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emand for Ultra-High-Density Magnetic Media

Ref. DSI

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otivation for Patterned Media

Conventional Continuous Media

Patterned Media

• Barriers to Overcome

- Medium Noise

- Demag. Field- No Sharp Transition

Zigzag Jitter @ TransitionZigzag Jitter @ Transition

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arious Technologies for Patterned Media

Direct PatterningDirect Patterning

A.A. EE--beam Lithographybeam Lithography

B.B. Defining Magnetic Islands byDefining Magnetic Islands by

1.1. Focused Ion Beam (FIB)Focused Ion Beam (FIB)

2.2. Reactive Ion Etching (RIE)Reactive Ion Etching (RIE)

3.3. IonIon--Beam MillingBeam Milling

NanoNano--Imprinting TechnologyImprinting Technology

resist

magnetic layer

Si

resist

Si

magnetic layer

resist

Those technologies are fine BUTThose technologies are fine BUT

Not appropriate for massNot appropriate for mass--productionproductiondue to low throughput, low yield and high cost!due to low throughput, low yield and high cost!

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rocesses for Nano-Injection Molding Technology

(d) Fabrication of polymeric nano-

master by UV molding

(a) E-beam patterning

(c) Si nano-master

(f) Nano-injection molding

(g) Polymeric pillar patterns

PR

(b) ICP etching

(h) Deposition of magnetic materials

(e) Fabrication of metallic nano-stamperby electroforming

SiSi

Polymeric patternsPolymeric patterns

MetallicMetallic nanonano--stamperstamper

SiSi mastermaster

PolymericPolymeric nanonano--mastermaster

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abrication of Polymeric Nano-Master

Polymeric Nano-Master

by UV Molding

Si Master(CD: 40nm, pitch: 80 nm)

UV Light

SiSi mastermaster

PolymericPolymeric nanonano--mastermaster

UV resin

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abrication of Metallic Nano-Stamper

Electroforming System

MetallicNano-Stamper

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ano-Injection Molding Technology

Ni Nano-Stamper

Polymeric Patterns

(CD: 40 nm, pitch 80 nm)

Pattern Transfer

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eposition of Magnetic Materials

Magnetic Islandson 3.5 inch Media

(CD: 40 nm, pitch 80 nm)3.5 in.

Polymeric Patterns

[Pd / Co]10

 M 

Pd

C

PerpendicularMagnetic Medi

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revious Studies and Acknowledgment

0 0.4 0.8 1.2

(1) CD: 200 nm, pitch 500 nm (2) CD: 100 nm, pitch 250 nm

Nanotechnology, 15 (8), 901-906, 200

Single magnetic domain state

0 0.4 0.8 1.2㎛ 0 0.4 0.8 1.2 0 0.4 0.8 1.2㎛

 

Financial support:

Ministry of Science and Technology, KOREA through

Center for Nanoscale Mechatronics & Manufacturing(21st Century Frontier Research Program)