lab1_nmos & pmos

Upload: thevenin-norton-tong-tong

Post on 04-Apr-2018

223 views

Category:

Documents


0 download

TRANSCRIPT

  • 7/29/2019 Lab1_nMOS & pMOS

    1/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 1

    ELECTRICAL ENGINEERING DEPARTMENT

    EE603-CMOSINTEGRATEDCIRCUITDESIGN

    DESIGNING N-MOS & P-MOS

    No Registration No. Name

    1. 18DTK10F1036 CHONG WEI TING

    2. 18DTK10F1034 ADLAN BIN ABDULLAH

    CLASS : DTK 6B

    LECTURER : EN. MUHAMAD REDUAN BIN ABU BAKAR

    DATE SUBMITTED : 7th FEBRUARY 2013

    (Date submitted is one week after date lab)MARKS

    Lab Work :

    Lab Report:

    Total :

  • 7/29/2019 Lab1_nMOS & pMOS

    2/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 2

    LAB 1 : DESIGNING N-MOS & P-MOS

    Aim: Designing n-MOS & p-MOS using L-edit software.

    Objective:

    After students had done this laboratory, then students should be able to:

    1) To introduce schematic symbol, cross section and layout of n-MOS & p-MOS.

    2) To design n-MOS and p-MOS using L-edit software.

    Apparatus: PC-set & L-edit student V 7.12 software.

    The Student version of L-Edit contains all of the major tools provided with the full

    version, including circuit extraction, a design rule checker (DRC), and a cross section

    viewer that allows we to see the layers in the finished chip. Every effort was made to

    ensure that the version of L-Edit would be useful in both classroom and research

    application.

    The user interface provided by L-Edit is similar to that of many other CAD and layout

    design software packages. There are three important sections of the L-Edit User

    Interface:

    i. Tool Bars

    ii. Side Bars

    iii. Drawing Area

    Figure 1: Tool Bars

    INTRODUCTION

  • 7/29/2019 Lab1_nMOS & pMOS

    3/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 3

    Figure 2: Side bars

    Design rules are set of guidelines that specify the minimum dimension and spacing

    allowed in a layout drawing. They are derived from constrains imposed by the

    processing and others physical consideration. Violating a design rules may result a non-

    functional circuit, so that they are crucially important to enhancing the die yield.

    Figure 3: Minimum width and spacing

  • 7/29/2019 Lab1_nMOS & pMOS

    4/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 4

    (10 marks)

    In the beginning of lab we introduce basic of schematics symbol and crosssection of the P-MOS and N-MOS.

    Figure 4: Schematic symbol of P-mos

    Figure 6: Schematics symbol of N-mos

    Figure 5: Cross Section of P-mos

    Figure 7: Cross section of N-mos

  • 7/29/2019 Lab1_nMOS & pMOS

    5/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 5

    1.

    (40 marks)

    State the procedure of draw p-MOS/n-MOS layout. (5 marks)

    a) Selected the FILE, and then clicked the NEW to create a new layout. A dialog will

    appear asking for a layout name as well as a location to copy a TDB setup from.

    Selected the browse to select manin08.tdb, and double click it.

    b) The file of TBD setup D:\L-Edit Student v7.12\mosis\mamin08.tdb will appear

    on new file dialog, and then click OK. A new layout area would be appearing on

    the window.

    LAB WORK ACTIVITY

    1

    2

    3

  • 7/29/2019 Lab1_nMOS & pMOS

    6/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 6

    c) Selected SETUPDESIGN, the setup design dialog will appear, and then

    chosen Grid from tool bar, and had to type 1 locator unit on command box to

    change the mouse snap grid.

    d) Drawn two Active regions in the design. The Active layer denotes an opening in

    the field oxide through which n-type and p-type depositions can be made we

    need an area for the source and drain of the transistor, as well as a connection

    for the substrate. To select the ACTIVE then clicked BOX.

    1

    2

    3

    4

  • 7/29/2019 Lab1_nMOS & pMOS

    7/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 7

    e) Draw P- selection region over the source/drain Active areas, respectively.

    f) Clicked the right key of the mouse at layer selection bar, and then selected the

    setup.

  • 7/29/2019 Lab1_nMOS & pMOS

    8/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 8

    g) The setup dialog would appeared on the window, then chosen

    Renderinghighlight second selectionDelete PassOk.

    h) Drawn the N-select beside the P-selection region by same setup method of P-

    select. This N-select refer to substrate active region.

    1

    2

    3

    4

  • 7/29/2019 Lab1_nMOS & pMOS

    9/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 9

    i) Drawn a Poly layer rectangle between the active region of the source/drain.

    j) Drawn N-Well over the over the P/N-Select and active region of the source/drain,and also the poly-crystal gate.

  • 7/29/2019 Lab1_nMOS & pMOS

    10/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 10

    k) Drawn Active contacts in the source and substrate active region.

    l) Draw Metal1 layer connections to each of the four contact points. Note that it issupply to connect source of the P-type MOSFET to the substrate and then toVDD.

  • 7/29/2019 Lab1_nMOS & pMOS

    11/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 11

    m) Selected ToolDRC, to ensure that the design does not violating any design

    rules. (20 mark)

    n) Selected ToolCross section, after that the generate cross section dialog would

    be appear on the window. And then clicked Browse, and selected the

    mamin08.xst file and double clicked it.

  • 7/29/2019 Lab1_nMOS & pMOS

    12/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 12

    o) Selected a vertical coordinate using Pick. Place the horizontal black line across

    the design, and then click OK. The cross-sectional view will be generated as

    shown in second of Figure below. Then clicked OK. The cross section would

    show on result page.

  • 7/29/2019 Lab1_nMOS & pMOS

    13/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 13

    p) Now we are looking for N-MOS, so we just exchange the selection region withsame method of setup layer, and then delete the p-well. And then also changethe position of metal 1 and active contact. Note that it is common to connectsource of the N-type MOSFET to the substrate and then to GND.

    q) Using same method of DRC and Cross-section generation as previous P-MOS,

    to check the design rules and also generate the cross section of N-MOS.

    Note that if any mistake for dimension, we can select the shape and use the

    middle of mouse to edit and move the shape that we had drawn.

  • 7/29/2019 Lab1_nMOS & pMOS

    14/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 14

    Proven the printed L-Edit layout drawing of p-MOS & n-MOS transistor

    (with no DRC errors). 10 mark

    i)

    P-MOS layout

    RESULT

  • 7/29/2019 Lab1_nMOS & pMOS

    15/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 15

    ii) N-MOS layout

  • 7/29/2019 Lab1_nMOS & pMOS

    16/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 16

    1. What does it mean by feature size or technology size?

    Feature size means the size of the elements on a chip, which is designated by the gate

    of the transistor." The smallest feature size is generally smaller than the feature size for

    a technology generation (technology node). For example, the 180 nm technology

    generation will have gate lengths smaller than 180 nm. Feature size also known as

    technology size.

    2. Explain the difference between micron unit and lambda unit in layout process.

    The micron-Rule means that all width and spacing rules from the foundry is specified as

    absolute values and using for fixed of technology so this is available lithography. i.e. e.g.

    M1 min width = .8u ; M1M1 min spacing = .14u etc. By Lambda Rule - Each of the width

    spacing rules etc. are specified as a multiple. e.g. M1 min width = 2Lambda; M1M1 min

    spacing = 3Lambda etc. So thatlambda unit is made for the designer's convenience todraw the layouts properly. Hence, in-order to design the layout conveniently lambda

    units are usually employed. According to our selection the layout screen will adjust the

    grid, so that we can design the layouts as per the DRC (Design Rules)

    requirements. For example for a .5u process if Lambda is .3u then that then will

    evaluate to the values of M1 min width = .6u and M1M1 min spacing = .9u

    (10marks)

    DISCUSSION FOR QUESTION

  • 7/29/2019 Lab1_nMOS & pMOS

    17/17

    [DESIGNING N-MOS & P-MOS] February 7, 2013

    DECEMBER 2012 SESSION Page 17

    This lab work will consider the basic design of an n-type MOSFET and p-

    type MOSFET on a p-type substrate is presented. An NMOS/PMOS transistor

    consists of an n-type/p-type source and drain regions, a gate terminal, and a

    substrate terminal. After I had done this experiment, so I should be able to introduce

    schematic symbol, cross section and layout of n-MOS & p-MOS and to design n-

    MOS and p-MOS using L-edit software student version 7.12. During our design lab,

    we had to follow the design rule and using design rule checking check our design

    property. Once DRC is finished running, we able to use the Find feature to find the

    individual errors. Lastly we able to view the cross section of our design after we done all

    the DRC.

    In the lab, we had to conclude a MOSFET is a four terminal device, requiring not

    only connections to the Source, Drain, and Gate, but the Substrate as well.

    (5marks)

    CONCLUSION