PVD

Nanoparticles synthesis

Etching

Gas treatment PECVDPLASMAHybrid processes

Ion sources

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NO IMPEDANCE TUNER REQUIRED WO 2012/146870SAIREM patent consists of performing the impedance tuning, i.e. the minimization of the refl ected power, using the variable frequency (VF) feature of the solid state generator.The automatic regulation of forward & refl ected power via VF enables the automatic control of the transmitted power to the plasma

COAXIAL PLASMA SOURCE SET-UP WITH 1 SOURCE

SET-UP WITH 8 AURA-WAVE SOURCES

COAXIAL PLASMA SOURCE SET-UPWITH 4 SOURCES

Aura-Wave Pressure range: 10-4 mbar - a few 10-2 mbar Plasma density: a few 1011 cm-3 at 10 cm from the source in multisource

confi guration

Hi-Wave Pressure range: 10-2 - a few 10-1 mbar Plasma density: 1012 cm-3 at 10 cm from the source in multisource confi guration

Solid state generator

4 off x 200 W 2.45 GHz module rack

Hi-Wave - collisional plasma sourceAura-Wave - ECR plasma source

Aura-Wave plasma sources

Control rack

Coaxial cable

Aura-Wave plasma source

Hi-Wave plasma source

Generation of radicals Etching PECVD Diamond deposition with Hi-Wave

Large scale processing Surface treatment (nitruration, cleaning)… Sterilization

2.45 GHZ MICROWAVE DISCHARGES FOR PLASMA PROCESSING

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sairem-poster1N.indd 1 03/12/14 10:08