report from cnm activities

23
Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies) Report from CNM activities Report from CNM activities Giulio Pellegrini Centro Nacional de Microelectronica Barcelona, Spain

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Report from CNM activities. Giulio Pellegrini Centro Nacional de Microelectronica Barcelona, Spain. Mask design. spreading. Diodes 2D. 3x3 matrix. Medipix2. Test structures. Atlas pixel. 3d pads. strips. Test for SEM. Long strip. MOS. 10x10 matrix. Pilatus. Layout. - PowerPoint PPT Presentation

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Page 1: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Report from CNM activitiesReport from CNM activities

Giulio Pellegrini

Centro Nacional de Microelectronica

Barcelona, Spain

Page 2: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Medipix2

Diodes 2Dspreading

Test structures

Atlas pixel

3d pads

strips

Long strip

10x10 matrixMOS

Test for SEM

3x3 matrix

Pilatus

Mask designMask design

Page 3: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

LayoutLayout

Passivation

n+ doped

55um pitch

50-0um

300-250ump- type substrate

p+ doped

10um

Oxide0.4um1um

p+ doped

Metal

Poly 3um

OxideMetal

P-stop p+

50-0um TEOS 2um

5um

High resistiv itySem iconductor

Pixel readout

Electronics ch ip

Solder bum p

PN N

3 detectors have been bump bonded in VTT to a Medipix2 chip.3 will be done soon

Page 4: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Fabricated detectorsFabricated detectors

Page 5: Report from CNM activities

3rd Workshop on Advanced Silicon Radiation Detectors

C. Fleta

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Double sided 3DDouble sided 3DFirst run is p-in-n:

• 250 μm p+ columns in 300 μm n-type substrate

Electrode fabrication:1. ICP etching of the holes: Bosch process, ALCATEL 601-E2. Holes partially filled with 3 µm LPCVD poly3. Doping with P or B4. Holes passivated with 2 µm TEOS SiO2

(all fabrication done in-house)

-Deep RIE-ICP.

- Load-lock manual one 4” wafer

- SF6 etching

- C4F8 passivation

- Cooled mechanical clamping :He-Ln2

- Possibility of Cryogenic etching.

Page 6: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Bump bonding at Bump bonding at CNMCNM

• Small clean room class 100 at CNM dedicated to packaging: Flip chip, Wire bonding, CMP

• Joint project with IFAE (High Energy Physics Institute)

• Bump bonding machine Süss Microtech FC150Installation finished last week

• Bumping process ready: electrodeposited SnPb and SnAg

• CMP G&P POLI-400L (Installation pending)

Page 7: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Holes etchingHoles etching

Page 8: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Poly fillingPoly filling

polysilicon

Page 9: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Doping of polyDoping of poly

Poly-n+

Si-n+

Page 10: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Poly etchingPoly etching

Page 11: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Second etchingSecond etching

Page 12: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Second poly fillingSecond poly filling

Page 13: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Si-n-

Si-p+

Si-n+

SiO2

Poly-p+

Poly-n+

Al/Cu

Passiv

Final sampleFinal sample

Mask Levels

• Back-window

• N-DIFF

• N-HOLES

• P-HOLES

• POLY

• WINDOW

• METAL

• PASSIV

• Bump bonding

Page 14: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

3D technology3D technology

•10 m holes•55m pitch•90 minutes etching•300 m thick wafer•Aspect ratio 24:1

Page 15: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

3D technology3D technology

10um

45um

Page 16: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

3D technology3D technologypixels strips

Page 17: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Pixel configurationPixel configuration

Polysilicon contactOpening in the passivation

P-type Hole Metal

Page 18: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Medipix 2

Page 19: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Atlas pixelsAtlas pixels

Page 20: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Test structures

Strips (DC coupled)Pilatus

Page 21: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

TestingTesting

•Irradiation with neutrons- please see Celeste´s talk

•Charge collection- please see Celeste´s talk

•Electrical characterization I-V and CV

•Imaging- waiting for bump bonding

Page 22: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

New Fabrication RunNew Fabrication Run

Passivation

n+ doped

55um pitch

300um

p- type substrate

p+ doped

Oxide0.4um1um

p+ doped

Metal

Poly 3um

Oxide

Metal

P-stop p+

Oxide 2um

5um13um

8 wafers p-type8 wafers n-type

In Fabrication, due for the end of June 2008

Page 23: Report from CNM activities

Giulio Pellegrini 3rd Workshop on Advanced Silicon Radiation Detectors (3D and P-type Technologies)

Thank you