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The World Leader in High Performance Signal Processing Solutions WCM 2011, June 15-16, Boston Modeling of High Voltage Devices for ESD Event Simulation in SPICE Yuanzhong (Paul) Zhou, Javier A. Salcedo Jean-Jacques Hajjar Analog Devices Inc. Wilmington, MA, USA

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The World Leader in High Performance Signal Processing Solutions

WCM 2011, June 15-16, Boston

Modeling of High Voltage Devices for

ESD Event Simulation in SPICE

Yuanzhong (Paul) Zhou,

Javier A. Salcedo

Jean-Jacques Hajjar

Analog Devices Inc.

Wilmington, MA, USA

Y. Zhou, J. Salcedo, J.J. Hajjar 2

INTRODUCTION

ESD & general ESD protection scheme

Background of SPICE ESD simulation for HV devices

HV LDMOS DEVICES AND ESD PROTECTION

High voltage NLDMOS devices

HV ESD protection clamp

SNAPBACK MODELING

Operation of LDMOS and HV clamp

Snapback models for LDMOS and HV clamp

MEASUREMENT AND SIMULATION

CONCLUSION

Outline

WCM 2011, June 15-16, Boston

Y. Zhou, J. Salcedo, J.J. Hajjar 3

ESD: Electrostatic Discharge

Sudden electrostatic charge transfer between two objects at different potentials

Causes:

Tribo-electric charging and electrical field induction

In ICs:

Occurs in human handling and testing

Characteristics: Large currents and high voltages Short in duration (1~150 ns)

Introduction

-- What is ESD?

WCM 2011, June 15-16, Boston

from RTP Company, Winona, MN

Y. Zhou, J. Salcedo, J.J. Hajjar 4

ESD causes damages in ICs

Catastrophic failures: contact spiking, junction burnout, gate oxide rupture, metal burnout

Latent failures: degradation of gate oxide, partial opens in metals

Costly failure mechanism

Costs electronics industry >$84B in lost profits per year (4~8% of total annual revenue! )*

Responsible to >30% customer returns

(* M. Brandt & S. Halperin, Circuits Assembly Magazine, June 1, 2003)

WCM 2011, June 15-16, Boston

Why focus on ESD?

DRAIN-CHANNEL

JUNCTION DAMAGEDRAIN CONTACT

SPIKING

DRAIN CHANNEL SOURCE

Root-cause of customer returnsMerrill et al., Proc. ESD/EOS Symposium, 1993

Y. Zhou, J. Salcedo, J.J. Hajjar 5

On-Chip ESD Protection Scheme

WCM 2011, June 15-16, Boston

IN OUT

VDD

VSS

CORE CIRCUIT

ES

D

ES

D

ES

D

ES

DE

SD

Objective: protect IC from ESD damages1. Shunt current discharges away from the CORE CIRCUIT

2. Clamps I/O & Power pad voltage to a safe level

Interaction of ESD protection and core circuitry

Ideally, ESD structures are transparent to internal circuitry

In reality, the protection and core circuitries impact each other’s performance

IN OUT

VDD

VSS

CORE CIRCUIT

ESD

ESD

ESD

ESD

ESD

Y. Zhou, J. Salcedo, J.J. Hajjar 6

BCDMOS technology is key in mixed-signal

applications for multiple sectors

Co-design is required for robust ESD protection

design and circuit optimization in high voltage

mixed-signal applications

Circuit-level simulation provides useful insight in

the interaction between ESD protection and core

circuitry

Simulation can reduce design iteration and cost

that typically occur in trial-and-error approaches

WCM 2011, June 15-16, Boston

Motivation of SPICE ESD simulation

for HV Devices

Y. Zhou, J. Salcedo, J.J. Hajjar

SPICE ESD Simulation for HV Devices

Co-Design Conditions

7WCM 2011, June 15-16, Boston

n-p-n

VL

VH’

VGControl Circuit HV

Clamp

VHRIOControl Circuit

I/O_1 I/O_2

Body

n-p-nRB

HV Device Between

Two I/O Pads

HV Device HV

Protection Clamp

Co-design

Y. Zhou, J. Salcedo, J.J. Hajjar 8

A key requirement for ESD simulation is the availability

of compact models accurate for ESD operation

ESD modeling for HV devices is very challenging Devices operate in extreme bias conditions

Structure complexity of LDMOS and HV clamps

There are very few reported modeling efforts which are

either not self-consistent or have limited availability

SPICE simulation using macromodel approach has been

demonstrated successful in low voltage technologies

Similar modeling approach for HV LDMOS devices and

HV clamps will be presented in this paper

WCM 2011, June 15-16, Boston

Background of SPICE Modeling for

HV ESD Devices

Y. Zhou, J. Salcedo, J.J. Hajjar 9

Non-uniform channel doping

Lightly doped N-Well/Deep N-Well drift region

LDMOS DEVICES AND ESD PROTECTION

-- High Voltage NLDMOS devices

WCM 2011, June 15-16, Boston

S BG S

P+ N+

P-Well

P-Substrate

D G

N+

N-Well

D G

N+

N-Well

N+

P-Field

Deep N-Well

Y. Zhou, J. Salcedo, J.J. Hajjar 10

Operation of LDMOS

High voltage LDMOS devices can snapback under ESD stress condition due to turn-on of parasitic BJT

There is a significant current increase before the device snapbacks to a lower voltage

WCM 2011, June 15-16, Boston

Y. Zhou, J. Salcedo, J.J. Hajjar 11

Operation of LDMOS (cont.)

The BJT does not turn-on until the applied voltage is significantly higher than the breakdown voltage of the Drain/Bulk junction

The breakdown starts in the depletion zone of the N-Well to P-Well junction

The device snapbacks when the depletion region expands reaching the highly doped N+ Drain region

Vt1 is significantly higher than regular MOS devices (20~120V vs. 5~10V)

The snapback trigger voltage (Vt1) is less dependent to the rise time of stress pulses (such as TLP pulses)

Highly sensitive to ESD-induced damage

WCM 2011, June 15-16, Boston

Y. Zhou, J. Salcedo, J.J. Hajjar 12

Key Components and Effects in

LDMOS Snapback

Key components: main LDMOS, parasitic BJT, back-gate resistance, P-well/N-well diode

Key effects: avalanche current at Drain/Back-gate (Collector/Base) junction, voltage drop across the back-gate resistance, P-well/N-well diode breakdown

WCM 2011, June 15-16, Boston

Y. Zhou, J. Salcedo, J.J. Hajjar 13

Macro Model for LDMOS Snapback

The main LDMOS MOS modeled by MOS20

A NPN modeled with Mextram is for the parasitic BJT

A resistor Rbg for the back-gate resistance

A diode for the P-well/N-well junction

Intrinsically includes all major effects in snapback

WCM 2011, June 13-16, Boston

MOS20

Mextram

IbB

i

Isu

b_

tota

l R bg

Id=Id'+Ic

Ic

Ids

Id'

S D

B

Isub

D1

Y. Zhou, J. Salcedo, J.J. Hajjar 14

LDMOS DEVICES AND ESD PROTECTION

-- ESD protection clamp

WCM 2011, June 13-16, Boston

A thyristor-type (SCR) device with bi-directinal path for ESD discharge current

The device can be decoupled into two separate bipolar transistors, a PNP and a NPN

Y. Zhou, J. Salcedo, J.J. Hajjar 15

Operation of HV Clamp

The clamp works in snapback mode as a result of the positive feedback triggered by the avalanche current in the PNP and NPN

In snapback, one BJT activates first and then subsequently the second one turns on

The Vt1 is more determined by the first BJT while the second one has bigger impact on Vh

The weaker the second BJT is, the higher the Vh

Used as protection for LDMOS at I/O or as power clamp

High Vt1 and sometimes high Vh are required for HV clamping

WCM 2011, June 13-16, Boston

Y. Zhou, J. Salcedo, J.J. Hajjar 16

Macro Model for Thyristor-like Clamp

WCM 2011, June 15-16, Boston

Qnpn

Qpnp

Cathode

Anode

Rpw

Rnw

Substrate

Dnwsub

The model includes the NPN, PNP, avalanche effect, and resistive voltage drop Vbe in the both BJT’s

The clamp is modeled by incorporating an advanced BJT (NPN) model with two resistors

Rpw =1MΩ for floating Pwell

The NPN model includes both the avalanche and junction capacitance and has a parasitic PNP that is used for the Qpnp

Y. Zhou, J. Salcedo, J.J. Hajjar 17

Transmission Line Pulse (TLP)

Measurement Setup Introduction

+

-

High voltage

supply

Transmission Line; Z0 = 50

DUT

Termination

ZT1

ZT2

+

-

High voltage

supply

Transmission Line; Z0 = 50

DUT

Termination

ZT1

ZT2

.......

time

I

Experimental data were measured with TLP technique

Apply a sequence of rectangular pulses to two terminals of a DUT

Use stabilized I-V curves as measurement results

VTLP

ITLP

VTLP

ITLP

IDUT (t)

t rise VTLP

ITLP

IDUT (t)

t rise VTLP

ITLP

VDUT (t)VDUT (t)

Current Probe

ZATTZATT

Current Probe

(Vt2, It2)

Vt1

WCM 2011, June 15-16, Boston

Y. Zhou, J. Salcedo, J.J. Hajjar 18

Simulation Setup for Snapback Effect

Snapback effect was simulated with transient simulation

Voltage Pulse Sequence (100ns) were used as the Input

The stabilized VD and ID were measured as the simulation results (~80ns).

WCM 2011, June 15-16, Boston

Schematic of

Snapback Simulation

Y. Zhou, J. Salcedo, J.J. Hajjar 19

Simulation Results vs. TLP Measurement

-- NLDMOS device (W=5000um , trise=10ns)

WCM 2011, June 15-16, Boston

Y. Zhou, J. Salcedo, J.J. Hajjar 20

Simulation Results vs. TLP Measurement

-- NLDMOS device (W=200um) for different rise times

WCM 2011, June 15-16, Boston

Y. Zhou, J. Salcedo, J.J. Hajjar 21

Simulation Results vs. TLP Measurement

-- NLDMOS device (W=200um) with longer drift region

WCM 2011, June 15-16, Boston

Y. Zhou, J. Salcedo, J.J. Hajjar 22

Simulation Results vs. TLP Measurement

-- a low holding voltage clamp in the 0.35um process (trise=10ns)

WCM 2011, June 15-16, Boston

Y. Zhou, J. Salcedo, J.J. Hajjar 23

Simulation Results vs. TLP Measurement

-- a high holding voltage clamp in the 0.18um process

WCM 2011, June 15-16, Boston

Y. Zhou, J. Salcedo, J.J. Hajjar 24

Modeling ESD behavior of high voltage LDMOS and thyristor-like clamp devices using a macro model approach has been presented.

The models consisted of standard passive and active components without having to use a complex external dependent current source.

The simplicity of this modeling approach facilitates easy implementation of the methodology.

The simulation results have shown good agreement with measured TLP data as performed on 0.18-um and 0.35-um BCDMOS process technologies.

Conclusion

WCM 2011, June 15-16, Boston

Y. Zhou, J. Salcedo, J.J. Hajjar 25

Acknowledgement

Slavica Malobabic: For contributions on devices’

characterization, TCAD simulation and insightful discussion

on the results presented in this paper.

Srivatsan Parthasarathy: For valuable inputs on the

development of this work.

WCM 2011, June 15-16, Boston