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Inovar na produção & aplicações de nanomateriais

19 Abril 2012

Coimbra Novos materiais e sistemas para a sustentabilidade

2 © 2011 INNOVNANO. All rights reserved

Innovnano

Forecasted investment in R&D and equipments for 2012 – 4,6 M€

6 patents (grant and pending)

New plant in Coimbra already built

Intensive cooperation with national and international entities

(Universities, Institutes, companies)

Member of NIA, Nanocentral, and Nanofutures

Commercial department based in UK

3 © 2011 INNOVNANO. All rights reserved

Coimbra Project

Project highlights

Up to 1000 tpy of production

capacity

Modular concept allowing for

dedicated production lines

Product customization

Reproducibility & Reliability

Part of the largest chemical company

in Portugal, with more than 100

years of experience

4 © 2011 INNOVNANO. All rights reserved

Innovnano

Production method

At Innovnano we have developed a unique and innovative process to produce Micro and Nanomaterials

Distinctive synthesis

conditions leading to

unique product

properties

Capability to produce

high quantities

Flexible process

applicable to a wide

range of precursors

Cost effective process

5 © 2011 INNOVNANO. All rights reserved

Strategy

Target markets

Ceramic

nanostructured

materials

Energy

Electronics

Technical Ceramics

Thermal Barrier Coatings

6 © 2011 INNOVNANO. All rights reserved

Applications

Energy

Lithium Batteries

Lithium compounds;

Solide Oxide Fuel Cells

Fully stabilized Zirconia (8Y and 10Y ZrO2) for

electrolyte production;

Photovoltaic cells

Aluminum doped Zinc Oxide (AZO) sputtering targets.

7 © 2011 INNOVNANO. All rights reserved

Applications

Technical Ceramics

Structural Technical Ceramics

Partially Stabilised Zirconia (3Y);

Biomedical applications

Partially Stabilised Zirconia (3Y);

Alumina Toughened Zirconia (ATZ);

Translucent Ceramics

Cubic Zirconia (8Y)

Magnesium Aluminum Oxide (Spinel) – MgAl2O4.

8 © 2011 INNOVNANO. All rights reserved

Applications

Thermal Barrier Coatings

Atmospheric Plasma Spray – APS

Spray Dried Zirconia (4Y);

Suspension Plasma Spray

4Y ethanol base suspension;

4Y water base suspension.

9 © 2011 INNOVNANO. All rights reserved

Applications

Electronics

Sintered aluminum doped zinc oxide for TCOs

production – Sputtering targets;

Aluminum doped zinc oxide ethanol based

suspension for direct deposition.

10 © 2011 INNOVNANO. All rights reserved

Solar Cells

Why AZO?

AZO

Abundance;

Absence of toxicity;

High thermal stability;

Replacement of ITO by AZO….

Low cost material;

Highly transparent thin films;

Low electrical resistivity (10-3 - 10-4 Ωcm).

11 © 2011 INNOVNANO. All rights reserved

AZO nanostructured powder

Innovation - Synthesis process

Precursor(s)

High temperature High pressure Quenching

Nanoparticles (bottom-up approach) T

500 – 3 000 ºC

P

2 000 – 4 000 bar

12 © 2011 INNOVNANO. All rights reserved

Innovation - Synthesis process

High pressures High temperatures

T

1700 K – 4000 K

or more!

Plasma formation

P

In the order of

the GPa!

Quenching of the

particles formed

Uniform distribution of

the reactants in the

plasma

High speed reaction

AZO nanostructured powder

13 © 2011 INNOVNANO. All rights reserved

Aluminum doped Zinc Oxide (AZO)

From materials to devices

How to produce thin films solar cells?

AZO powder

Ceramic targets

Thin films Solar cells

14 © 2011 INNOVNANO. All rights reserved

AZO nanostructured powder

Morphological characterization – SEM and TEM

SEM image showing the general morphology of as-produced nanocrystalline Al-doped ZnO

powder.

(A) TEM image of as-produced Al-doped ZnO powder. (B) EDS recorded from the circular region

presented in (A).

15 © 2011 INNOVNANO. All rights reserved

AZO sputtering targets

Small particle size

(D50: 150 nm)

Highly specific

surface area

(~ 12 m2g-1)

Lower sintering

temperatures

(1100-1200°C)

High sinterability

Uniaxial pressing

Conventional

sintering

Low-price AZO

sputtering

targets

Reduction of

photovoltaic

production costs

High density AZO

targets (> 98%)

Processing Powder Properties

Controlled grain size (< 5µm)

16 © 2011 INNOVNANO. All rights reserved

AZO sputtering targets

Thin films and application on solar cells

Glass

TCO

A-Si:H

AZO (Reflective and conductive Layer)

Glass

Standard (A) and Semitransparent (B) solar cells produced with INNOVNANO AZO sputtering targets

17 © 2011 INNOVNANO. All rights reserved

Thin films and application on solar cells

AZO sputtering targets

Innovnano AZO thin films morphology deposited at room temperature

Low electrical resistivity: 1x10-3 - 5x10-4 Ωcm;

Transmittance: > 80 %;

Homogeneous spatial electrical resistivity;

Excelent results in thin films solar cells performance compared with benchmarket produts

18 © 2011 INNOVNANO. All rights reserved

Thanks for your attention!!!