plasma reactor (barrel chamber)

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Yamato Scientific Co.,Ltd. www.yamato-scientific.com 2008 Plasma Reactor ( Barrel Chamber ) PR200/300/301 Compact, Barrel Type, Low Temperature Ashing Device PR200 Product code 215016 215006 215008 Model PR200 PR300 PR301 Plasma mode Barrel type chamber direct plasma (DP) High frequency output Max. 200W Max. 300W (100W×3 chambers) Max. 300W Oscillation frequency 13.56MHz Tuning method Auto matching Manual biaxial Reaction chamber Pyrex glass, ø100×160mm×1 chamber Pyrex glass, ø64×160mm×3 chambers Pyrex glass, ø118×160mm×1 chamber Reaction gas 1 system (oxygen), flow meter control with dry air purge gas Control system Manual leak valve Auto pressure reduction, auto leak valve Piping material Stainless steel, teflon Stainless steel, teflon, copper and brass Stainless steel, teflon External dimensions W350×D400×H500mm W438×D520×H556mm W438×D520×H630mm Weight Approx. 25kg Approx. 36kg Approx. 34kg Power source (50/60Hz) AC115 / AC220V Single phase with step-down transformer Standard accessories Specimen stand×1pc Sample dish (large and small)×1 each, Sample shelf×1 pc, Vacuum grease×1 pc, O-ring for reaction chamber×3 pcs Vacuum grease×1 pc, O-ring for reaction chamber×1 pc Specifications PR200/300/301 Applications Functionalization of the polymeric material surface improves adhesion Oxidation reaction generates functional groups -OH, >C=O, -COOH on the surface (very small amount of water and carbon dioxide will impact) In nitrogen plasma, a nitrogen atom is incorporated onto the surface, generates a functional group -NH2 Resist peeling Surface modification of materials (metals, polymers, films, ceramics, etc.) Asbestos pre-processing (ashing of membrane filter) Low-temperature ashing (polymer material, coal, food, etc.) PDMS chips bonding to glass and PDMS substrate Production of semiconductors and analysis work Features Isotropy barrel type Compact, space saving design Capable of removing coated organic matter Adjustable RF suitable for various applications Outstanding operability and safety Can be set for a wide range of output conditions to handle a variety of testing samples Wide range of application from ashing, etching, dry cleaning, etc. PR301 PR300 Control Panel The gas plasma equipment has a wide range of applications from ashing, etching, dry cleaning, etc. Interior PR300, PR301 PR200 External dimensions do not include projections. 300W PR300/301 200W PR200 ø100×160mm×1 PR200 ø100×160mm×1 PR200 ø100×160mm×1 PR200 ø64×160mm×3 PR300 ø118×160mm×1 PR301 High frequency output Reaction chamber

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Page 1: Plasma Reactor (Barrel Chamber)

Yamato Scientific Co.,Ltd. www.yamato-scientific.com2008

Plasma Reactor (Barrel Chamber)PR200/300/301Compact, Barrel Type, Low Temperature Ashing Device

PR200

Product code 215016 215006 215008Model PR200 PR300 PR301Plasma mode Barrel type chamber direct plasma (DP)High frequency output Max. 200W Max. 300W (100W×3 chambers) Max. 300WOscillation frequency 13.56MHzTuning method Auto matching Manual biaxialReaction chamber Pyrex glass, ø100×160mm×1 chamber Pyrex glass, ø64×160mm×3 chambers Pyrex glass, ø118×160mm×1 chamberReaction gas 1 system (oxygen), flow meter control with dry air purge gasControl system Manual leak valve Auto pressure reduction, auto leak valvePiping material Stainless steel, teflon Stainless steel, teflon, copper and brass Stainless steel, teflonExternal dimensions W350×D400×H500mm W438×D520×H556mm W438×D520×H630mmWeight Approx. 25kg Approx. 36kg Approx. 34kgPower source (50/60Hz) AC115 / AC220V Single phase with step-down transformer

Standard accessories Specimen stand×1pcSample dish (large and small)×1 each, Sample shelf×1 pc, Vacuum grease×1 pc, O-ring for reaction chamber×3 pcs

Vacuum grease×1 pc, O-ring for reaction chamber×1 pc

Specifications

PR200/300/301

ApplicationsFunctionalization of the polymeric material surface improves adhesionOxidation reaction generates functional groups -OH, >C=O, -COOH on the surface (very small amount of water and carbon dioxide will impact)In nitrogen plasma, a nitrogen atom is incorporated onto the surface, generates a functional group -NH2

Resist peelingSurface modification of materials (metals, polymers, films, ceramics, etc.)Asbestos pre-processing (ashing of membrane filter)Low-temperature ashing (polymer material, coal, food, etc.)PDMS chips bonding to glass and PDMS substrateProduction of semiconductors and analysis work

FeaturesIsotropy barrel typeCompact, space saving designCapable of removing coated organic matterAdjustable RF suitable for various applicationsOutstanding operability and safetyCan be set for a wide range of output conditions to handle a variety of testing samples

Wide range of application from ashing, etching, dry cleaning, etc.

PR301PR300

Control PanelThe gas plasma equipment has a wide range of applications from ashing, etching, dry cleaning, etc.

Interior

PR300, PR301PR200

External dimensions do not include projections.

300WPR300/301

200WPR200

ø100×160mm×1PR200ø100×160mm×1PR200ø100×160mm×1PR200

ø64×160mm×3PR300

ø118×160mm×1PR301

High frequency output

Reaction chamber

Page 2: Plasma Reactor (Barrel Chamber)

www.yamato-scientific.comYamato Scientific Co.,Ltd.2008

PR301 with observation window PR300 with observation window PR500

Phase-contrast microscope

Collected to membrane filter

Acetone

Deposited with acetone vapor

Ashing filter w

ith

oxygen plasma

SEM-EDS analysis

Example application: asbestos analysis pre-processing

PR200/300/301

PR2001 chamber (ø100 x 160mm)

PR3003 chambers (ø64 x 160mm)Contamination free

PR3011 chamber (ø118 x 160mm)

Chamber

Accessories

Piping System (PR300)

Main switchON

Output switchOFF

Gas switch OFFGas valve CLOSE

Output switchON

Gas switch ONGas valve OPEN

Power switchON

Pump switchON

Pump switchOFF

NormalPressure

High frequencysupply electrode

Purge gas

Termi-nation

Evacuation

Mainvalve

Auto-tuningunit

High frequencypower

A.C. Power supply

VacuumGauge

Flow meterwith needle valve O2

(30~300cc/min.)

Ready lamp is litReaction

Predecompression O2gas

Vacuumpump

: Optional Accessories

Valve

Leakvalve

T

Bypasscapillary

S

S

SPurge gas

Stop

Operation Flowchart

Specimen stand for PR200 (Standard)

Sample shelf for PR300 (Standard)

Sample shelf for PR301 (Optional)

Main switchON

Output switchOFF

Gas switch OFFGas valve CLOSE

Output switchON

Gas switch ONGas valve OPEN

Power switchON

Pump switchON

Pump switchOFF

NormalPressure

High frequencysupply electrode

Purge gas

Termi-nation

Evacuation

Mainvalve

Auto-tuningunit

High frequencypower

A.C. Power supply

VacuumGauge

Flow meterwith needle valve O2

(30~300cc/min.)

Ready lamp is litReaction

Predecompression O2gas

Vacuumpump

: Optional Accessories

Valve

Leakvalve

T

Bypasscapillary

S

S

SPurge gas

Stop

Optional items (PR200)

Optional items (PR300/301)

No. Description Model Product Code

① Stand OPR12 215070② Seismic bracket OPR14 215071③ Vacuum pump PQ-30 242284④ Oil mist trap OMT-050A 242058⑤ Vacuum rubber hose I.D. 15 mm×2 m) 281014

No. Description⑥ Stand⑦ Vacuum pump (160L/min. or more)⑧ Sample shelf (for PR301)