sicera cryopump - shi cryogenics group · sicera for physical vapor deposition (pvd) tools •...
TRANSCRIPT
SICERA®
CRYOPUMP
Electronic devices using integrated circuit (IC) technology are found in all facets of our daily lives. Their stable supply, robust quality and increasing affordability are the result of improved pro-cess reliability and manufacturing efficiencies in semiconductor fabs around the world.
These improvements have resulted in increased demands on cryopump systems, a key component in wafer manufacturing tools, leading to a growth in energy consumption and CO2 emis-sions. To balance these effects, manufacturers require innova-tive, eco-friendly cryopumps that also meet stringent technical requirements. Sumitomo Heavy Industries, Ltd. (SHI) developed the SICERA Cryopump to meet this demand in the high-volume production of semiconductor wafers, flat panel displays and oth-er semiconductor-related products.
SHI is one of the world’s largest manufacturers of cryogenic equipment, including 4K and 10K Cryocoolers for MRI and other low-temperature applications. The newly redesigned SICERA Cryopump combines our proven cryocooler technology with pro-prietary inverter technology to reduce energy costs by industry-leading levels.
Inverter System (Patent Acquisition)
Inverter
TemperatureSensor
CP ControllerT1 is made constant by controlling the cooler motor speed.
ControllerThe helium differentialpressure is made constantby controlling the compressormotor speed.
PressureSensor
CompressorMotor
Inverter
System Management for Power Savings
6.0
5.0
4.0
3.0
2.0
1.0
0.00 20 40
Supply voltage : 400 VSupply frequency: 50 Hz
Time (Min)
Pow
er C
onsu
mp
tion
(kW
)
60 80 100 120 140
5-8 inch pumps
4 pumps
3 pumps (minimum frequency)
Bypass valve’sfunction is tocontrol gas
supply
Cryopump Quantity per Compresser
Power Consumption
(kW)
Power Consumption per Cryopump (kW)
5 4.9 0.98
4 4.1 1.03
3
3.5
1.17
2 1.75
1 3.50
strikes a balance between higher productivity and energy savings.
SICERA
SICERA FOR PHYSICAL VAPOR DEPOSITION (PVD) TOOLS• Stable pumping speed performance is maintained
through independent operation of each cryopump• Fast pressure recovery and larger gas capacity are
achieved with SICERA’s innovative structural design• Highly efficient and unique warm up sequence utilizing
adiabatic heating eliminates the need for internal heaters• Shortened regeneration times realized with patented
regeneration sequence• Independent relief and safety valves increase reliability,
while reducing the potential for valve seat leakage• Self-diagnosis function allows the user to predict the
need for preventative maintenance• The SICERA cryopump system is easily integrated into
the Fab’s FDC system
1500
1400
1300
1200
1100
1000
900
800
700
6001.00E-5
Pum
pin
g S
pee
d (L
/s)
Pressure (Torr)1.00E-4 1.00E-3 1.00E-2
High Throughput
Competitor
SICERA
Faster pumping speedthan the competitorat low pressure(after process)
The pressure recovery of SICERA is 2-3 seconds faster than the Competitor at one end-user.
The pumping speedduring the PVD process is similar to the competitor
ベントバルブ
ベントバルブ
ベントバルブベントバルブ
セイフティバルブ
コントロールネットワークインターフェイス
エレクトリカルインターフェイス
(230)120
ICF253
614
(414)
257.5 91 104
(195)
110φ253
M8スタッドボルト
He配管
He配管
バージバルブ
Model KZ-8L3C KZ-8L3S
Flange Type ICF 253
Nitrogen liters/second 1,500 270
Argon liters/second 1,200 230
Hydrogen liters/second 2,200 900
Water liters/second 4,000
Argon Throughput Pa ∙ m3/s (sccm) 1.2 (700)
Argon Capacity Pa ∙ m3/s (standard liters) 100,000 (1,000)
Hydrogen Capacity Pa ∙ m3/s (standard liters) 1,600 (16)
Crossover Rating Pa ∙ m3/s (torr-liters) 20 (150)
Cooldown Time Minutes 70
Warmup Time Minutes 30
Weight kg 32
Electrical Supply 1 phase AC 208 VAC ±10%, 50/60 Hz, 0.2 kVA
SICERA FOR ION IMPLANTATION SYSTEMS• Several cryopump configurations available to accommo-
date H2 high-speed pumping requirements• Unique second stage panel design ensures:
• Higher pumping speed and larger gas capacity• Direct exposure of charcoal to contaminants is elimi-
nated, resulting in maintained pumping performance• Highly efficient and unique warm up sequence utilizing
adiabatic heating:• Eliminates the need for internal heaters• Ensures H2 pumping speed is maintained throughout
the life of the cryopump• Independent relief and safety valves increase reliability,
while reducing the potential for valve seat leakage• Self-diagnosis function allows the user to predict the
need for preventative maintenance• The SICERA cryopump system is easily integrated into
the Fab’s FDC system
H2 pumping performance -KZ-320L3SH-
0 10
12,000
10,000
8,000
6,000
4,000
2,000
020 30 40 50
Pum
pin
g sp
eed
(L/s
)
60 70 80 90
Capacity (L)
9,200 L/s
35 L
Model KZ-8L3N
Flange Type ANSI 6
Nitrogen liters/second 1,500
Argon liters/second 1,200
Hydrogen liters/second 2,200
Water liters/second 4,000
Argon Throughput Pa ∙ m3/s (sccm) 1.2 (700)
Argon Capacity Pa ∙ m3/s (standard liters) 100,000 (1,000)
Hydrogen Capacity Pa ∙ m3/s (standard liters) 1,600 (16)
Crossover Rating Pa ∙ m3/s (torr-liters) 20 (150)
Cooldown Time Minutes 80
Warmup Time Minutes 30
Weight kg 32
Electrical Supply 1 phase AC 200 VAC ±10%, 50/60 Hz, 0.2 kVA
19.361
315
22.5
°
241.
3
133.
7
485.5
207
257.
591
173.
5
(152
)
45°
5060
165.
5
45°
He配管ベントバルブ
ラフバルブ
バージバルブ
Model KZ-250L3SH
Flange Type ISO 250
Nitrogen liters/second 2,650
Argon liters/second 1,990
Hydrogen liters/second 6,360
Water liters/second 6,500
Argon Throughput Pa ∙ m3/s (sccm) 1.0 (600)
Argon Capacity Pa ∙ m3/s (standard liters) N/A
Hydrogen Capacity Pa ∙ m3/s (standard liters) 2,400 (24)
Crossover Rating Pa ∙ m3/s (torr-liters) 20 (150)
Cooldown Time Minutes 130
Warmup Time Minutes 35
Weight kg 30
Electrical Supply 1 phase AC 200 VAC ±10%, 50/60 Hz, 0.2 kVA
315
270.
514
2.5
50
39
9125
7.2
207.
5
61 19.3
484.5
ベントバルブラフバルブ
バージバルブ He配管
Model KZ-12L3NA
Flange Type ANSI 10
Nitrogen liters/second 4,500
Argon liters/second 3,500
Hydrogen liters/second 5,500
Water liters/second 9,500
Argon Throughput Pa ∙ m3/s (sccm) 1.5 (900)
Argon Capacity Pa ∙ m3/s (standard liters) 200,000 (2,000)
Hydrogen Capacity Pa ∙ m3/s (standard liters) 3,000 (35)
Crossover Rating Pa ∙ m3/s (torr-liters) 20 (150)
Cooldown Time Minutes 100
Warmup Time Minutes 30
Weight kg 40
Electrical Supply 1 phase AC 200 VAC ±10%, 50/60 Hz, 0.2 kVA
Model KZ-12L3NH
Flange Type ANSI 10
Nitrogen liters/second 3,800
Argon liters/second 2,900
Hydrogen liters/second 9,000
Water liters/second 9,500
Argon Throughput Pa ∙ m3/s (sccm) 1.0 (600)
Argon Capacity Pa ∙ m3/s (standard liters) N/A
Hydrogen Capacity Pa ∙ m3/s (standard liters) 3,500 (35)
Crossover Rating Pa ∙ m3/s (torr-liters) 20 (150)
Cooldown Time Minutes 140
Warmup Time Minutes 30
Weight kg 37
Electrical Supply 1 phase AC 200 VAC ±10%, 50/60 Hz, 0.2 kVA
Model KZ-320L3SH
Flange Type ISO 320
Nitrogen liters/second 4,470
Argon liters/second 3,470
Hydrogen liters/second 11,330
Water liters/second 11,000
Argon Throughput Pa ∙ m3/s (sccm) 1.5 (900)
Argon Capacity Pa ∙ m3/s (standard liters) N/A
Hydrogen Capacity Pa ∙ m3/s (standard liters) 3,500 (35)
Crossover Rating Pa ∙ m3/s (torr-liters) 20 (150)
Cooldown Time Minutes 170
Warmup Time Minutes 35
Weight kg 40
Electrical Supply 1 phase AC 200 VAC ±10%, 50/60 Hz, 0.2 kVA
315
280
257.
591
(152
)
178.
720
7
160
60
61 19.3
485.5
30°
30°
15°
12-φ25.4
φ362
ベントバルブ He配管
ラフバルブ
バージバルブ
61
315
280
160
60
19.3
30°
207 25
7.5
91
(15
2)
178.
7
30°
15°
12-φ25.4
φ362
ベントバルブ He配管
ラフバルブ
バージバルブ
485.5
ベントバルブ
ラフバルブ
バージバルブ
315
285
257.
591
207
178.
7
150
60
315
19.3
485.5
61 He配管
(15
2)
SICERA WATER PUMP
CSW-61 SERIES COMPRESSOR
Model KZ-8LST KZ-200LST KZ-250LST KZ-300LST
Size ICF253 VG 200/ISO 200 VG 250/ISO 250 VG 300/ISO 320
Water liters/second 3,400 3,000 4,900 6,100
Cooldown Time Minutes 30 50
Weight kg 32 N/A 30 N/A
Electrical Supply 1 phase AC 208 VAC ±10%, 50/60 Hz, 0.2 kVA
• Several sizes available• Stable, long-lasting pumping speeds• Unique regeneration sequence prevents ice from en-
tering the turbo pump• Mixed system configurations, including cryopumps
and waterpumps, are available• Self-diagnosis function allows the user to predict the
need for preventative maintenance• The SICERA cryopump system is easily integrated into
the Fab’s FDC system
195.0085
402.4990
91.0006
434.
9055
150.
9927
290.
0000
579.
9055
145.
0000
80.2
505
257.4990
ISO250 Flange
Helium Connection(Supply)
Helium Connection(Return)
• One compressor operates up to five 8” SICERA cryopumps
• One compressor operates up to ten SICERA water-pumps
• High and low voltage versions available• Compact design ensures small footprint• Optional, specially-designed rack allows compressors
to be stacked
SUPPLY PRESSURE
ÇvÇ`ÇsÇdÇq
ÇhÇ
ÇnÇtÇs
ÇfÇ`ÇrÅ@ÇrÇtÇoÇoÇkÇxÇfÇ`ÇrÅ@ÇqÇdÇsÇtÇqÇm
ÇgÇdÇkÇhÇtÇlÅ@ÇfÇ`ÇrÅ@ÇbÇgÇ`ÇqÇfÇd
RUN ALARM
RUN
SELESC
MODE RST STOP
ENT
Front
454624
97
92 70
182 170
82
4-M10 317.5Side Rear
527
864
87.5
253
117.
550
Model CSW-61C CSW-61D CSW-61CN
Electrical Supply 3 Phase AC 200-230 VAC, 50/60 Hz, 13 kVA
3 Phase AC 378-528 VAC, 50/60 Hz, 13 kVA
3 Phase AC 200-230 VAC, 50/60 Hz, 13 kVA
Ambient Temperature (°C) 5-35
Cooling Water Require-ment at 28 °C (L/min)
7
Cooling Water Temperature Range (°C)
4-28
Weight kg 130
Maintenance Interval (Adsorber Exchange) (Hours)
30,000
In addition to the SICERA products featured in this catalogue, SHI Cryogenics Group designs and manufactures 4K and 10K G-M Cryocoolers, Pulse Tubes, Marathon® CP Cryopumps and other low temperature cooling technology.
SHI Cryogenics Group’s 10K Gifford-McMahon Cryocoolers are versatile, orientation-free, closed-cycle systems that feature the same Displex® technology found in the complete line of Marathon® CP Cryopumps and MRI coolers, proven the world over with millions of reliable operating hours.
SHI Cryogenics Group’s 4K Gifford-McMahon Cryocoolers are recognized as the most reliable and versatile systems available in the marketplace. These Cryocoolers feature high cooling capacities, compact designs and are orientation-free.
SHI’s 4K Pulse Tube Cryocoolers embody leading-edge technology and provide low vibration, high reliability and low maintenance requirements. They are uniquely designed with no moving parts inside the coldhead.
Marathon® CP Series Cryopumps are specifically designed to meet the needs of high vacuum processes. Manufacturers of semiconductor de-vices, flat panel displays, test equipment, solar manufacturing and a wide variety of coating and thermal vacuum systems require efficient, reliable and robust systems that offer a low cost of ownership.
For additional literature and information on any of these products, please contact your local SHI Cryogenics Group sales office.
OPERATION PANEL UNIT (OPU)
ADDITIONAL PRODUCTS FROM SHI CRYOGENICS GROUP
Connecting the OPU to the CP Controller allows the customer fuller functionality, including the ability to monitor the status of the cryopumps and compressors and set up the parameters of the regeneration sequence.
For Information in:Asia Sumitomo Heavy Industries, Ltd.ThinkPark TowerCryogenics Division, Sales Department1-1, Osaki 2-Chome, Shinagawa-KuTokyo 141-6025, JapanPhone: +81-3-6737-2550Fax: +81-3-6866-5114E-mail: [email protected]
Cryogenics Division, Service Department2-1-1, Yato-cho, Nishitokyo-cityTokyo 188-8585, JapanPhone: +81-42-468-4265Fax: +81-42-468-4254E-mail: [email protected]
United States Sumitomo (SHI) Cryogenics of America, Inc.1833 Vultee StreetAllentown, PA 18103Phone: +1 610-791-6700Fax: +1 610-791-0440E-mail: [email protected]
Europe Sumitomo (SHI) Cryogenics of Europe, Ltd.3 Hamilton Close, Houndmills Industrial EstateBasingstoke, Hampshire RG21 6YT United KingdomPhone: +44 (0) 1256 853333Fax: +44 (0) 1256 471507E-mail: [email protected]
Sumitomo Heavy Industries (Shanghai) Management, Ltd.10F, SMEG PLAZANo.1386, Hongqiao RoadShanghai 200336, P.R. ChinaPhone: +86-21-3462-7660Fax: +86-21-3462-7661Mobile: +86-138-1612-1291E-mail: [email protected]
Room 107-110, Building 5No.100, Zixiu RoadShanghai 201103, P.R. ChinaPhone: +86-21-6070-5200Fax: +86-21-6070-5086E-mail: [email protected]
Sumitomo (SHI) Cryogenics of America, Inc.1700 Wyatt DriveSuite 8Santa Clara, CA 95054Phone: +1 408-736-4406Fax: +1 408-736-7325
Sumitomo (SHI) Cryogenics of Europe, GmbHDaimlerweg 5aDarmstadt D-64293, GermanyPhone: +49 (0) 6151 860 610Fax: +49 (0) 6151 800 252E-mail: [email protected]
Sumitomo (SHI) Cryogenics Korea Co., Ltd.Room 619-620, Venture Valley#958 Goseck-Dong, Kwonsun-GuSuwon-City, Gyeonggi-Do, South KoreaPhone: +82-31-278-3050Fax: +82-31-278-3053E-mail: [email protected]
Sumitomo (SHI) Cryogenics Taiwan Co., Ltd.4th Floor, No. 3Lane 216, Gongyuan Rd.Hsinchu City 300, Taiwan ROC Phone: +886 3 561 2557Fax: +886 3 562 3400
Sumitomo (SHI) Cryogenics of America, Inc.1500-C Higgins RoadElk Grove Village, IL 60007Phone: +1 847-290-5801Fax: +1 847-290-1984
World Wide Web: www.shicryogenics.com
© SHI Cryogenics Group 9/12