developing the tio 2 /sio 2 mixed films for low optical loss dielectric mirror --- a retrospect
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Developing the TiO 2 /SiO 2 mixed films for low optical loss dielectric mirror --- A retrospect. Prof. Shiuh Chao Institute of Photonics Technologies National Tsing Hua University Taiwan, R.O.C. LIGO-G1000746. R eflection. S cattering. A bsorption. T ransmittion. 1=R+T+S+A - PowerPoint PPT PresentationTRANSCRIPT
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Developing the TiO2/SiO2 mixed films for low optical loss dielectric
mirror --- A retrospect
Prof. Shiuh Chao
Institute of Photonics Technologies
National Tsing Hua University
Taiwan, R.O.C.
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
LIGO-G1000746
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Reflection
Transmittion
Scattering
Absorption
1=R+T+S+A
Total Loss ≡ 1-R-T = S+A2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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干涉條紋圖形
順時針光束
逆時針光束
抖動器
陽極充氣管
曲面鏡
陽極
腔長控制器
增益氣體
合成稜鏡
陰極光接收器
光腔長度偵測器 數位訊號輸出
薄膜鏡
輸入訊號
光學共振腔
逆時針光束 干涉條紋圖
陀螺儀輸出訊號
RING LASER GYROSCOPE
High Q resonator low optical loss for the mirrors 2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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ΩΩLinput rate
ou
tpu
t fr
equ
ency
Ψ
)4
(L
A
s
dA
cL
)32
(2
LOCK-IN EFFECT IN RLG
To avoid lock-in effect => low back-scatter mirror is critical
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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H
H
H
L
L
Substrate
nd = 1/2 λ
H: TIO2, TA2O5 L: SIO2
Multi-layer dielectric mirror
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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Coating Apparatus
Ion Beam Sputtering
--- dense film
--- higher refractive index
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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Instrumental analysis for mirror characterization
Optical constants and thickness: Spectrophotometer
Concentration: Rutherford Backscattering
Spectrometer
Structure:X-Ray Diffractometer
Surface roughness:Atomic Force Microscope
Total loss: Cavity ring-down lossmeter
Optical Damage:Nd:YAG Laser
Chemical bonding: Electron Spectroscopy
for Chemical Analysis(ESCA)
OpticalMicroscope
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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Single TiO2 film
Annealing effect on ion-beam-sputtered titanium dioxide film
Wen-Hsiang Wang and Shiuh ChaoDepartment of Electrical Engineering, National Tsing
Hua University, Hsin-Chu, Taiwan September 15, 1998 / Vol. 23, No. 18 / OPTICS
LETTERS 1417
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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Anatase A(101)
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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(A) as-deposited
(B) annealed 200 oC
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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(C) annealed 225 oC
(D) annealed 300oC
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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(1) GOOD POLISHING=> REDUCE SUBSTRATE ROUGHNESS(2) RAISE UP THE CRYSTALLIZATION TEMPERATURE OF THE FILM
Substrate roughness=>
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Single TiO2-SiO2 mixed film
Characteristics of ion-beam-sputtered high refractive-index TiO2-SiO2 mixed films
Shiuh Chao and Wen-Hsiang WangDepartment of Electrical Engineering, National Tsing Hua University,
Hsin-Chu, TaiwanMin-Yu Hsu and Liang-Chu Wang
Chung-Shan Institute of Science and Technology, Tao-Yuan, TaiwanVol. 16, No. 6/June 1999/J. Opt. Soc. Am. A 1477
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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- 65-
5% SiO2
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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- 66-
9% SiO2
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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- 67-
17% SiO2
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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(A) SiO2: 0% annealed 300oC
(B) SiO2: 17% annealed 300oC
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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圖 ( 二十八 ) TiO2-SiO2 光學混合膜的退火相圖 -84-
“phase diagram” of the mixed film
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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Multi-layer dielectric mirror with the mixed film
Low-loss dielectric mirror withion-beam-sputtered TiO2–SiO2 mixed films
Shiuh Chao, Wen-Hsiang Wang, and Cheng-Chung Lee1 May 2001 y Vol. 40, No. 13 y APPLIED OPTICS 2177
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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TiO2+ SiO2 17%
TiO2+ SiO2 17%
TiO2+ SiO2 17%
SiO2
SiO2
Zerodur
nd = 1/4 λ
nd = 1/4 λ
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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0
- 50
-100
0
- 50
-100
deposition temp.(820C)
- 34%▲ SiO2 : 0%● SiO2 : 17 %
Annealing Temperature (0C)
To
tal Lo
ss
Ch
ang
e (%
)
To
tal Lo
ss
Ch
ang
e (%
)
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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3 mm
(A) (B)
1.5 mm
SiO2:0% as-depositeddamage threshold: 2.8 KJ/cm2
(A) (B): damaged spot under optical microscope
Laser Induced Damage
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(C) (D)
SiO2:0% as-depositeddamage threshold: 2.8 KJ/cm2
(C) )(D) damaged spot under AFM
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(A) (B)
3 mm
SiO2: 17% annealed 200oCDamage threshold: >6.37 KJ/cm2
(A) Optical microscope (B) AFM of the exposed spot => no damage2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan
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(A)
(B)
0
20
40
60
80
100
0 1000 2000 3000 4000 5000 6000 7000
Etching Depth (Å)
Atom
Fra
ctio
n (%
)
Ti(%) Si(%) O(%)
Depth profile for the mirrors (A) as-deposited(B) after 400oC annealing (17% mixing)
(Tracing the Ti2p Si2p and O1s by ESCA)
2010/8/13 at Caltech LIGO
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as-deposited2000C3000C4000C
well-definedas-deposited4000C
圖 ( 三十五 ) 以 TiO2-SiO2(17%) 混合膜為高折射係數層的雷射反射鏡退火後 的穿透光譜 (A) 為從光譜儀得到的量測值 (B) 為從ESCA 對鏡片膜層原子分佈的偵測,以薄膜矩陣電腦模擬分析穿透率的結果
(A)
(B)
-107-
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Other methods for depositing mixed filmsTiO 2-S102 mixed films prepared by the fast alternating sputter method
Shiuh Chao, Cheng-Kuel Chang, and Jyh-Shin Chen We introduced the fast alternating sputter method and its application on deposition of TiO2-SiO2 mixed
films. By using fast alternating sputter, the TiO2 and SiO2 were completely mixed in the film, and no thinpairstructure could be found by x-ray diffraction. The structure of the mixed films was amorphous in a wide
composition range. The optical properties of the mixed films in the visible and near infrared changed fromSiO2-dominant to TiO 2 -dominant as TiO2 content in the film increased.
1 August 1991 / Vol. 30, No. 22 / APPLIED OPTICS 3233
Slow alternating sputter for “nano-film” ?
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Mixed films of TiO2–SiO2 depositedby double electron-beam coevaporation
Jyh-Shin Chen, Shiuh Chao, Jiann-Shiun Kao, Huan Niu, and Chih-Hsin Chen
We used double electron-beam coevaporation to fabricate TiO2–SiO2 mixed films. The depositionprocess included oxygen partial pressure, substrate temperature, and deposition rate, all of
whichwerereal-time computer controlled. The optical properties of the mixed films varied from pure SiO2 to pureTiO2 as the composition of the films varied accordingly. X-ray diffraction showed that the mixed filmsall have amorphous structure with a SiO2 content of as low as 11%. Atomic force microscopy showedthat the mixed film has a smoother surface than pure TiO2 film because of its amorphous structure.
Linear and Bruggeman’s effective medium approximation models fit the experimental data betterthan other models.
APPLIED OPTICS Vol. 35, No. 1, 90, 1 January 1996
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Mixed film for LIGO application
• One more factor ---- mechanical loss ---- should be added for investigation
• Near future: systematically characterizing the mechanical loss of the films
• Current effort: recovering the old coating conditions for the films
2010/8/13 at Caltech LIGO
Prof. Chao, National Tsing Hua Univ., Taiwan