new photo-mask before bonding
DESCRIPTION
New Photo-mask before bonding. Overlap region can be seen with even eyes Good for Si piece alignment while bonding . Center was over exposed with 15nA writing. Si was firmly bonded. Metal stacking for PL pattern: Ti/Ni=80nm/400nm - PowerPoint PPT PresentationTRANSCRIPT
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New Photo-mask before bonding
• Center was over exposed with 15nA writing• Overlap region can be seen with even eyes• Good for Si piece alignment while bonding
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Si was firmly bonded
• Metal stacking for PL pattern: Ti/Ni=80nm/400nm• Metal stacking for EBL pattern: Ti/Ni/Ti/Ni=30nm/300nm/50nm/100nm (blocking
total consumption of Ni)
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Si Removed
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Si Removed