PROCEEDINGS OF SPIESPIE—The International Society for Optical Engineering

Optical Engineering for Sensingand Nanotechnology (ICOSN '99)

Ichirou YamaguchiChair/Editor

16-18 June 1999

Yokohama, Japan

Sponsored and Organized by

OSJ—Optical Society of Japan (Japan Society of Applied Physics)

SPIE—The International Society for Optical Engineering

Published bySPIE—The International Society for Optical Engineering

Volume 3740

SPIE is an international technical society dedicated to advancing engineering and scientific

applications of optical, photonic, imaging, electronic, and optoelectronic technologies.

Contents

xvii Conference Committee

xxi Introduction

PLENARY PAPER

SESSION 1

Solid immersion lens [3740-200]G. S. Kino, Stanford Univ. (USA)

OPTICAL INTERFEROMETRY: ANALYSIS

8 Laser diode phase-shifting interferometer operating at a frame rate [3740-01]R. Onodera, N. Onda, Y. Ishii, Univ. of Industrial Technology (Japan)

12 Improved phase unwrapping of a phase-shift interferometer using a precision XY-scanner

[3740-02]S. Park, D. Gweon, Korea Advanced Institute of Science and Technology; K. S. Moon, MichiganTechnological Univ. (USA)

1 6 White light phase-shifting interferometry with self-compensation of PZT scanning errors

[3740-03]S.-W. Kim, M.-G. Kang, S.-Y. lee, Korea Advanced Institute of Science and Technology

SESSION 2 OPTICAL INTERFEROMETRY: LOW COHERENCE

22 High-sensitivity surface measurements by a heterodyne white-light interferometer [3740-05]A. Hirai, H. Matsumoto, National Research Lab. of Metrology (Japan)

26 Practical measurement system for determination of refractive index and thickness usinglow-coherence interferometry [3740-06]H. Maruyama, Kyushu Matsushita Electric Co., Ltd. (Japan); S. Inoue, M. Ohmi, Osaka Univ.

(Japan); K. Ihara, S. Nakagawa, Kyushu Matsushita Electric Co., Ltd. (Japan); M. Haruna, Osaka

Univ. (Japan)

30 Wavelength scanning confocal interference microscope for separate measurement of

refractive index and geometrical thickness [3740-07]

T. Fukano, RIKEN—The Institute of Physical and Chemical Research (Japan) and Saitama Univ.

(Japan); I. Yamaguchi, RIKEN—The Institute of Physical and Chemical Research (Japan)

34 Dispersive coherence spectrotomography of a layered medium [3740-08]W. Watanabe, K. Itoh, Osaka Univ. (Japan)

iii

SESSION 3 OPTICAL INTERFEROMETRY: POLARIZATION

40 Measurements of the effective optical constants and the flying height of read-write sliders

by heterodyne inteferometry [3740-09]J.-Y. Lee, D.-C. Su, National Chiao Tung Univ. (Taiwan); C.-C. Hsu, Chung Yuan Christian

Univ. (Taiwan)

44 Referenced polarization imaging for surface displacement measurements [3740-10]

L. J. Ulibarri, The Boeing Co. (USA); J. K. Boger, M. P. Fetrow, Applied TechnologyAssociates (USA)

48 Birefringence measurement by scattered light method with a phase-shifting technique

[3740-11]

N. Umeda, J. Takahashi, D. liduka, Tokyo Univ. of Agriculture and Technology (Japan);

H. Kohwa, Uniopt Co., Ltd. (Japan)

53 Heterodyne interferometers using orthogonally polarized and two-frequency shifted lightsources with superhigh extinction ratio [3740-12]N. Nakatani, Ashiya Univ. (Japan)

SESSION 4 OPTICAL INTERFEROMETRY: DEFORMATION MEASUREMENT 1

58 Combined measurement of shape and deformation of microcomponents by holographic

interferometry and multiple-wavelength contouring [3740-13]S. Seebacher, W. Osten, Chr. Wagner, Bremen Institute for Applied Beam Technology(Germany)

70 Adaptive speckle pattern interferometry [3740-14]

J. Kornis, Z. Fuzessy, A. Nemeth, Technical Univ. of Budapest (Hungary)

74 Stereovision setup for accurate 3D deformation measurements [3740-1 5]P. Synnergren, Lulea Univ. of Technology (Sweden)

78 Industrial applications of residual stress determination using 2D in-plane sensitive fiber ESPI

and hole drilling [3740-16]

A. K. Asundi, Nanyang Technological Univ. (Singapore); J. Zhang, National Univ. of Singapore

SESSION 5 OPTICAL INTERFEROMETRY: DEFORMATION MEASUREMENT II

84 Whole-field speckle strain sensor [3740-1 7]M. Sjodahl, Lulea Univ. of Technology (Sweden)

88 Laser speckle interferometry for welding inspection [3740-18]

Suprapedi, R. Widiastuti, Ctr. for Applied Physics/Indonesian Institute of Sciences; S. Toyooka,Saitama Univ. (Japan)

92 Measurement for thickness variation of a latex membrane by ESPI method [3740-19]A. K. Asundi, L. J. Jiang, Nanyang Technological Univ. (Singapore)

iv

SESSION 6 OPTICAL INTERFEROMETRY AND MOIRE TECHNIQUES

98 Sinusoidal phase-modulating laser diode interferometer using photothermal modulation

[3740-21]T. Suzuki, M. Matsuda, O. Sasaki, T. Maruyama, Niigata Univ. (Japan)

102 Direct distributed velocity sensing using a low-coherence interferometer [3740-22]Y. Imai, K. Tanaka, Kyushu Institute of Technology (Japan)

106 Optoelectronic interferometric vibration sensor [3740-23]

C. Shakher, A. L. Vyas, V. S. Rawat, Indian Institute of Technology/Delhi

110 Shadow moire profilometry using a phase-shifting method [3740-24]L. Jin, Y. Kodera, T. Yoshizawa, Y. Otani, Tokyo Univ. of Agriculture and Technology (Japan)

114 Three-dimensional surface measurement using grating projection method by detecting phaseand contrast [3740-25]M. Ishihara, Y. Nakazato, H. Sasaki, Takaoka Electric Manufacturing Co., Ltd. (Japan);M. Tonooka, M. Yamamoto, Y. Otani, T. Yoshizawa, Tokyo Univ. of Agriculture and

Technology (Japan)

118 Residual stresses in unsymmetric laminated carbon fiber composites [3740-26]

Y. Liu, M. Y. Quek, A. K. Asundi, Nanyang Technological Univ. (Singapore)

SESSION 7 OPTICAL ENCODERS

124 New error-compensation method in a linear encoder using phase-shifted grating [3740-27]

J.-H. Song, LG Electronics Inc. (Korea); K.-C. Kim, S.-H. Kim, Y. K. Kwak, Korea Advanced

Institute of Science and Technology

128 High-performance encoder using the encoder model in a computer [3740-29]

Y. Matsuzoe, K. Fujita, N. Tsuji, Fuji Electric Corporate Research and Development, Ltd.

(Japan)

132 Compact optical encoder using modulated-pitch phase grating: suppression of harmonic noise

and contrast change [3740-30]A. leki, K. Matsui, M. Nashiki, OKUMA Corp. (Japan); K. Hane, Tohoku Univ. (Japan)

136 Rotation angle measurement using an imaging method [3740-31]

T. Suzuki, H. Nakamura, Niigata Univ. (Japan); J. E. Greivenkamp, Optical Sciences Ctr./Univ.

of Arizona (USA); O. Sasaki, Niigata Univ. (Japan)

SESSION 8 SCATTEROMETRY

142 Independent component analysis based on a scatter diagram [3740-32]

K. Hirokawa, Eastern Hiroshima Prefecture Industrial Research Institute (Japan); T. Yamaguchi,K. Itoh, Osaka Univ. (Japan)

146 Ultrasound-assisted optical measurement for observation inside a scattering medium

[3740-33]

M. Hisaka, T. Sugiura, S. Kawata, Osaka Univ. (Japan)

v

1 50 Angular correlation properties of multiply scattered light in random media with buried

objects [3740-34]

S. Sangu, Hokkaido Univ. (Japan); T. Okamoto, Kyushu Institute of Technology (Japan);

J. Uozumi, Hokkaido Univ. (Japan); T. Asakura, Hokkai-Gakuen Univ. (Japan)

154 Scattering characteristics of Si3N4 mixture surface under laser illumination [3740-35]W. Liu, Chiba Univ. (Japan) and Anhui Institute of Optics and Fine Mechanics (China);

H. Kuze, N. Takeuchi, Chiba Univ. (Japan)

SESSION 9 IMAGE PROCESSING AND ANALYSIS

160 Global wavefront reconstruction from its image in focal plane and Shack-Hartmann sensor

images [3740-36]T. Takahashi, Oita National College of Technology (Japan); H. Takajo, Kyushu Institute of

Technology (Japan)

164 Plastic-fiber-bundle-based metrology for two-dimension mapping of the dissolution rate of

photoresist film [3740-37]C.-R. Lin, Tatung Institute of Technology (Taiwan)

169 Spectrum-enhanced correlator by two-wave mixing in a photorefractive crystal [3740-38]

T. Takahashi, Y. Ishii, Univ. of Industrial Technology (Japan)

173 Neural-network-based analysis of photoelastic color using a spectral synthesizer [3740-39]

W. Wang, S. Toyooka, H. Nozawa, Saitama Univ. (Japan)

SESSION 10 MACHINE VISION AND ENVIRONMENTAL MONITORING

1 78 Open, intelligent, and scalable optical part-recognition system [3740-40]W. van Dyck, T. Berndorfer, A. Brenner, Z. Tamasi, Technical Univ. of Vienna (Austria)

182 Using field bus for optical gas monitoring [3740-42]

X. Cheng, L. K. Seah, L. S. Ong, A. K. Asundi, Nanyang Technological Univ. (Singapore)

186 Fiber optic spectrophotometry monitoring of plant nutrient deficiency under hydroponicculture conditions [3740-43]O. W. Liew, W. S. L. Boey, Singapore Polytechnic; A. K. Asundi, J. W. Chen, Nanyang

Technological Univ. (Singapore); D. M. He, Nanjing Univ. of Science and Technology (China)

191 Optical monitoring of the concentration profile of submicron latex particles in flow through

a translucent water-permeable tube: demonstration of flow-dependent concentration

polarization of plasma proteins at a blood/endothelium boundary [3740-44]

S. Wada, T. Iwai, T. Karino, Hokkaido Univ. (Japan)

1 95 Optical remote sensing information modeling for monitoring rural land use [3740-45]

Z. Zhu, Nanjing Naval Institute of Electronic Engineering (China); L. Sun, JiangSu Academy

of Agricultural Sciences (China)

vi

SESSION 11 ENVIRONMENTAL MONITORING

200 Oxy-fuel combustion emission monitoring using tunable diode laser sensors [3740-46]

W. A. Von Drasek, American Air Liquide (USA); D. M. Sonnenfroh, P. Keating, M. G. Allen,Physical Sciences Inc. (USA); O. Charon, American Air Liquide (USA)

204 Spectral measurements of two-dimensional color images [3740-47]M. Hauta-Kasari, Lappeenranta Univ. of Technology (Finland); K. Miyazawa, S. Toyooka,Saitama Univ. (Japan); J. P. Parkkinen, Univ. ofJoensuu (Finland)

208 Intelligent optical sensor concept: a new approach using interconnecting sensors [3740-48]T. Berndorfer, D. J. Schmidradler, A. Brenner, W. van Dyck, Technical Univ. of Vienna

(Austria)

212 Remote sensing analysis of surface water in a mining area [3740-49]Z. Han, F. Yang, Shandong Institute of Mining and Technology (China); X. Feng, J. Liu,

Feicheng Mining Group Co. (China); Y. Li, L. Lei, Shandong Institute of Mining and

Technology (China)

SESSION 12 D1FFRACTIVE OPTICS: DESIGN

218 Planar binary optical see-through visor design [3740-50]

L. Zhao, Y. L. Lam, Y. Zhou, Z. Yun, W. Que, Nanyang Technological Univ. (Singapore)

222 Optimization design of diffractive optical elements by genetic local search algorithms[3740-53]G. Zhou, X. Zhao, Z. Wang, Shanghai Jiaotong Univ. (China); Y. Chen, E-Tek Dynamics, Inc.

(USA); M. Zhang, Shanghai Jiaotong Univ. (China)

SESSION 13 DIFFRACTIVE OPTICS: MANUFACTURING

228 Fabrication of multilevel diffractive elements in SiOz by electron-beam lithography and

proportional etching [3740-54]P. Laakkonen, J. Lautanen, J. Simonen, J. P. Turunen, Univ. of Joensuu (Finland);V.-P. Leppanen, T. Jaaskelainen, Nanocomp Ltd. (Finland)

232 Electron-beam lithography fabrication of phase holograms to generate Laguerre-Gaussianbeams [3740-55]

Y. Miyamoto, M. Masuda, A. Wada, M. Takeda, Univ. of Electro-Communications (Japan)

236 Diffractive optical element array to realize uniform focal spot with any geometrical shape

transform [3740-56]

Q. Tan, Y. Yan, G. Jin, M. Wu, Tsinghua Univ. (China)

240 Narrowband holographic spectral filters: principles, manufacturing, and applications

[3740-57]

1. V. Semenova, A.F. loffe Physical-Technical Institute (Russia); N. O. Reinhand, Institute

of Mechanical Engineering Problems (Russia); A. Popov, LUMEX Ltd. (Russia)

SESSION 14 DIFFRACTIVE OPTICS: APPLICATIONS

246 Diffractive-optics-based sensor for simultaneous inspection of reflected and transmitted lightfrom porous materials [3740-58]

R. Silvennoinen, P. Wahl, Univ. of Joensuu (Finland)

250 Improvements of quantized kinoform reconstruction by changing the position of the desired

image [3740-59]

S. Yang, T. Shimomura, Kyushu Institute of Technology (Japan)

254 Diffractive optical concentrator for an infrared detector [3740-60]

C. Du, C. K. Qiu, Q. L. Deng, Institute of Optics and Electronics (China); J. Z. Zhao, D. J. Yang,HuaBei Institute of Optics and Electronics (China); L. B. Bai, H. J. Zeng, Institute of Optics and

Electronics (China)

258 Holographic optical elements with high spectral and angular selectivity [3740-61]N. O. Reinhand, Institute of Mechanical Engineering Problems (Russia); I. V. Semenova,A.F. loffe Physical-Technical Institute (Russia); A. Popov, LUMEX Ltd. (Russia)

SESSION 15 OPTICAL FIBERS 1

264 Pigtail-type CO laser using As2S3 optical fiber [3740-62]S. Tanaka, Y. Setoguchi, National Defense Academy (Japan); M. Saito, Ryukoku Univ. (Japan);

H. Sato, National Defense Academy (Japan)

SESSION 16 OPTICAL FIBERS II

270 Multipoint detection of an acoustic wave in water with a WDM fiber-Bragg-grating sensor

[3740-66]N. Takahashi, K. Tetsumura, S. Takahashi, National Defense Academy (Japan)

274 Optical wavelength switch using strain-controlled fiber Bragg gratings [3740-67]H. Uno, A. Kojima, A. Shibano, O. Mikami, Tokai Univ. (Japan)

278 Fiber optic Bragg grating sensors for hydrogen gas sensing [3740-68]B. Sutapun, M. Tabib-Azar, Case Western Reserve Univ. (USA); A. A. Kazemi, The Boeing

Co. (USA)

284 Enhanced pressure and temperature sensitivity of a fiber Bragg grating with polymer

packaging [3740-69]Y. Liu, Z. Guo, X. Dong, Z. Liu, D. Zhao, C. Ge, Nankai Univ. (China)

SESSION 17 PHOTONIC DEVICES AND NEAR-FIELD OPTICS

290 Fabrication of composite sol-gel optical channel waveguides by laser writing lithography

[3740-70]

W. Que, Y. Zhou, Y. L. Lam, Y. C. Chan, Y. W. Chen, S. L. Ng, C. Y. Liaw, C. H. Kam, Nanyang

Technological Univ. (Singapore)

294 Two-dimensional fiber laser Doppler velocimeter by integrated optical frequency shifter

[3740-71]K. Hasegawa, S. Kato, H. Itoh, Toyota Central Research and Development Labs., Inc. (Japan)

viii

298 Application of an antiferroelectric liquid crystal cell as a self-aligning phase modulator

[3740-72]H. Kadono, S. Toyooka, Saitama Univ. (Japan)

303 Shear force characteristics and piezoelectric tip-sample distance control for NSOM [3740-74]J. Lee, H. Oh, D. Gweon, Korea Advanced Institute of Science and Technology

307 Novel nonoptical method of tip-sample distance regulation based on shear force in scanningnear-field optical microscopy [3740-75]

X. Liu, J. Wang, D. Li, Tsinghua Univ. (China)

SESSION 18 NEAR-FIELD OPTICS AND MICROSCOPY

312 Determination of geometric properties of SNOM tips by means of combined far-field and

near-field evaluation [3740-76]S. Seebacher, W. Osten, W. P. O. Jijptner, Bremen Institute for Applied Beam Technology(Germany); V. P. Veiko, N. B. Voznessenski, Institute of Fine Mechanics and Optics (Russia)

323 Direct measurement of evanescent-wave interference patterns with laser-trapped dielectricand metallic particles [3740-77]

M. Gu, P. C. Ke, Victoria Univ. of Technology (Australia)

327 Enhancement of AFM images by compensating the hysteresis and creep effect within PZT

[3740-78]H. Jung, J. Shim, D. Gweon, Korea Advanced Institute of Science and Technology

331 Scanning near-field optical microscope with a superfluorescent source [3740-80]G. Zhang, Central China Normal Univ.; H. Ming, J. Xie, Univ. of Science and Technologyof China

SESSION 19 LITHOGRAPHY AND FABRICATION

336 Using a computer-generated hologram as a lithographic technique for generating high-densityintensity patterns [3740-81]Y. Takaki, Nihon Univ. (Japan)

340 Nanoscale fabrication by interferometric lithography [3740-82]S. H. Zaidi, S. R. J. Brueck, Univ. of New Mexico (USA)

344 Development of state-of-the-art devices on the subnanometer grinding machine tool for

optical glasses [3740-83]H. Eda, Ibaraki Univ. (Japan); L. Chouanine, NGK Insulators, Ltd. (Japan); J. Shimizu, L. Zhou,Ibaraki Univ. (Japan)

348 Fine OPC approach with gray-tone coding mask [3740-84]J. Du, J. Su, Q. Huang, Y. Zhang, Y. Guo, Sichuan Univ. (China); C. Du, Institute of Optics andElectronics (China); Z. Cui, Rutherford Appleton Lab. (UK)

ix

SESSION 20 THERMAL IMAGING

354 Temperature measurement with industrial color camera devices [3740-85]D. J. Schmidradler, T. Berndorfer, W. van Dyck, J. Pretschuh, Technical Univ. of Vienna

(Austria)

358 Measurement of temperature on Scindapsus leaves subjected to ultraviolet radiation usinginfrared thermography techniques [3740-86]E. Umezaki, T. Shimada, Nippon Institute of Technology (Japan)

362 Nondestructive evaluation of surface defects by the use of photothermal electrochemical

imaging [3740-87]T. Hoshimiya, K. Ishikawa, Tohoku Gakuin Univ. (Japan)

SESSION 21 NONLINEAR OPTICS AND OPTICAL CONTROL

368 Dispersion properties and data analysis of meromorphic nonlinear susceptibility of layeredtwo-phase nanocomposites [3740-89]

E. M. Vartiainen, Lappeenranta Univ. of Technology (Finland); K.-E. Peiponen, Univ. of Joensuu

(Finland); T. Asakura, Hokkai-Gakuen Univ. (Japan)

372 Optical control of the pitch in cholesteric liquid crystals [3740-90]

K. Shirota, RIKEN—The Institute of Physical and Chemical Research (Japan); K. Tachibana,Gakushuin Univ. (Japan); 1. Yamaguchi, RIKEN—The Institute of Physical and Chemical

Research (Japan)

376 Optically induced self-growing of fiber structure in a photopolymerizable resin [3740-91]

S. Shoji, S. Kawata, Osaka Univ. (Japan)

380 Laser-diode-tuned chromium atom trapping and fabrication with atom optics technology

[3740-92]

K. Okamoto, H. Inouye, Y. Inouye, S. Kawata, Osaka Univ. (Japan)

384 Photorefractive effect in an inorganic nanoparticle polymer-doped system [3740-93]Y. Yang, J. Huang, Q. Wu, G. Sun, H. Fei, Z. Wei, J. Shen, Jilin Univ. (China)

SESSION 22 MICROSCOPY

390 Real-time confocal two-photon fluorescence microscope using a rotating microlens array

[3740-95]K. Fujita, T. Kaneko, O. Nakamura, Osaka Univ. (Japan); M. Oyamada, T. Takamatsu, KyotoPrefectural Univ. of Medicine (Japan); S. Kawata, Osaka Univ. (Japan)

394 New deep-UV microscope [3740-96]N. Eguchi, M. Oka, Y. Imai, Sony Corp. (Japan); M. Saito, Sony Precision Technology, Inc.

(Japan); S. Kubota, Sony Corp. (Japan)

398 Microscope for measurement of discontinuous deep microstructure topography [3740-97]

M. Zhou, Institute of Optics and Electronics (China)

X

402 Two-photon-induced photon oxidation as a means for 3D optical data storage [3740-98]A. D. Xia, Univ. of Science and Technology of China; S. Wada, H. Tashiro, RIKEN—The

Institute of Physical and Chemical Research (Japan); W. H. Huang, Univ. of Science and

Technology of China

SESSION 23 POSTER SESSION I

408 High-intensity nanosecond white-light source using a commercially available Xe arc lamp

[3740-99]S. Itami, Anan College of Technology (Japan); T. Araki, Osaka Univ. (Japan)

412 Mode regulation of a laser resonator by a micro-optic mirror [3740-100]G. Zhang, Central China Normal Univ.; X. Zhang, Huangshi College of Technology (China);

S. Li, J. Ye, Huazhong Univ. of Science and Technology (China)

416 New type of laser stripe generator [3740-102]

Y. Lin, J. Liu, Beijing Institute of Technology (China)

420 Ultraprecision machining of ceramics for optical components [3740-103]

H. Eda, J. Shimizu, L. Zhou, Ibaraki Univ. (Japan)

424 Continuous-phase diffractive optical element to realize uniform target illumination in inertial

confinement fusion (ICF) [3740-104]

Q. Tan, Y. Yan, G. Jin, M. Wu, Tsinghua Univ. (China)

428 Thin film retardation plates fabricated by oblique depositions and their applications to

LiNb03-based sensors [3740-105]Y. Takeda, T. Ichikawa, T. Motohiro, H. Ito, Toyota Central Research and Development Labs.,

Inc. (Japan)

432 Microlens fibers fabricated by a melting-tapering process using a C02 laser [3740-106]A. Malki, F. Van Lauwe, Univ. de Rouen (France); R. Bachelot, Univ. de Technologie de Troyes(France); O. Latry, M. Ketata, Univ. de Rouen (France); P. Royer, Univ. de Technologie de

Troyes (France)

438 Binary deposition method using standard CMOS structural layers to fabricate optical gratingsand microlenses [3740-107]

L.-J. Yang, P.-C. Liu, S.-W. Kang, W.-C. Du, Tamkang Univ. (Taiwan)

442 Next-generation fabrication technologies for optical pickup devices in high-density opticaldisk storage systems [3740-108]S. Hosoe, Konica Corp. (Japan)

446 Attenuated phase-shifting mask and its encoding method [3740-11 1]

C. Zhou, B. Feng, D. Hou, J. Zhang, Institute of Optics and Electronics (China)

450 PRCM and its optical bus application by photorefractive four-wave mixing with cross-

polarization pumping [3740-114]A. Okamoto, K. Watanabe, H. Matsuoka, Y. Takayama, Hokkaido Univ. (Japan)

454 Spectroscopic study on second-harmonic generation from a reconstructed silicon surface

[3740-115]

J. Chen, Tokyo Institute of Polytechnics (Japan); D. Huang, ERATO Quantum Fluctuation

Project/JST (Japan)

457 Implementing an integrated infrared spectrometer: a theoretical study [3740-11 6]

D. P. Poenar, Institute of Microelectronics (Singapore)

468 Rewritable broadband filters for color image analysis [3740-1 1 7]K. Miyazawa, Saitama Univ. (Japan); M. Hauta-Kasari, Lappeenranta Univ. of Technology(Finland); S. Toyooka, Saitama Univ. (Japan)

472 Resistive YBaCuO microbolometers for infrared imaging applications [3740-118]L. Ngo Phong, S. N. Qiu, B. Tremblay, Defence Research Establishment Valcartier (Canada)

476 Graphic-oriented environmental monitoring system [3740-120]Z. Zhu, Nanjing Naval Institute of Electronic Engineering (China); L. Sun, JiangSu Academyof Agricultural Sciences (China)

480 Electromagnetic waveband in environmental monitoring [3740-121]F. Yang, Z. Han, L. Lei, C. Gong, X. Song, Shandong Institute of Mining and Technology (China)

SESSION 24 POSTER SESSION II

484 Antireflection structures for visible and infrared wavelengths fabricated on silicon substrates

by fast atom beam etching [3740-122]

Y. Kanamori, M. Sasaki, K. Hane, Tohoku Univ. (Japan)

488 Ladar fiber optical liquid level sensor system [3740-123]

W. Peng, J. Lin, DaLian Univ. of Technology (China)

492 High-sensitivity long-period fiber grating temperature sensor based on intensity measurement

[3740-124]Y. Liu, C. Ge, D. Zhao, Z. Liu, Z. Guo, X. Dong, Nankai Univ. (China); H. Tarn, Hong Kong

Polytechnic Univ.

496 Optical fiber Bragg grating accelerometer [3740-125]

S. J. Spammer, Rand Afrikaans Univ. (South Africa); P. L. Fuhr, Univ. of Vermont (USA); Y. Zhu,

A. A. Chtcherbakov, Rand Afrikaans Univ. (South Africa)

501 MJ internal thread used for aerospace and its noncontact test method with a fiber opticsensor [3740-127]Y. Zhao, P. Li, Z. Pu, Harbin Institute of Technology (China)

505 Simultaneous temperature and electric current measurement by using different Faraday

sensing elements in an optical current sensor [3740-128]B. Yi, B. C. B. Chu, City Univ. of Hong Kong; Y. Liu, Huazhong Univ. of Science and

Technology (China); K. S. Chiang, City Univ. of Hong Kong

509 Optical dc current and voltage measurement by superposing ac magnetic or electric field

[3740-129]M. Higaki, K. Fujii, S. Yamaguchi, Kyushu Kyoritsu Univ. (Japan)

51 3 Comparison of sensitivity of optical waveguide chemical sensors between TM and TE modes

[3740-130]

D.-K. Qing, I. Yamaguchi, RIKEN—The Institute of Physical and Chemical Research (Japan)

51 7 Integrated optic pressure sensor using intermodal interference between TM-like and TE-like

modes [3740-131]K. Hasebe, M. Ohkawa, C. Nishiwaki, S. Sekine, T. Sato, Niigata Univ. (Japan)

521 Synthetic double-exposure method for security holograms: image estimation based on

numerical simulation [3740-132]

N. Yoshikawa, M. Itoh, T. Yatagai, Univ. of Tsukuba (Japan)

525 Optical encryption system using a spatial light modulator [3740-133]

G. Unnikrishnan, J. Joseph, K. Singh, Indian Institute of Technology/Delhi

529 Discrimination of portraits using a hybrid parallel joint transform correlator system

[3740-134]R. Inaba, A. Hashimoto, K. Kodate, Japan Women's Univ. (Japan)

533 Local plasmon sensor using a gold colloid monolayer [3740-1 37]

T. Okamoto, RIKEN—The Institute of Physical and Chemical Research (Japan); T. Kobayashi,

Gakushuin Univ. (Japan); I. Yamaguchi, RIKEN—The Institute of Physical and Chemical

Research (Japan)

537 Three-dimensional optical recording with the ferroelectric domain reversal in a Ce-dopedSBN:75 crystal: experiment and calculation [3740-138]M. Hisaka, H. Ishitobi, S. Kawata, Osaka Univ. (Japan)

541 Photofabrication of a photonic crystal using interference of a UV laser [3740-139]

S. Shoji, N. Smith, S. Kawata, Osaka Univ. (Japan)

545 Optically oriented isomers of diarylethene and spiropyran in polymeric thin films [3740-140]

H. Ishitobi, Z. Sekkat, S. Kawata, Osaka Univ. (Japan)

549 Optical sensing of fractal aggregates of particles using backscattering enhancement

[3740-141]K. Ishii, T. Iwai, Hokkaido Univ. (japan)

553 Analysis of the structure of the collective motion of small particles by dynamic light

scattering [3740-142]

M. Higuchi, H. Takano, O. Yamaguchi, M. Itoh, Doshisha Univ. (Japan)

557 Numerical analysis of enhanced backscattering from random fractal media [3740-143]

J. Uozumi, T. Saito, Hokkaido Univ. (Japan)

561 Fiber optic spectrophotometry for monitoring dissolved oxygen in a tropical ornamental fish

tank environment [3740-144]

A. K. Asundi, J. W. Chen, Nanyang Technological Univ. (Singapore); D. M. He, Nanjing Univ.

of Science and Technology (China)

SESSION 25 POSTER SESSION III

566 Nonlinear excess fraction method: a robust temporal phase-unwrapping algorithm [3740-145]Y. Hao, Y. Zhao, D. Li, Tsinghua Univ. (China)

570 Amplitude measurement of a sinusoidally oscillating object using a frequency-ramped laser

diode with some intensity modulation indices [3740-146]M. Imai, M. Kondoh, Muroran Institute of Technology (Japan); N. Murakami, Muroran Institute

of Technology (Japan) and Fujitsu Denso Ltd. (Japan)

574 Observation of actual pitting corrosions by photoacoustic imaging [3740-147]Y. Hiwatashi, H. Endoh, T. Hoshimiya, Tohoku Gakuin Univ. (Japan)

578 Multifunctional photoacoustic microscope and its applications to NDE of surface and

undersurface defects [3740-148]

K. Ishikawa, K. Miyamoto, T. Hoshimiya, Tohoku Gakuin Univ. (Japan)

582 3D sensing of a nonstationary surface [3740-149]S. V. Mikhlyaev, Institute of Automation and Electrometry (Russia)

586 Optical fuzzy sensors [3740-150]A. E. Gorodetsky, A. G. Sergeyev, Institute for Problems in Mechanical Engineering (Russia)

590 Light sectioning for step profile measurement using a spatial filter in a sensing unit [3740-1 51]

T. Matsumoto, Y. Kitagawa, K. Nakazato, Hyogo Prefectural Institute of Industrial Research

(Japan); M. Adachi, Kanazawa Univ. (Japan)

594 Height gauging by wavelength-scanning interferometry with phase detection [3740-152]

J. Kato, I. Yamaguchi, RIKEN—The Institute of Physical and Chemical Research (Japan)

598 Interferometry method for measuring head-disk spacing down to contact [3740-1 53]X. Liu, W. W. Clegg, Univ. of Plymouth (UK); B. Liu, National Univ. of Singapore

602 Absolute measurement of a spherical surface using a point diffraction interferometer

[3740-154]

K. Otaki, Nikon Corp. (Japan); F. Bonneau, CEA-DIF (France); Y. Ichihara, Nikon Corp. (Japan)

606 Accurate measurement of the flatness of etalons [3740-1 55]S. Itoh, K. Katoh, T. Oikawa, J. Chen, Tokyo Kogei Univ. (Japan)

610 Laser diode optical feedback interferometer for surface measurement outside optical benches

[3740-156]

J. Liu, I. Yamaguchi, RIKEN—The Institute of Physical and Chemical Research (Japan)

614 Surface shape measurement using a wavelength-scanning Fizeau interferometer [3740-157]

A. Yamamoto, I. Yamaguchi, RIKEN—The Institute of Physical and Chemical Research (Japan);M. Yano, Saitama Univ. (Japan)

61 8 Sinusoidal wavelength-scanning interferometric reflectometry [3740-1 58]O. Sasaki, T. Kuwahara, R. Hara, T. Suzuki, Niigata Univ. (Japan)

622 Passive interferometric 3D imaging based on the propagation law of cross-spectral density[3740-159]H. Arimoto, K. Itoh, Osaka Univ. (Japan)

xiv

626 Novel image processing method applied to speckle fringe pattern based on the wavelet

transform [3740-161]H. Miao, K. Qian, X. Wu, Univ. of Science and Technology of China

630 Improvement of precision in the analysis of a lateral shearing interferogram using integration

[3740-163]

S. Okuda, T. Nomura, K. Kamiya, H. Miyashiro, Toyama Prefectural Univ. (Japan);

K. Yoshikawa, H. Tashiro, Toyama Univ. (Japan)

634 Absorption change sensor using the transition of states of optical chaos systems [3740-164]

T. Tanaka, N. Shito, S. Yamamoto, Osaka Univ. (Japan)

638 Novel film sensor based on p-polarized reflectance [3740-1 65]Z. Gu, P. Liang, X. Liu, W. Zhang, Shanghai Institute of Optics and Fine Mechanics (China)

642 Common-path multichannel heterodyne laser interferometer for subnanometer surface

metrology [3740-166]F. Zhao, J. E. Logan, S. B. Shaklan, M. Shao, Jet Propulsion Lab. (USA)

646 Multichannel averaging phasemeter for picometer precision laser metrology [3740-167]P. G. Halverson, D. R. Johnson, A. C. Kuhnert, S. B. Shaklan, R. Spero, Jet PropulsionLab. (USA)

650 Nondestructive evaluation of simulated and actual surface defects using a photoacousticmicroscope [3740-1 68]H. Endoh, Y. Hiwatash, T. Hoshimiya, Tohoku Gakuin Univ. (Japan)

ADDITIONAL PAPER FROM SESSION 18

654 Radiation force exerted on subwavelength particles near a nanoaperture [3740-79]K. Okamoto, S. Kawata, Osaka Univ. (Japan)

659 Author Index