lecture 3: transistor as an thermonic switch · lecture 3: transistor as an thermonic switch...
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Lecture 3: Transistor as an thermonic switch
2016-01-21 1Lecture 3, High Speed Devices 2016
Lecture 3: Transistors as an thermionic switch
2016-01-21 2Lecture 3, High Speed Devices 2016
Reading Guide: 54-57 in Jena
Transistor metrics
• Reservoir – equilibrium
• Thermionic switch – basics of transistor operation
• FET/Bipolar Transistor
• FET – Short channel effects
N-type Field Effect Transistor – Large Signal DC
2016-01-21 3Lecture 3, High Speed Devices 2014
+Vgs
Ids=f(Vgs,Vds)
IDS
IDS
Gate
Source
Drain+VDS
N-type Field Effect Transistor – Metrics
2016-01-21 4Lecture 3, High Speed Devices 2014
VGS VGS
I D (m
A/µ
m)
VDS= VDS=
g m(m
S/µ
m)
Output Characteristics Transfer Characteristics Transconductance
VT – Threshold voltage
𝑅𝑜𝑛 = 𝑑𝐼
𝑑𝑉𝐷𝑆
−1
𝑉𝐷𝑆→0𝑉
𝑔𝑑 = 𝑑𝐼𝐷𝑑𝑉𝐷𝑆 𝑉𝐷𝑆,𝑉𝐺𝑆
VT – when the current becomes ‘small’
𝑔𝑚 = 𝑑𝐼𝐷𝑑𝑉𝐺𝑆 𝑉𝐷𝑆,𝑉𝐺𝑆
(mS/µm)
(mS/µm)
(Wµm)
Output conductance
On-resistancece
A good FET has:Low RON, low gd, large gm, VT>0V and a large BVDS
Voltage gain requires gm>gd
gd
Ron
BVDS
N-type Field Effect Transistor – Metrics (off-state)
2016-01-21 5Lecture 3, High Speed Devices 2014
VGS VGS
I D (m
A/µ
m)
VDS=0.8VVDS=0.8V
Log
(ID)
Output Characteristics Transfer Characteristics Transconductance
VT – Threshold voltageBVDS
VDS=50 mV
VDS=50 mV
ID below VT :Sub threshold current
Ideal inverse subthreshold slope: 𝑘𝑇
𝑞log10(𝑒) ≈ 60 𝑚𝑉/𝑑𝑒𝑐𝑎𝑑𝑒
Drain Induced barrier lowering DIBL (mV/V)
SS
A FET for digital applications has:SS ~60mV/decadeSmall DIBL (10-40mV/V)
Npn Bipolar transistor – Large Signal DC
2016-01-21 6Lecture 3, High Speed Devices 2014
VBE
Ids=f(VBE,VCE)
IC
IE=IC+IB
Base
Emitter
Collector
IB
Npn Bipolar transistor – Metrics
2016-01-21 7Lecture 3, High Speed Devices 2014
𝑔𝑚 =𝐼𝐶𝑉𝑡
Collector current density: JC (mA/µm2) Current gain: 𝛽𝐹 =𝛿𝐼𝐶
𝛿𝐼𝐵
Output conductance:gd (mS/µm2) A good HBT has:Very low gd, large JC, large bF
large BVDS
Voltage gain requires gm>gd
gm follows from IC:
HBTs are rarely operated at low VDS
-> Ron usually not important.
Ohmic contact - Reservoir
2016-01-21 8Lecture 3, High Speed Devices 2014
Metal n++ semiconductor
+VS
Ideal ohmiccontact
• The applied bias sets the metal fermi level with respect to ground. (Electric potential <-> )
• An ideal ohmic contact keeps the semiconductor in (Gibbs) equilibrium with the metal <-> Equal EF
• The n++ doping keeps the semiconductor bands
flat for moderate current densities (𝑑𝐸𝑓
𝑑𝑥=
𝐽
𝜇𝑛𝑛)
Lightly doped semiconductor
Reservoir for electrons
EC
Ev
EF
n+ - i – n+ Resistor: ballistic current
2016-01-21 9Lecture 3, High Speed Devices 2014
n++
+0 V
Lightly doped semiconductor
n++
kx
E
EF,L EF,R
If no scattering – electrons flowing from left to right have positive kx
electrons flowing from right to left have negative kx
No current flows: +kx and -kx are equally occupied!
𝑣𝑋 =ℏ𝑘𝑥
𝑚∗
Positive current: kx>0Negative current: kx<0
n+ - i – n+ Resistor: ballistic current
2016-01-21 10Lecture 3, High Speed Devices 2014
n++
+VD
Lightly doped semiconductor
n++
qVD
kx
E
An applied bias lowers the drain reservoir by qVD
+kx is populated by EF,L. –kx is populated by EF,R.
EF,L
EF,R
𝐸𝐹,𝑅 = 𝐸𝐹,𝐿 − 𝑞𝑉𝐷
This leads to a net electron current from left to right
𝑣𝑋 =ℏ𝑘𝑥
𝑚∗
Positive current: kx>0Negative current: kx<0
General Transistor Model
2016-01-21 11Lecture 3, High Speed Devices 2014
VDS
n++ Channel/Base n++
SourceEmitter
DrainCollector
VCE
Ideal transistor the potential energy of the channel is only controlled by the gate/base terminal.HBT – direct control of EC,channel
FET – indirect control of EC,channel
VGS
VBE
EF,LEF,R
EC
General Transistor Model
2016-01-21 12Lecture 3, High Speed Devices 2014
EC
EC
EC EC EC
VGS=0.4VVDS=0V
VGS=0.4VVDS=0.1V
VGS=0.4VVDS=0.4V
VGS=0.6VVDS=0.4V
VGS=0.1VVDS=0.4V
Bipolar Transistor Realization
2016-01-21 13Lecture 3, High Speed Devices 2014
n++ p+ n++
VBE
The base is a p+ regionThe base terminal is connected directly to the base
This constitutes a reservoir for holes – not for electrons
VCE
EC
VBE
+VCE
VBE
JEJC𝑛 − 𝑛0
𝜏
• No e-field• Diffusion with recombination• Recombination: base current
VCE
QW
Field Effect Transistors - realization
2016-01-21 14Lecture 3, High Speed Devices 2014
p
+VGS
+VDS
n++ n++
Insulator
Small Bandgap (i)
+VGS
+VDS
Wide Bandgap
Wide Bandgap/insulator
+VGS
n++ n++
Insulator/WB
n++ n++
QW / Nanowire
+VGS
n++ n++
Insulator/WB
Insulator/WB
+VGS
+VDS
+VDS
Traditional Si-MOSFET
Traditional HEMT
Quantum Well HEMT /SOI MOSFET/ Graphene FET…
FinFET / Nanowire FET / Carbon Nanotube FET
Field Effect Transistors – indirect channel potential control
2016-01-21 15Lecture 3, High Speed Devices 2014
Positive VGS NegativeVGS
Positive VGS
NegativeVGS
y
x
y x
Field Effect Transistors – indirect channel potential control
2016-01-21 16Lecture 3, High Speed Devices 2014
𝐽𝑑𝑟𝑖𝑓𝑡 = 𝑞𝜇𝑛𝑛 𝑥 𝜀 𝑥 = −𝜇𝑛𝑛 𝑥𝑑𝐸𝑐
𝑑𝑥
Long channel FET diffusive: potential drop along the channel required.
Channel potential not 100% controlled by the gate – complicates things. n(x) decreases -> pinch off.
Field Effect Transistors – subthreshold current
2016-01-21 17Lecture 3, High Speed Devices 2014
𝐹𝑗
𝐸𝐹 − 𝐸1
𝑘𝑇≈ 𝑒(𝐸𝐹−𝐸1)/𝑘𝑇
When E1 >> EF,L
• Exponential tail of Fermi-Dirac function:
• Current decreases exponentially with increasing E1
• This gives ideally a 60 mV / decade slope
• Theoretical limit for a thermionic switch
• 105 on-off ratio: at least 0.3 VGS
E1
EFL
Field Effect Transistors – indirect channel potential control
2016-01-21 18Lecture 3, High Speed Devices 2014
Ballistic FET diffusive: No potential drop along the channel is requiredIdeal gate control sets the potential in the channelSource/Drain electrodes injects electrons
Short channel effects – large a drain potential can pull down E1 – output conductance
Field Effect Transistors – Short Channel Effects
2016-01-21 19Lecture 3, High Speed Devices 2014
1) We want the channel potential to be set by the gate voltage.
2) When the current through the transistor is small – very little charge inside the channel. 𝜌 ≈ 0 𝐶/𝑚2. (For simplicity here)
𝛻 ⋅ 𝜖𝑟𝜖0𝛻V = 03D Possionequation
3) Both drain, source and gate terminal can influence the potential inside the channel!
4) This is studied by solution to the 2D Possion Equation.
VS VD
VG
𝛻 ⋅ 𝜖𝑟𝜖0𝛻V = 0
Analogue: Thermal Conduction
2016-01-21 20Lecture 3, High Speed Devices 2016
t1
02
2
2
2
y
T
x
Tl2
l1
y
x
• The linear differential equation for the steady statetemperature field is equivalent to Possions equation!
• We want the temperature (potential) in the channel to be controlled by the temperature (potential) on the gate electrode and NOT by the drain electrode!
• This makes it very easy to intuivitely understand how to design an transistor!
t2
T=0 ◦C
T=-25 ◦C
T=+25 ◦C
T=0 ◦C
𝛻 ⋅ 𝜆𝛻𝑇 = 0
Thermal Conduction:
𝛻 ⋅ 𝜖𝑟𝜖0𝛻V = 0
Possion Equation:
Temperature <-> Voltage
Thermal Conductivity <-> Dielectric Constants
1 minute intuition- geometry
2016-01-21 21Lecture 3, High Speed Devices 2016
t1
t2
T=0 ◦C
T=+25 ◦C
T=-25 ◦C
t1
t2
T=0 ◦C
T=+25 ◦C
T=-25 ◦C
t1
t2
T=+25 ◦C
T=-25 ◦C
(a)(c)
(b)
Rank the structures in terms ofhighest temperature at
1 minute intuition- thermal conductivity
2016-01-21 22Lecture 3, High Speed Devices 2016
T=0 ◦C
T=+25 ◦C
T=-25 ◦C(b)
l: thermal conductivity
Rank the structures in terms ofhighest temperature at
T=0 ◦C
T=+25 ◦C
T=-25 ◦C(a)
T=0 ◦C
T=+25 ◦C
(c)
l = small
l = small
l = small
l = large
l = large
l = small
Laplace’s Equation is linear
2016-01-21 23Lecture 3, High Speed Devices 2016
0V
-0.5V
0.5V 0V 0V
-0.5V
0V 0.5V
0V
Φ 𝑥, 𝑦 = 𝛼𝐺(𝑥, 𝑦)𝑉𝐺+𝛼𝐷(𝑥, 𝑦)𝑉𝐷 + 𝛼𝑆(𝑥, 𝑦)𝑉𝑆The potential at a certain point:
𝜕2
𝜕𝑥2+
𝜕2
𝜕𝑦2𝛼Φ = 𝛼
𝜕2
𝜕𝑥2+
𝜕2
𝜕𝑦2Φ = 0
0< 𝛼𝐺, 𝐷, 𝑆< 1 x,y dependence from solution of Laplace’s equation
Potential Distribution
2016-01-21 24Lecture 12, High Speed Devices 2014
l l
V=-0.5
Potential Distribution – Ground plane FET
2016-01-21 25Lecture 12, High Speed Devices 2014
Ground Plane
V=0 V=0.0
V=-0.5
V=0.0
Potential Distribution – Double gate FET
2016-01-21 26Lecture 12, High Speed Devices 2014
V=-0.5
V=-0.5
V=0 V=0
Potential Distribution – Double gate FET
2016-01-21 27Lecture 3, High Speed Devices 2016
VS VD ts
ti
ti
𝜆 ≈ 𝑡𝑠 + 2𝑡𝑖 If eri=ers
𝑉 𝑥 ≈ −𝑉𝐺𝑆 + 𝑉𝐺𝑆 sinh𝜋 𝐿 − 𝑥
𝜆/ sinh
𝜋𝐿
𝜆+ (𝑉𝐷𝑆 + 𝑉𝐺𝑆) sinh
𝜋 𝐿 − 𝑥
𝜆/ sinh
𝜋𝐿
𝜆
𝜆 ≈ 𝑡𝑠
𝛻 ⋅ 𝜖𝑟𝜖0𝛻V = 0
This can be solved easily with e.g. COMSOL.
Analytical solution through separation of variables + Fourier series expansion.
Analytic solution:
If eri>>ers
Geometric Length Scale for the FET
Short Channel Effects
2016-01-21 28Lecture 3, High Speed Devices 2016
L=50 nml=10 nm
L=30 nml=10 nm
L=20 nml=10 nm
𝜆 ≈ 𝑡𝑠 + 2𝑡𝑖 L > 2l
Short gate lengths requires thin oxide and thin semiconductors
𝜆𝐺𝐴𝐴 < 𝜆𝐷𝐺 < 𝜆𝑆𝐺
Double Gate
Single Gate Gate All Around
FinFETs/Nanowire: thicker ti/ts for the same gate length