iEUVI Mask TWG October 6, 2013

1

　Issue on Backside of EUV mask

EUV Mask

Defect

Overlay error

Scanner stage

Defect map (after chucking)

2

Total count > 10,000 defects

Height measurement (1)

3

Height: 10um Width: 20um

Height measurement (2)

4

Height: 1.1um Width: 18um

5

Lasertec “BASIC” Inspection Measurement Removal (*)

EUV Mask EUV Mask EUV Mask

After

(*) under feasibility study

Dual Pod Handling

6

EUV mask backside is Inspected and measured on Inner pod to reduce a possibility of particle adder

Inner  Pod

Outer  base

EUV  Mask

Inner  base

Outer  Pod

Inspection capability

7

0.4um PSL on CrN

Capture rate 99.9%

8

Comparison with AFM

BASIC: 0.383um AFM: 0.379um

BASIC series 3D image

Profile for height

Example of defetct removal

9

53um

Height: 17um

Before After

Thank you very much for your attention.

T. Suzuki et al., “High Magnification Review Function for defect location accuracy improvement with EUV Actinic Blank Inspection Tool”, Session 5: Mask Inspection Tools on Tue, Oct. 8, 11:40 am

ABI tool development update