on LIGA Sidewall[Tolerances

12.05 Numerical simulation of thermaldistortions in deep and ultradeep X-Ray lithographyi

R.H. Nilson, S.K. Griffiths and A. TingSandia National Laboratories,Livermore, CA, USAYao Cheng 1)2), Chiu-Nen Chen 2>,Feng-Tai Hwang 2>, Ching-ChangChieng2), Fan Gang Tseng2), andJeng Tzong Sheu 1)

1> Synchrotron Radiation ResearchCenter, Hsinchu, Taiwan, ROC, 2)

Department of Engineering andSystem Science, National Tsing-HuaUniversity, Hsinchu, Taiwan, ROCS. K. Griffiths and A. TingSandia National Laboratories,Livermore, CA, USAS. Achenbach, F.J. Pantenburg, J.MohrForschungszentrum Karlsruhe, Institutfur Mikrostrukturtechnik, Germany

12.20 Discussion of Oral and Poster Presentations, Session VI

PVI -1

PVI -2

Adhesion Measurements ofThin-Film Polymer/MetalInterfaces Used in LIGAFabrication

A simulation tool underwindows for synchrotron X-Rayexposure and subsequentdevelopment

j

PVI -3

PVI -4

Deep Lithography with a LowEnergy Synchrotron Source:Fabrication of X-Ray RefractiveSingle LensesTransport Limitations onDevelopment Times of LIGAjPMMA resists

Brian Somerday, Steven Goods,Renee Shediac, Nancy Yang, andMiles CliftSandia National Laboratories,Livermore, CA, USAP. Meyer1', C. Cremers2', A. El-Kholi1',D. Haller1', J. Schulz1',L. Hahn1', S. Megtert2'; Forschungszentrum Karlsruhe,Institut fur Mikrostrukturtechnik (IMT),Germany2> LURE. Laboratoire pour /'Utilisationdu Rayonnement ElectromagnetiqueCentre Universitaire Paris Sud, OrsayCedex, FranceY. Zhang, T. Katoh and D. AmanoSumitomo Heavy Industries, Ltd.,Tanashi, Tokyo, Japan

S. K. Griffiths and R.H. NilsonSandia National Laboratories,Livermore, California, USA

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Workshop Program, Page 11

P V I - 5 lUse of Graphite Substrates forDeep X-Ray Lithography

P V I - 6 Simulation of Deep X-RayLithography at NSRL

P V I - 7 Deep X-Ray lithography atELETTRA using a central beam-stop to improve structureadhesion on the substrate

P VI - 8 Side Wall Roughness in UDXRL

P V I - 9 IGA Measurement andcceptance Evaluation

KKCP-613-6410)

PVI -10 Research and Service in LIGAMicro fabrication at CAMD

PVI-11 A New Approach to Microfabrication and Synthesizationfusing Synchrotron RadiationJExcited Chemical Reaction

Derrick C. Manciniv, NicolaieMoldovan 1), Olga V. Makarova2),Andrew G. Peele 3), Thomas H. K.Irving3'1) Advanced Photon Source, Argonne[National Laboratory, Argonne, IL,USA,2> Creatv MicroTech, Inc.Potomac, MD, USA,3) School ofPhysics, University of Melbourne,Parkville 3010, AustraliaXuehong Tian, Gang Liu, YangchaoTianNational Synchrotron Radiation Lab,University of Scienceland Technology of China, Hefei,lAnhui, P. R. ChinaFrederic Perennes 1), Erik Vesselli1)

and Franz Josef Pantenburg 2)

1> Sincrotrone Trieste, Experimentaldivision, Italy, 2>

Forschungszentrum Karlsruhe, Institutfur Mikrostrukturtechnik, GermanyNicolaie Moldovan 1), Derrick C.Mancini1), Ralu Divan 1), OlgaV.Makarova2), Andrew Peele 3)

1> Advanced Photon Source, ArgonneNational Laboratory, Argonne, IL,USA, 2> Creatv MicroTech, Inc.Potomac, MD, USA, 3> School ofPhysics, University of Melbourne,Parkville 3010, AustraliaBob Dearth, Rob Steinhoff, SamRamsdale, Madhuri Widmer, KevinSwallow, Roger BurtonHoneywell International, FederalManufacturing & Technologies(FM&T), Kansas City, Missouri, USAJost Goettert, Georg Aigeldinger,fYohannes Desta, Linke Jian, KunLian, Zhong- Geng Ling, ShalomaMalveaux, Timo MappesCenter for Advanced Microstructuresand Devices (CAMD), Louisiana StateUniv., Baton Rouge, LA, USAYuichi Utsumi and Tadashi HattoriHimeji Institute of Technology,Laboratory of Advanced Science andTechnology for Industry, Hyogo,Japan

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12.50 Lunch Break

Workshop Program, Page 12

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14.00

14.15

14.30

14.45

15.00

15.15

15.30

Session VII: Electroforming

Chairpersons: Lubomir Romankiw, IBM, Yorktown, NY, USAWalter Bacher, Forschungszentrum Karlsruhe, Germany

Oral Presentations

[Process Developments forMicrosystem Plating

ew Electroplated Materials forLIGA Micromachining at SandiaNational Laboratories

High-strength Ni-WElectrodeposits for Microfabrication Technology

D.L. de KubberPhilips Galvanotechniek Eindhoven,Business Development, NetherlandsRichard P. JanekSenior Member of the Technical Staff,Microsystems ProcessingDepartment, Sandia NationalLaboratories, Livermore, CA, USATohru Yamasaki1), TakayasuMochizuki2> and Takeshi Fukami1>

1> Department of Materials Science &Engineering, Himeji Institute ofTechnology, Himeji, Hyogo, Japan, 2>

Laboratory of Advanced Science &Technology for Industry, HimejiInstitute of Technology, Hyogo, JapanLi-Wei Pan 1>, Liwei Lin2)

Berkeley Sensor and Actuator Center,1> Mechanical Engineering, TheUniversity of Michigan, USA, 2)

Mechanical Engineering, University ofCalifornia at Berkeley, USAH. Lowe, M. Kiipper, M. Reimann, K.SchroderInstitut fur Mikrotechnik Mainz GmbH,Mainz, GermanyH. S. Cho 1), W. G Babcock2), H. Last3) and K. J. Hemker1)

1> Dept. of Mechanical Engineering,Johns Hopkins University, Baltimore,MD, USA, 2) Naval Surface WarfareCenter, Indian Head Division, IndianHead, MD, USA, 3> Institute forDefense Analyses, Alexandria, VA,USA

Discussion of Oral and Poster Presentations, Session VII

lectroplated 3DMicrostructures Fabricated by aStep-Height Control Method

Stress Minimized Mold Insertsfor HARMST-Applications byElectrodeposition

Tensile Properties of LIGA Nitructures for a Safety andArming Device

P VII -1 (Characterization ofelectroplated nickel

P VII - 2 Fabrication of Thick FilmMagnetic Core with HighAspect Ratio and LongStructure Using LIGA

IT. Fritz, W. Mokwa, and U.SchnakenbergInstitute for Materials in ElectricalEngineering I, RWTH Aachen,GermanyShinsuke Takimoto 1), Hiroshi Ueno 1),Susumu Sugiyama 1>, MasahiroYamaguchi , Makoto Baba2) andKen-lchi Arai2)

r Ritsumeikan University, Faculty ofScience and Engineering, Japan,2> Tohoku University, ResearchInstitute of Electrical Communication,Japan

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Workshop Program, Page 13

P VII - 3 Flip Chip ElectricalInterconnection by SelectiveElectroplating and Bonding

P VII - 4 {Tensile, Creep and FatigueTesting of LIGA Ni-Micro-samples

P VII - 5 jMicrostructure Evolution and{Surface Mechanical Propertiesof Electroplated Nickel as aFunction of ProcessingParameters

P VII - 6

P VII - 7

P VII - 8

P VII - 9

P V I I -10

Swelling of PMMA-structures inaqueous solutions and roomtemperature Ni-electroforming

Anodic Alumina as a Materialfor High-Aspect RatioMicrostructuresEnhanced Fabrication andAssembly of Magnetic(Actuators

Electroplated Nickel-Iron Alloyas Material for LIGA-MouldInserts

Development of an InternalStress Monitoring of the NickelMicrolectroforming

Li-Wei ParT7, Phyllis Yuen Z), LiweiLin 2> and Ernest J. Garcia 3)

Berkeley Sensor and Actuator Center,1> Mechanical Engineering, TheUniversity of Michigan, USA, 2>

Mechanical Engineering, University ofCalifornia at Berkeley, USA3> Sandia National Laboratory, USAK. J. Hemker 1>, H. S. Cho 1>, Y. Desta2), K. Lian 2) and J. Goettert2)

Departments of MechanicalEngineering and Materials Science,The John Hopkins University,Baltimore, MD, USA, 2> Center forAdvanced Microstructures & Devices\(CAMD), Louisiana State University,[Baton Rouge, LA, USAjKun Lian 1), Jie Chao Jiang 2), DeanJGuidry2), Z-G Ling, Jost Goettert 1),jE.I. Meletis2)

!'; Center for AdvancedMicrostructures and Devices,Louisiana State University, BatonRouge, LA, USA, 2> Mechanical[Engineering Dept, Louisiana State'University, Baton Rouge, LA, USAA. Ruzzu, B. MatthisForschungszentrum Karlsruhe,Institute for MicrostructureTechnology, GermanyKirill I. Delendik, Olga L. VoitikInstitute of Electronics, Belarus\Academy of Science, Minsk, BelarusBidhan P. Chaudhuri1>, KevinFischer1), S. McNamara, HenryGuckeUniversity of Wisconsin, Madison, Wl,USA, 1> presently with Intel Corp., SanJose, CA, USAK. Bade, A. Fath, F. Winkler, W.LeskopfForschungszentrum Karlsruhe, Institutfur Mikrostrukturtechnik, GermanyK. Bade, M. Streeb, J. SchulzForschungszentrum Karlsruhe, Institutfur Mikrostrukturtechnik, Germany

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Workshop Program, Page 14

Page

16.20

16.35

16.50

17.05

17.20

Session VIII: Applications

Chairpersons: Heinz Lehr, Technical University, Berlin, GermanyPeter Bley, Forschungszentrum Karlsruhe, Germany

Oral Presentations

Micro-Hinges changed flexuralRigidity Intermittently forMicromechanism Joints

RibCon®: Micromolded Easy-Assembly Multifiber Connectorfor Single- and Multimode

pplications

wo-Dimensional MetallicPhotonic Band-Gap CrystalsFabricated by LIGA

Micro-Structured Flow Fieldsfor Small Fuel Caps

, New Ultrasonic CatheterSystem with Micromotor and

ILIGA Gear-Boxes

Mikio Horie 1), Shinnosuke Torii2' andDaiki Kamiya 1)

1> Tokyo Institute of Technology,Precision and Intelligence Laboratory,2> Graduate Student of Tokyo Instituteof Technology, Tokyo, JapanU. Wallrabef), H. Dittrich1', GFriedsam4', Th. Hanemann2', J. Mohr1), K. Muller2', V. Piotter2', P.Ruther5',Th. Schaller3', W. ZiBler4'1) - 3): Forschungszentrum Karlsruhe:1) Institute for MicrostructureTechnology 2) Institute for MaterialResearch III, 3) Central ExperimentalDepartment,4) Spinner GmbH, Munchen5) current address: IMTEK, Universityof FreiburgGermanyN. Katsarakis 1), M. Bender1), LSingleton 2>, G Kiriakidis 1), C. M.Soukoulis 1)

1> Institute of Electronic Structure andLaser (IESL), Foundation forResearch and Technology Hellas(FORTH), Heraklion, Greece, 2)

Institute of Microtechnology MainzGmbH, Mainz, GermanyM. Muller, C. Muller, C. Hebling 1>, A.Heinzel1', W. MenzInstitut fur MikrosystemtechnikIMTEK, Albert-Ludwigs-Universitat,Freiburg, Germany,

Fraunhofer Institute for SolarEnergy Systems ISE, Freiburg,GermanyR. Ledworuski, H. Lehr, GNiederfeld, S. Walter, J. Tschepe 1)

Institut fur Mikrotechnik undMedizintechnik, TechnischeUniversitat Berlin, Berlin, Germany, v

MGB Endoskopische Gerate GmbHBerlin, Berlin, Germany

Workshop Program, Page 15

Tuesday, June 19,2001 (continued) Page

7.35

P VIII - 2

Discussion of Oral and Poster Presentations, Session VIII

[T Kohlmeier 1), V. Seidemann 2>, S.\Buttgenbach 2) and H. H. Gatzen)f Institute for Microtechnology,\Hannover University, Hannover,\Germany, 2> Institute forMicrotechnology, BraunschweigUniversity of Technology,Braunschweig, Germany

Fabrication of microreactors for Liu Gang, Tian yangchao and Kan Ya

P VIII - 1 Application of UV DepthLithography and 3D-Microforming for High AspectRatio ElectromagneticMicroactuator Components

P VIII - 3

catalytic reaction

High Performance FlatMiniature Heat Pipes Fabricatedby UD-LIGA Process

P VIII - 4 Electrical bottom sidecontacting ofelectromechanical LIGA-structures by vias and screenrinting

P VIII - 5 JA New 3-DimensionalProcessing Technique withApplications in LargeDisplacement ElectrostaticActuation

P VIII - 6 Design and Fabrication of aThermo-mechanicalMicroactuator for HighTemperature Applications

P VIII - 7 Pneumatically Bi-directionalMicrofluidic Regulation usingVenturi Pumps by Deep RIE andBonding Technology

P VIII - 8 Fabrication and testing of aCross flow Micro HeatExchanger

P VIII - 9 Restrictions in the design ofgear wheel components anddrives for micro technology

National Synchrotron RadiationLaboratory, University of Science andTechnology of China, Hefei, P. R.ChinaY. Cheng 1), P. P. Ding 2), T. S. Sheu2), B. Y. Shew 1), P. H. Chen 2)

1) Synchrotron Radiation ResearchCenter, Taiwan, R.O.C., 2> Departmentof Mechanical Engineering, NationalTaiwan University, Taiwan, R.O.C.A. Ruzzu 1), O. Fromhein 2), D. HallerD

Forschungszentrum Karlsruhe,Germany11 Institute for MicrostructureTechnology (IMT),2) Department of Data Processing andElectronics (HPE)Kanakasabapathi Subramanian,Xiaojun Huang and Noel

.MacDonaldCornell University, Ithaca, NY, USA

Proyag Datta 1), E. J. Podlaha2),Sumanta Acharya 1) and Michael C.Murphy 1)

Department of MechanicalEngineering, 2> Department ofChemical Engineering, LouisianaState University, Baton Rouge, LA,USAC.K. Chung, W.J. Chang, C.L Hsiao,and K.Y. WengMicrosystems Technology Center,Chutung, Hsinchu, Taiwan, ROCChad Harris, Mircea Despa, KevinKellyMechanical Engineering Department,Baton Rouge, LA, USAJ. Marz, A. AlbersInstitute of Machine Design andAutomotive Engineering, Departmentfor Engineering Science Methodologyand Management, University ofKarlsruhe, Germany

Workshop Program, Page 16

P VIII -10

Fabrication of MicromachinedResonating CylinderGyroscopes

P VIII -11

Development of FreestandingCopper Anti-scatter Grid UsingDeep X- ray Lithography

Yohannes M. Desta v, 2\ Michael C.Murphy 1), James Goldie 3>, JeromeKiley3'and Robert Howatt3>

'•* Louisiana State University,Microsystems Engineering Team,Dept. of Mech. Engineering,2)

Louisiana State University, Center forAdvanced Microstructures andDevices, 3> SatCon TechnologyCorporation, Cambridge,Massachusetts, USAOlga V.Makarova 1>, Cha-Mei Tang 1),Nicolaie Moldovan 2), David G Ryding

Derrick C. Mancini2)

Creatv MicroTech Inc., Potomac,MD, USA, 2> Advanced PhotonSource, Argonne National Laboratory,\Argonne, IL, USA

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Conference Adjourns - NextHARMST2003

End of HARMST Workshop

Author Index 263

Workshop Program, Page 17