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Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

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Page 1: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

Vacuum Technology in Electrical Switches

Presented by Zhenxing Wang

From Xi’an Jiaotong University

Now at University of Helsinki

29 January, 2015

Page 2: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

April 19, 2023 Zhenxing Wang 2

Content

I Background of Vacuum Switch

II Vacuum Breakdowns in 126kV Vacuum interrupter

III Vacuum Arc and Its Effect

IV Post-arc Breakdowns

V Conclusion and Future Plan

Page 3: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

April 19, 2023 Zhenxing Wang 3

I Background

Stationary Contact

Movable Contact

Movable Conducting Rod

Stationary Conducting Rod

Main Shield

Porcelain Envelope

Porcelain Envelope

132mm

471.5mm

Vacuum technology is one good solution for electrical insulation, and the environment-friendly merit makes it suitable for substituting SF6 gas switches.

Now vacuum switches dominate the medium voltage level of power system(3kV - 40.5kV).

We would like to develop a vacuum switch can be used in the power system above 70.5kV - 126kV or above.

This is a 126kV vacuum circuit breaker designed by my group in XJTU

Vacuum Interrupter

Page 4: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

April 19, 2023 Zhenxing Wang 4

I Background: The Interrupting Processes

Schade, E. and E. Dullni, "Recovery of breakdown strengthof a vacuum interrupter after extinction of high currents".Ieee Transactions on Dielectrics and Electrical Insulation,2002. 9(2): p. 207-215.

Vacuum arc can destroy the contact surfaces severely.

There are three stages in the post –arc stage:

Residual plasma dissipates from the gap.

Metal vapor dissipates from the gap.

The gap recovers to vacuum.

If the contacts can withstand the transient voltage and turn to be vacuum again the current is interrupted successfully. Otherwise the contact gap will restrike.

Page 5: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

April 19, 2023 Zhenxing Wang 5

I Background: Three Major Problems

Vacuum Breakdown

Vacuum ArcInterruption

Post-arcBreakdown

The breakdown mechanism in long vacuum gap (>10mm). Does the same mechanism dominate breakdowns between the processes in short and long vacuum gap?

The arc burning process and erosion of contact material. How to get a more precise plasma arc model and calculate the erosion of the arc on the surfaces?

The breakdown mechanism in low-pressure metal vapor on the destructed surfaces.How to give a more reliable estimation to dielectric recovery strength?

Problem I Problem II Problem III

Page 6: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

April 19, 2023 Zhenxing Wang 6

To Impulse Generator Gap Spacing

Adjuster (0~50mm)

Insulation Gas SF6

Vacuum InterrupterPorcelain Envelope

To Earth

d=10~50mm

15mm

Contact Diameter:60mm or 75mm

Radius of Contact Edge: R2mm or R6mm

Contact Material:CuCr40

Surface Roughness: 3.2um or 1.6um

VI Radius of Contact Edge(mm) Roughness(μm) Contact

Radius(mm)

No.1 6 1.6 60

No.2 2 1.6 60

No.3 6 3.2 60

No.4 6 1.6 75

Adopting 126kV vacuum interrupters to study the behaviors of breakdowns with a contact gap of 10~50mm

Voltage type:1min AC voltages impulse voltages

II Vacuum BDs in 126kV VIs: Experimental Setup

Page 7: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

April 19, 2023 7

Gap Length(mm)

AC

Bre

akd

own

Vol

tage

(kV

) UB=89d0.25

The relation between contact gaps and AC breakdown voltages can be expressed as

behaviors of UB=89d0.25

The possibilities of impulse voltage breakdowns in a vacuum interrupter satisfy Weibull distribution.

The discrepancies between the contact with roughness 1.6um and the one with 3.2um are within 3%.

The discrepancies between the contact with a diameter of 60mm and the one with 75mm are within 10%.

AC Voltage breakdowns

Impulse Voltage breakdowns

The Effect of roughness

The Effect of Contact Diameter

II Vacuum BDs in 126kV VIs: Results

Zhenxing Wang

Page 8: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

April 19, 2023 Zhenxing Wang 8

Materials

Region I %

Region II %

Before %

Cr 31 18 25

Cu 69 82 75

Composition of Melt Layer in Different Regions

III High Current Vacuum Arc: ExperimentsResults from Electron Scanning Microscope

Page 9: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

April 19, 2023 Zhenxing Wang 9

Physical Process:Melting/Solidification, Free Surface, Heat Flux from Arc Column, Arc pressure.

Arc ColumnAnode Region

Mathematical ModelPhysical Model

III High Current Vacuum Arc: Simulation Model

d( ) 0

d

F FV F

t t

Boundary Condition Adopting pressure and heat from arc calculation as the boundary of anode surface

Free Surface

Page 10: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

April 19, 2023 Zhenxing Wang 10

III High Current Vacuum Arc: Simulation ResultsVelocity Pressure

Current Density Temperature

Evolution of Temperature and Surface

This process reshapes the contact surface and energy distribution.

Pressure from arc can be a dominant force to shape the surface of anode contact.

The influence of the process has a significant impact on the post-arc period.

Page 11: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

April 19, 2023 Zhenxing Wang 11

2D3V PIC-MCC model of post-arc breakdown

e

Cathode Anode

e

eIe

10mm

Negative Voltage Ground

Cu e Cu e *Cu e Cu e

Cu Cu Cu Cu

Cu Cu Cu Cu

Postarc cathode

Postarc anode

U = 0

U = UR(t) positive space

sheath

Neutral plasma

ds

A 1D3V PIC-MCC model of sheath development

Physical Process:

Plasma transportation under TRV.The effect of existing background neutral vapor.

Physical Process:

Breakdowns in a low density metal vapor. The effect of destructed surface.

IV Post-arc BDs : Simulation Model

Page 12: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

April 19, 2023 Zhenxing Wang 12

The distribution of electron

Sheath thickness

0 1 2 3 4 5

5.0x1016

1.0x1017

1.5x1017

2.0x1017

2.5x1017

150ns300ns450ns600ns750ns

Postarc CathodePostarc Anode

Ele

ctro

n D

ensi

ty(/

m3 )

Axial Position(mm)

0 1 2 3 4 5

0.0

2.0x1016

4.0x1016

6.0x1016

8.0x1016

1.0x1017

1.2x1017

150ns300ns450ns600ns750ns

Postarc Anode Postarc CathodeIo

n D

ensi

ty(/

m3 )

Axial Position(mm)

0 1 2 3 4 5

-1400

-1200

-1000

-800

-600

-400

-200

0

150ns

300ns

450ns

600ns

Postarc Cathode

Vo

ltag

e(V

)

Axial Position(mm)Postarc Anode

750ns

The distribution of ion

The distribution of voltage across gap

0.0 0.5 1.0 1.5 2.0 2.5 3.00

1

2

3

4

5

n0=1018

n0=1020

n0=1021

Sh

eath

Th

ickn

ess(

mm

)

Time(s)

n0=1022

Sheath development can last for several microseconds.

The existing of metal vapor can affect the development of residual plasma only in a high density situation.

IV Post-arc BDs : Sheath Development

Page 13: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

April 19, 2023 Zhenxing Wang 13

0 50 100 150 200 250 300

01x10112x10113x10114x1011

0 50 100 150 200 250 30002468

10

0 50 100 150 200 250 3000

1x1011

2x1011

3x1011

4x1011

The Number of Copper Ion

Time(ns)

Time(ns)

Time(ns)

The Current Absorbed by Cathode

Time(ns)

The Number of Electron

0 50 100 150 200 250 300-12-10

-8-6-4-20

The Current Absorbed by Anode

The evolution of particles during a breakdown

Paschen curve for copper

The paschen curve for copper are only limited available from experiments.

PIC-MCC is helpful for estimating the breakdowns in a low-density metal vapor.

0 2 4 6 8 10 12 140

25

50

75

100

(pd=5.52Pam, Vb=30V)

(pd) / Pam

Bre

akd

ow

n V

olt

age

/ V

(pd=1.01Pam, Vb=11.7V)

IV Post-arc BDs : Metal Vapor BD

Page 14: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

April 19, 2023 Zhenxing Wang 14

0 1 2 3 4 5 60

2

4

6

8

10

12

14

16

(2) (1)

Heig

ht o

f ape

x (u

m)

Time (us)

220MV/m (1) 240MV/m (2) 260MV/m (3)

(3)

0 1 2 3 4 5 60

500

1000

1500

2000

2500

3000(2) (1)

Elec

tric

field

(MV/

m)

Time (us)

220MV/m (1) 240MV/m (2) 260MV/m (3)

(3)

0 1 2 3 4 5 610-3

10-2

10-1

100

101

102

103

104

105

106

107

(2) (1)

Ther

mo-

field

ele

ctro

n em

issi

on (A

/m2 )

Time (us)

220MV/m (1) 240MV/m (2) 260MV/m (3)

(3)E0

0

Vacuum

Liquid metal

Height of apex

Surface tension force

Electric stress

Initial shape

d

Viscosity force

0 1 2 3 4 50

2

4

6

8

10

12

14

16

(2) (1)

Hei

ght o

f ape

x (u

m)

Time (us)

1356K (1) 1700K (2) 2300K (3)

(3)

0 1 2 3 4 50

500

1000

1500

2000

2500

3000(1)(2)

Elec

tric

field

(MV/

m)

Time (us)

1356K (1) 1700K (2) 2300K (3)

(3)

0.0 0.5 1.0 1.5 2.0 2.5 3.0 3.5 4.0 4.510-310-210-1100101102103104105106107108109

(1)(2)

Ther

mo-

field

ele

ctro

n em

ssio

n (A

/m2 )

Time (us)

1356K (1) 1700K (2) 2300K (3)

(3)

IV Post-arc BDs : Micro Tip Induced by Electric Field

Tip Formed Electric Field Enhanced Current Emission Increased

The existence of micro tip can reduce the BD voltages significantly.

Page 15: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

1515

Conclusion & Future Plan

Breakdowns in vacuum and low density metal vapor are the most fundamental issues in designing a high voltage interrupter.

The mechanism of vacuum breakdowns with a large contact gap (10mm~60mm) still does not be understood.

It is necessary to integrate the process of vacuum arcs and post-arc breakdowns for the purpose of better understanding the interrupting processes.

We plan to model breakdowns with a several millimeters contact gap and verify the model by observing the evolution of vacuum breakdowns adopting a steak camera.

A integrated post-arc breakdown model is being developed.

Page 16: Vacuum Technology in Electrical Switches Presented by Zhenxing Wang From Xi’an Jiaotong University Now at University of Helsinki 29 January, 2015

Thanks For Your Attention!