anil mane, qing peng, jeffrey elam ald research program, process technology research group

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Design and fabrication of electrical measurement system for microchannel plates (LAPD weekly group meeting) Feb-01-2011 Anil Mane, Qing Peng, Jeffrey Elam ALD Research Program, Process Technology Research Group Energy Systems Division.

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Design and fabrication of electrical measurement system for microchannel plates (LAPD weekly group meeting) Feb-01-2011. Anil Mane, Qing Peng, Jeffrey Elam ALD Research Program, Process Technology Research Group Energy Systems Division. Objective:. - PowerPoint PPT Presentation

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Page 1: Anil Mane, Qing Peng, Jeffrey Elam  ALD  Research Program, Process Technology Research Group

Design and fabrication of electrical measurement system for

microchannel plates

(LAPD weekly group meeting) Feb-01-2011

Anil Mane, Qing Peng, Jeffrey Elam ALD Research Program, Process Technology Research Group

Energy Systems Division.

Page 2: Anil Mane, Qing Peng, Jeffrey Elam  ALD  Research Program, Process Technology Research Group

Objective:To build UV-based gain measurement set up for quick ALD functionalized MCP performance test

Page 3: Anil Mane, Qing Peng, Jeffrey Elam  ALD  Research Program, Process Technology Research Group

Photograph of gain measurement setup:

Ready to test MCP Test 1-2 MCP per day (cause by small capacity turbo pump)

10/28/2010

Dual MCPs testing(Possible to load 3 MCPs)

3 high voltage (0-5kV)DC power supply

pA current meter

A new EMWCD submitted in Oct 10 and approved in first week of Jan 11

Page 4: Anil Mane, Qing Peng, Jeffrey Elam  ALD  Research Program, Process Technology Research Group

HW design for MCP Gain test

Electrical connections

Shielded UV source for electron generation

Drain resistors box

Page 5: Anil Mane, Qing Peng, Jeffrey Elam  ALD  Research Program, Process Technology Research Group

Photograph of MCP(s) holder assembly:

MCP 114 is loaded on the holder and will be tested

10/28/2010

Al anode

Anode and MCP bottom contact separated with insulating spacers

MCP top contact

Page 6: Anil Mane, Qing Peng, Jeffrey Elam  ALD  Research Program, Process Technology Research Group

I-V data with now set-up:

Connections are ok

10/28/2010

R=60M

Page 7: Anil Mane, Qing Peng, Jeffrey Elam  ALD  Research Program, Process Technology Research Group

System capabilities:

• Current vs. Voltage (I-V)

• Resistance vs. Temperature (R-T) (Thermal coefficient , activation energy)

• Resistance vs. Time (R-t) @ fix HV

• Gain vs. voltage

• Long term stability under scrubbing condition

• Two optical windows (possible to get thermal imaging with CCD)