d5.3: report on the conclusions and outcomes of working ... · strain material option ! ... calibre...
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INFORMATION AND COMMUNICATION TECHNOLOGIES
COORDINATION AND SUPPORT ACTION
EUROSOI+
European Platform for Low-Power Applications on Silicon-On-Insulator Technology
Grant Agreement nº 216373
D5.3: Report on the conclusions and outcomes of working group meeting dedicated to FDSOI
platform along the third EUROSOI+ workshop held at Grenoble.
Due date of deliverable: 28-02-2010 Actual submission date: 28-02-2010
Start date of project: 01-01-2008 Duration: 39 months
Project coordinator: Prof. Francisco Gámiz, UGR Project coordinator organisation: University of Granada, Spain Rev.1
Project co-funded by the European Commission within the Seventh Framework Programme (FP7) Dissemination Level
PU Public X PP Restricted to other programme participants (including the Commission Services) RE Restricted to a group specified by the consortium (including the Commission Services) CO Confidential, only for members of the consortium (including the Commission Services)
© CEA 2008. Tous droits réservés. Toute reproduction totale ou partielle sur quelque support que ce soit ou utilisation du contenu de ce document est interdite sans l’autorisation écrite préalable du CEA All rights reserved. Any reproduction in whole or in part on any medium or use of the information contained herein is prohibited without the prior written consent of CEA
1
2007
Process Design Kit FDSOI - PDK Team
FDSOI platform status
Olivier Faynot, January 24th 2010
2010
© CEA 2008. Tous droits réservés. Toute reproduction totale ou partielle sur quelque support que ce soit ou utilisation du contenu de ce document est interdite sans l’autorisation écrite préalable du CEA All rights reserved. Any reproduction in whole or in part on any medium or use of the information contained herein is prohibited without the prior written consent of CEA
2
2007
Process Design Kit FDSOI - PDK Team
EUROSOI+ Work plan
WP5. European platform for design LP SOI. 2008 2009 2010 2011
Task 5.1: Coordination of information exchange on LETI FDSOI technology
Task 5.2: Coordination of activities for the documentation, promotion and spreading of Research-dedicated Design Kit (RDK).
Task 5.3: Promotion of FDSOI technology
Task 5.4: Coordination of activities for the evaluation of the possible
© CEA 2008. Tous droits réservés. Toute reproduction totale ou partielle sur quelque support que ce soit ou utilisation du contenu de ce document est interdite sans l’autorisation écrite préalable du CEA All rights reserved. Any reproduction in whole or in part on any medium or use of the information contained herein is prohibited without the prior written consent of CEA
3
2007
Process Design Kit FDSOI - PDK Team
OUTLINE
! FDSOI technology status
! Circuit design platform
! Summary
© CEA 2008. Tous droits réservés. Toute reproduction totale ou partielle sur quelque support que ce soit ou utilisation du contenu de ce document est interdite sans l’autorisation écrite préalable du CEA All rights reserved. Any reproduction in whole or in part on any medium or use of the information contained herein is prohibited without the prior written consent of CEA
4
2007
Process Design Kit FDSOI - PDK Team
FDSOI technology
! CMOS route (25nm gate lengths, 65nm BE design rules) ! No channel doping, No Pocket implant ! Selective Epitaxy process + implants ! Strain material option ! Ultra-thin BOX material option (for Bulk co-integration, and multi VT)
300mm
© CEA 2008. Tous droits réservés. Toute reproduction totale ou partielle sur quelque support que ce soit ou utilisation du contenu de ce document est interdite sans l’autorisation écrite préalable du CEA All rights reserved. Any reproduction in whole or in part on any medium or use of the information contained herein is prohibited without the prior written consent of CEA
5
2007
Process Design Kit FDSOI - PDK Team
VT variability vs spec.
! World record VT mismatch !! ! It seems that undoped SOI is mandatory for 20nm
LP spec.
20nm LP specs
ETSOI, IBM
LETI/ST iedm’08
300mm, 2009
FDSOI
Bulk
© CEA 2008. Tous droits réservés. Toute reproduction totale ou partielle sur quelque support que ce soit ou utilisation du contenu de ce document est interdite sans l’autorisation écrite préalable du CEA All rights reserved. Any reproduction in whole or in part on any medium or use of the information contained herein is prohibited without the prior written consent of CEA
6
2007
Process Design Kit FDSOI - PDK Team
Performance
! Reproducible results ! No strain incorporated ! UTBOX and strain options
w/o strain boosters CMOS route
PMOS NMOS
© CEA 2008. Tous droits réservés. Toute reproduction totale ou partielle sur quelque support que ce soit ou utilisation du contenu de ce document est interdite sans l’autorisation écrite préalable du CEA All rights reserved. Any reproduction in whole or in part on any medium or use of the information contained herein is prohibited without the prior written consent of CEA
7
2007
Process Design Kit FDSOI - PDK Team
OUTLINE
! FDSOI technology status
! Circuit design platform ! Summary
© CEA 2008. Tous droits réservés. Toute reproduction totale ou partielle sur quelque support que ce soit ou utilisation du contenu de ce document est interdite sans l’autorisation écrite préalable du CEA All rights reserved. Any reproduction in whole or in part on any medium or use of the information contained herein is prohibited without the prior written consent of CEA
8
2007
Process Design Kit FDSOI - PDK Team
PDK structure overview
! PDK architecture: <Install_Path> |-----bin/ (Binary directory) |-----cad/ (PDK infrastructure directory) |-----cdsuser/ (User setup directory) |-----doc/ (Document directory) `-----tech/ (Technology specific directory)
! PDK distribution: " Installation procedure, " Release notes, " PDK LETI Reference Manual
# FTP CEA web site: ftp://ftp.cea.fr
Scripts, Instructions, User setup
UCL on going
© CEA 2008. Tous droits réservés. Toute reproduction totale ou partielle sur quelque support que ce soit ou utilisation du contenu de ce document est interdite sans l’autorisation écrite préalable du CEA All rights reserved. Any reproduction in whole or in part on any medium or use of the information contained herein is prohibited without the prior written consent of CEA
9
2007
Process Design Kit FDSOI - PDK Team
PDK technology package ! Technological library (Design & Layout)
" Devices MOS (Symbol, CDF) " Pcells MOS " Scribe 22 pads, contacts
! Electrical simulations (Eldo) " Model cards, " Device subcircuits, " Corners setup
! Physical verification and Layout finishing (Calibre) " DRC verification file (Design Rules Checking), " LVS verification file (Layout Versus Schematic), " Dummies and Mask generation file
! Parasitic extraction RC (Post-Layout, Star-RCXT) " Process description file (itf # nxtgrd), " Mapping files (devices, layers), " Command file
© CEA 2008. Tous droits réservés. Toute reproduction totale ou partielle sur quelque support que ce soit ou utilisation du contenu de ce document est interdite sans l’autorisation écrite préalable du CEA All rights reserved. Any reproduction in whole or in part on any medium or use of the information contained herein is prohibited without the prior written consent of CEA
10
2007
Process Design Kit FDSOI - PDK Team
Prerequies CAD softwares ( for SNOW) ! Design (Schematic & Layout)
" Cadence : 6.1.3.500.2
! Electrical simulation " Adms : 2009.2 (eldo)
! Physical verification & Parasitic extraction " Calibre : 2009.2_27.17 " Star-rcxt : 2009.06
! Platform system " Solaris 2.8, Linux RHEL4.0 & 5.0
Eldo Model cards
Design Framework (Device, Pcell,…)
Calibre (DRC, LVS)
Star-RCXT (Post-Layout)
© CEA 2008. Tous droits réservés. Toute reproduction totale ou partielle sur quelque support que ce soit ou utilisation du contenu de ce document est interdite sans l’autorisation écrite préalable du CEA All rights reserved. Any reproduction in whole or in part on any medium or use of the information contained herein is prohibited without the prior written consent of CEA
11
2007
Process Design Kit FDSOI - PDK Team
Full custom Design flow - Methodology
Schematic Layout
Parasitic extraction
Layout finishing
Design entry
GDS
D R C
L V S
V E R I F
S I MU
Calibre DRC-LVS
files, runsets
Star-RCXT Map files
Calibre Dummies Gen file
Pcells MOS Pads
Tech Lib Devices
Eldo model cards
Layer map table
Cadence Design Framework
DRM : Design Rules Manual DRC : Design Rules Check LVS : Layout Versus Schematic
Mask Shop
Post-Layout
© CEA 2008. Tous droits réservés. Toute reproduction totale ou partielle sur quelque support que ce soit ou utilisation du contenu de ce document est interdite sans l’autorisation écrite préalable du CEA All rights reserved. Any reproduction in whole or in part on any medium or use of the information contained herein is prohibited without the prior written consent of CEA
12
2007
Process Design Kit FDSOI - PDK Team
Status (January 2010)
! 300mm technology available ! Wafers available for delivery. Already delivered to:
" UCL (UTBOX wafers to be delivered soon) " IMEP " University of Granada " Rovira University, Taragona
! Design kit available: next release End of Q1, compatible with UTBOX
! Circuit design opportunity for new LETI testchip (NDA required) $ SNOW testchip, coming end of Q2 ‘10
! Introduction in EUROPRACTICE: to be adressed during 2010
! For any information: [email protected]