single and dual band 77/95/110 ghz metamaterial absorbers on flexible polyimide substrate
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Single and dual band 77/95/110GHz metamaterial absorbers on flexible polyimidesubstratePramod K. Singh, Konstantin A. Korolev, Mohammed N. Afsar, and Sameer Sonkusale
Citation: Applied Physics Letters 99, 264101 (2011); doi: 10.1063/1.3672100 View online: http://dx.doi.org/10.1063/1.3672100 View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/99/26?ver=pdfcov Published by the AIP Publishing Articles you may be interested in Micro-electro-mechanically switchable near infrared complementary metamaterial absorber Appl. Phys. Lett. 104, 201114 (2014); 10.1063/1.4879284 Broadband polarization-insensitive absorber based on gradient structure metamaterial J. Appl. Phys. 115, 17E523 (2014); 10.1063/1.4868090 Towards left-handed metamaterials using single-size dielectric resonators: The case of TiO2-disks at millimeterwavelengths Appl. Phys. Lett. 101, 042909 (2012); 10.1063/1.4739498 Performance enhancement of terahertz metamaterials on ultrathin substrates for sensing applications Appl. Phys. Lett. 97, 261909 (2010); 10.1063/1.3533367 Dual band terahertz metamaterial absorber: Design, fabrication, and characterization Appl. Phys. Lett. 95, 241111 (2009); 10.1063/1.3276072
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Single and dual band 77/95/110 GHz metamaterial absorbers on flexiblepolyimide substrate
Pramod K. Singh,1 Konstantin A. Korolev,2 Mohammed N. Afsar,2
and Sameer Sonkusale1,a)
1Nano Lab, Department of Electrical and Computer Engineering, Tufts University, Medford,Massachusetts 02155, USA2High-Frequency Materials Measurement and Information Center, Department of Electrical and ComputerEngineering, Tufts University, Medford, Massachusetts 02155, USA
(Received 29 August 2011; accepted 2 December 2011; published online 27 December 2011)
Ultra thin millimeter-wave absorbers on flexible polyimide substrate utilizing metamaterials are
implemented for single and dual frequency bands in an emerging frequency spectrum of 77, 95,
and 110 GHz. The dual band absorber is designed using a novel approach of imbedding high fre-
quency resonator inside low frequency resonator capable of absorbing electromagnetic energy at
both 77 and 110 GHz bands simultaneously. The total thickness of the absorber is just 126 lm
(almost 1/20th of the wavelength). Measured peak absorptions for single frequency absorbers are
92, 94, and 99% at 77.2, 94.8, and 109.5 GHz, respectively, and for dual band absorber 92% at
77 GHz and 94% at 109.8 GHz. VC 2011 American Institute of Physics. [doi:10.1063/1.3672100]
Metamaterials are made by inclusion of sub-wavelength
metallic structures in host dielectric medium, engineered to
achieve unusual properties not found in the nature. Recently,
metamaterials enabled design of thin electromagnetic energy
absorbers.1 Compared to conventional millimeterwave
absorbers which are physically thick and frequency perform-
ance is dictated by the inherent complex permittivity2 and
permeability3,4 of the bulk material, metamaterial based
absorbers can be tailored for frequency response through ge-
ometry of metallic inclusions. Metamaterial absorbers are
frequency selective and have already been investigated over
wide range of frequencies such as microwaves,1 THz,5,6 IR,7
and optical.8 Absorbers have many applications in the radar
imaging,9 wireless communication,10 thermal imagers,11 and
solar cells.8 Making metamaterials on flexible substrates12
allows for conformable and flexible applications such as mit-
igating multipath effects in radome,13 suppressing parasitic
coupling in antenna array,14 reducing scattering noise in
automotive radar15 and reducing electromagnetic coupling in
systems.2,16 Recently, dual frequency band absorbers17 have
also been designed using metamaterials with different reso-
nator geometries.5,6 Such dual band absorbers can be used in
the dual band transceiver systems, enhanced energy absorp-
tion for imaging, and for enhanced chemical and biological
sensing.
We present metamaterial absorbers at millimeter-wave
frequencies of 77, 95, and 110 GHz on the flexible polyimide
substrate for the first time. These millimeter-wave bands are
used for different applications such as automotive radar
(77 GHz), high speed point-to-point local area wireless net-
work, point-to-multipoint distribution, space born radios (92-
95 GHz), inter satellite link, and imaging (95, 110 GHz).
Additionally, we also demonstrate a dual band absorber
which absorbs electromagnetic energies at both 77 and
110 GHz frequencies using novel imbedding of one resonator
inside another.
The metamaterial absorber (shown in Fig. 1) consists of
dielectric substrate patterned with metallic split ring resona-
tors (SRRs) on one side and continuous ground metal on the
other side. The incident electromagnetic wave interacts with
SRRs of the sub-wavelength dimensions. At resonance fre-
quency of the metamaterial resonators, the incident electro-
magnetic energy is strongly coupled and dissipated in the
substrate and metal due to dielectric and ohmic losses. This
results in absorption of energy at resonance frequency. The
scattering of the energy is considered negligible and there is
zero transmitted energy through the sample due to metallic
backplane. At frequencies other than the resonant frequency,
the incident electromagnetic wave is reflected and no energy
is absorbed.
In this paper, a flexible polyimide substrate with thick-
ness (h) of 125 lm is used as dielectric substrate. Relative
permittivity and loss tangent of the substrate determined by
measurements for 70-120 GHz band are 3.2 and 0.01, respec-
tively. Absorbers are designed and simulated using FDTD-
electromagnetic simulation in CST Microwave Studio
(2010) software. The planar metamaterial is simulated using
a single unit cell of metamaterial with periodic boundary
conditions. For this design, the incident electromagnetic
wave is expected to be normal to the metamaterial absorber
surface. Due to negligible transmission on backside, the
evaluation of this particular metamaterial absorber can be
performed by considering it as single port system in simula-
tion and measurements.
Although several different geometrical constructs for
unit cells are possible, a single polarization “C” shaped SRR
metamaterial is used in the proposed design. The desired
electric field polarization is parallel to the gap direction of
the SRR (as shown in Fig. 1(a)) for the maximum interaction
with the electric field of the incident wave. The wave with
electric filed polarization perpendicular to the gap of the
SRR is reflected back completely and not absorbed. The dual
band absorber is implemented using higher frequency reso-
nator imbedded inside the lower frequency resonator. Hence,a)Electronic mail: [email protected].
0003-6951/2011/99(26)/264101/4/$30.00 VC 2011 American Institute of Physics99, 264101-1
APPLIED PHYSICS LETTERS 99, 264101 (2011)
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additional area is not required for the placing second resona-
tor in the lattice, compared with prior work that used wallpa-
per geometry which suffers from poor fill factor.6 The
proposed imbedding approach increases fill factor and effec-
tive absorptivity per unit area for both frequency bands. Two
resonators resonate at two different frequencies and contrib-
ute to absorption of the energy at those frequencies. One
could easily extend this approach for multiple bands by
imbedding more structures.
The simulated power reflection coefficient (R¼ reflected
power/incident power) and power transmission coefficient
(T¼ transmitted power/incident power) of 77 GHz metama-
terial absorber are presented in Fig. 2(a). The simulated Rand T coefficients are calculated from the simulated S-pa-
rameters as; R¼ S112, T¼ S21
2. The power absorption coeffi-
cient (A) is estimated using A¼ 1-R-T. Since wave energy is
neither reflected nor transmitted (R¼ 0, T¼ 0) hence highly
absorbed (A¼ 1) at resonance frequency. This absorbed
energy is dissipated by dielectric loss of the substrate and
resistive loss of the metal. The simulated power loss density
of the absorber at peak absorption frequency of 77 GHz is
shown in inset of Fig. 2(a). Most of the power is lost in gap
region of the SRR due to high confinement of the electric
field. As it can be seen from the simulated results of Fig.
2(a), the absorption occurs for a single polarization when
electric field is polarized parallel to the gap. However, wave
is reflected back when polarization is perpendicular to the
resonator gap direction indicating no absorption. Hence,
metamaterial absorber can be made frequency selective and
polarization dependent which is not possible in conventional
bulk material based absorber.
The dual band absorber implemented in this research
uses two resonators one embedded inside another. As pre-
sented in Fig. 2(b), each resonator absorbs energy separately
at their resonance frequencies. In the imbedded geometry of
two resonators, the combination is capable of absorbing
energy at both frequencies. Only a minor shift in resonance
frequency and change in reflection coefficient of one resona-
tor are observed due to the presence of other resonator. This
could be explained through presence of some coupling, albeit
FIG. 1. (Color online) (a) Schematic rep-
resentation of metamaterial absorber. The
incident wave is reflected back with no
transmitted wave due to backside metal
layer. The wave is absorbed at resonance
frequency when electric field is parallel
to the gap of the SRR as shown in the fig-
ure. Layout of the metamaterial array for
(b) single band and (c) dual band absorb-
ers. The dimension of the unit cell is
square in shape and their periodical distri-
bution forms 2D square lattice.
FIG. 2. (Color online) Simulated results
of the absorbers: (a) single band
absorber at 77 GHz, showing power
reflection, transmission, and estimated
absorption coefficients for the electric
field polarization parallel to the gap of
(SRR). Also, the reflection coefficient
for the perpendicular electric field polar-
ization is presented, showing complete
reflection of the wave energy. (b) Dual
band absorber: power reflection coeffi-
cient of individual resonators (dotted
lines) and response when imbedded
(continuous lines). Power loss density of
absorbers is shown in the inset; resona-
tors are represented with false colors.
FIG. 3. (Color online) Comparison of
simulated (continuous lines) and mod-
eled (dotted lines) power reflection coef-
ficient: (a) single band absorber and (b)
dual band absorber showing individual
resonators and imbedded resonator
response with mutual inductive coupling
(M¼ 0.07).
264101-2 Singh et al. Appl. Phys. Lett. 99, 264101 (2011)
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small. An additional iteration in the design flow is executed
to change the dimensions of resonators to adjust for fre-
quency shift. The power loss density of the dual band
absorber is presented in inset of Fig. 2(b). It can be verified
that the loss signifying absorbed power mainly occurs in the
respective resonators at the two frequencies.
The absorption phenomenon in metamaterial can be
explained by considering simultaneous interaction of the
electric (in split gap of SRR) and magnetic fields (between
SRR and back metal) of the electromagnetic wave with
metamaterial.1 At the resonance frequency, the ratio of elec-
tric and magnetic field (E/H) known as wave impedance
(g¼E/H¼Hl/e) should be equal to the free space wave im-
pedance (g0¼Hl0/e0) to provide impedance matching as a
criteria for zero reflection. The extraction of frequency
dependant effective permittivity (e) and permeability (l) pa-
rameter for the metamaterials is needed to match this crite-
rion.1 However, for single layer of planar metamaterial with
closely spaced continuous metal layer, the inhomogeneity
and anisotropy makes it complicated to determine effective eand l in absorber.18 Alternatively, the circuit model19 can be
used to investigate impedance matching as shown in Fig. 3.
The LC resonance of metamaterial is modeled by LCR reso-
nator, substrate by transmission line, and back metal by
ground at millimeterwave frequency. The coupling between
two resonators in dual band absorber is incorporated by mu-
tual inductive coupling, shown in Fig. 3(b). The circuit
model approximates the response of the absorber and cou-
pling between resonators in dual band absorber very well.
The samples are fabricated using standard optical photo-
lithography and metal liftoff process on 4 in. diameter polyi-
mide substrate with silicon wafer as a supporting substrate.
The titanium/gold metallization deposited by DC sputtering
with thickness of 30/200 nm is used for the patterning of res-
onators. Polyimide substrate is detached from silicon sup-
porting substrate and a thicker copper metal (1 lm) is
deposited at backside of the substrate as ground metal. Sam-
ples are diced with dimension of 45 mm� 45 mm for mea-
surement. For the measurement, we used a custom built
spectrometer as shown in Fig. 4. A frequency tunable back-
ward wave oscillator with range of 70-117 GHz is used as
signal source in the spectrometer. The calibration is per-
formed using metal reflector to determine the incident
power.
The measured peak absorptions for the single band
absorbers as shown in Figs. 5(a)–5(c) were 92% at 77.2 GHz,
94% at 94.8 GHz, and 99% at 109.5 GHz. The dimensions of
single band 77/95/110 GHz absorbers are L1¼ 333/272/
FIG. 4. (Color online) Schematic of the custom made backward wave oscil-
lator spectrometer setup used for the reflection measurement.
FIG. 5. (Color online) Measured (con-
tinuous lines) and simulated (dotted
lines) power reflection and absorption
coefficients of the single and dual band
absorbers: (a) 77 GHz absorber with
reflections for both parallel and perpen-
dicular polarizations, (b) 95 GHz, and
(c) 110 GHz absorbers. (d) Dual band
absorber. Inset showing microphoto-
graph of fabricated absorbers and image
of absorber wrapped around cylindrical
surface. These results show that absorp-
tion frequency can be tuned by changing
dimensions of the metamaterial unit cell.
264101-3 Singh et al. Appl. Phys. Lett. 99, 264101 (2011)
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245 lm, L2¼ 120/110/93 lm, L¼ 450/435/390 lm, W¼ 40/
35/34 lm, and S¼ 25 lm. Measured frequency response is
broadened in bandwidth attributed to the dimensional
changes of the unit cells in the fabrication process.1 This
dimensional variability also leads to the lower peak absorp-
tion than the simulated value (99.99%). The measured band-
widths for power absorption coefficient equal or greater than
80% is 4.3, 5.1, and 7.6 GHz for 77, 95, and 110 GHz absorb-
ers, respectively. Measured peak absorption increases for the
higher frequency absorbers. Also, measured base reflection
for 77 GHz absorber is below 80% and improves for the
absorbers at higher frequency. The scattering from the sur-
face could be responsible for this as surface morphology
improves with decrease in the unit cell size for higher fre-
quency absorbers. The measured peak absorption for the
dual band absorber as shown in Fig. 5(d) is 92% at 77 GHz
and 94% at 109.8 GHz with 80% absorption bandwidth of
4.8 and 6.6 GHz, respectively. The dimensions of dual band
77 /110 GHz absorber are L1¼ 355 lm, L2¼ 270 lm,
L¼ 450 lm, W1¼ 24 lm, W2¼ 33 lm, and S¼ 25 lm. Meas-
ured peak absorption frequencies are slightly lower than the
simulated value. However, measured frequency responses
are in close agreement with simulated results except for the
broadening of the bandwidth due to process variations.
In summary, we have implemented ultra thin metama-
terial absorbers at 77, 95, and 110 GHz frequency bands
on flexible substrate. Both single and dual band absorbers
at these frequencies are investigated. The total thickness of
the absorber is just 126 lm (almost 1/20th of the free
space wavelength). Measured frequency responses of the
absorbers are in very close agreement with the simulated
results. However, broadening of the bandwidth for meas-
ured response occurs due to process variations. Absorbers
in this frequency spectrum opens door for variety of appli-
cations in automotive radars, radomes, and point-to-point
wireless communications for both consumer and military
applications.
Authors acknowledge funding from Office of Naval
Research (ONR) through grant N00014-09-1-1075. Devices
were fabricated at Tufts Micro- and Nano-fabrication facility
(TMNF).
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